Chemical Analysis Instruments
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| Brand | AMS Alliance |
|---|---|
| Origin | Italy |
| Model | SmartChem200 |
| Product Type | Automated Discrete Analyzer |
| Wavelength Range | 420–880 nm |
| Sample Capacity | 126 positions |
| Reagent Positions | 10 (expandable to 28) |
| Cuvette Path Length | 10 mm |
| Light Source | 6 V / 10 W Halogen Tungsten Lamp (2000 h lifetime) |
| Measurement Speed | Up to 200 tests/hour (per method) |
| Minimum Reaction Volume | 300 µL |
| Absorbance Range | 0.001–2.500 Abs |
| Absorbance Resolution | 0.0001 Abs |
| Thermostat Accuracy | 37 °C ± 0.3 °C |
| Dimensions (H×W×L) | 420 × 650 × 1000 mm |
| Weight | 43 kg |
| Brand | AMS Alliance |
|---|---|
| Origin | France |
| Model | Smartchem600 |
| Product Type | Discrete Analyzer |
| Wavelength Range | 12 fixed wavelengths from 340 to 880 nm |
| Sample Capacity | 200 positions |
| Reagent Positions | 100 |
| Cuvette Path Length | 6 mm or 10 mm |
| Light Source | High-stability LED |
| Brand | AMS |
|---|---|
| Origin | France |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | FUTURA Segmented Continuous Flow Analyzer |
| Wavelength Range | 340–1100 nm |
| Sample Capacity | 240–720 positions |
| Reagent Positions | 5–30 |
| Flow Cell Path Length | 5–500 mm |
| Light Source | Tungsten-Halogen Lamp |
| Brand | Amsterdam Scientific Instruments (ASI) |
|---|---|
| Origin | Netherlands |
| Model | Cheetah M3/T3 Ultra (512 × 1024) |
| Sensor Technology | Medipix3RX / Timepix3 hybrid pixel architecture |
| Pixel Size | 55 µm |
| Radiation Tolerance | >1 GGy (electron beam, Giga-eV equivalent) |
| Readout | SPIDR3 or SPIDR3 Turbo (event-driven or frame-based) |
| Data Interface | Gigabit Ethernet (TCP/UDP) to Linux (Ubuntu) workstation |
| Mounting Options | Bottom-mount static or side-insert retractable |
| Compliance | Designed for GLP/GMP-adjacent TEM environments |
| Software Integration | SerialEM, Instamatic, PantaRhei, LiberTEM via RESTful Serval API |
| Brand | Amsterdam Scientific Instruments (ASI) |
|---|---|
| Origin | Netherlands |
| Model | LynX T3 or M3 |
| Pixel Pitch | 55 µm |
| Sensor Options | Si, GaAs, CdTe |
| Readout Speed | Up to >500 MHz (LynX T3), 1800 fps (LynX 1800), 120 fps (LynX 120) |
| Energy Thresholds | 1–8 adjustable thresholds |
| Frame Buffer | On-chip, configurable |
| Compliance | Designed for GLP/GMP-aligned workflows, compatible with ISO/IEC 17025 traceable calibration protocols |
| Software Interface | Native support for EPICS, TANGO, and HDF5-based data streaming |
| Brand | Analytical Instruments |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | Atomray CX-6500 |
| Application | Handheld / Portable |
| Industry-Specific Use | Geological & Mineral Exploration |
| Elemental Range | Mg to U |
| Quantitative Detection Range | 10 ppm – 99 wt% |
| Energy Resolution | <140 eV (at Mn Kα) |
| Repeatability | ≤0.1% RSD (for major elements under controlled conditions) |
| Weight | 1.6 kg (with battery) |
| Dimensions | 254 × 79 × 280 mm (L × W × H) |
| X-ray Tube | Ag anode (standard), optional Au/W/Rh anodes |
| Max. Tube Voltage/Current | 50 kV / 200 µA, fully adjustable |
| Detector | BOOST-type Si-Pin detector (CX-5500 series) |
| Display | 5-inch industrial-grade resistive touchscreen |
| Operating System | Embedded Linux with proprietary analytical software |
| Language Support | English, Chinese, Spanish, French, Russian, Arabic |
| Brightness Control | Ambient-light adaptive auto-brightness |
| Onboard Storage | 32 GB internal flash memory |
| Battery Life | ~8 hours per charge (smart MSBUS battery with real-time SOC monitoring) |
| Connectivity | USB 2.0, Bluetooth 5.0, Wi-Fi 802.11 b/g/n |
| Safety | DoubleBeam™ beam-on-sample interlock system |
| Compliance | Meets IEC 62495 (handheld XRF safety), RoHS, and CE requirements for portable radiation-emitting devices |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Instrument Type | Flame and Graphite Furnace AAS |
| Optical System | Dual-Beam |
| Monochromator | Echelle Grating with Quartz Prism Cross-Disperser |
| Detector | Solid-State CCD Array |
| Background Correction | Real-Time, Multi-Wavelength Simultaneous Correction |
| Wavelength Resolution | 0.002 nm |
| Light Source | High-Intensity Short-Arc Xenon Lamp (Continuum Source) |
| Measurement Mode | Sequential Multi-Element & Full-Spectrum Acquisition |
| Dynamic Linear Range | 5 Orders of Magnitude |
| Software Compliance | FDA 21 CFR Part 11 Ready, GLP/GMP Audit Trail Enabled |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | contrAA 800 |
| Instrument Type | Flame and Graphite Furnace AAS |
| Wavelength Range | 185–900 nm |
| Light Source | High-Intensity Short-Arc Xenon Lamp |
| Detection Principle | High-Resolution Continuum Source AAS (HR-CS AAS) |
| Detector | CCD Array |
| Background Correction | Automatic Background Correction (ABC) and Concurrent Spectrum Interference Correction (CSI) |
| Detection Limit | Sub-ppb for most elements |
| Elemental Coverage | Simultaneous multi-element analysis across full UV-VIS-NIR range |
| Atomization Modes | Integrated flame and electrothermal (graphite furnace) atomization |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | ICprep |
| Measurement Elements | F, Cl, Br, I, S |
| Analysis Time | 3–4 min per sample |
| Sample Introduction | Up to 100 µL for liquids, up to 110 mg for solids |
| Combustion Temperature | Up to 1100 °C |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena GmbH |
| Type | Imported Instrument |
| Model | multi EA 4000 |
| Measurement Principle | Infrared Absorption (CO₂, SO₂, HCl detection) |
| Heating System | High-Temperature Ceramic Furnace (HTC) |
| Sample Form | Solid and viscous samples |
| Modular Configuration | Independent C, S, Cl analysis modules |
| Compliance | ASTM D4293, ASTM D5178, ISO 20565, DIN 51721, EN 15408, EPA Method 9096A (for AOX), USP <281> (for residual chlorine) |
| Software | multiWin v5.x with 21 CFR Part 11 compliance options |
| Safety | Integrated Self-Check System (SCS), automatic gas leak detection, overpressure protection |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | multi EA 5010 |
| Detection Principle | Chemiluminescence (N) / UV Fluorescence (S) with MPO High-Nitrogen Interference Compensation |
| LOD (N) | 10 ppb |
| LOD (S) | 5 ppb |
| Linear Range (S) | up to 10,000 mg/kg |
| Analysis Time | 2–5 min per sample |
| Compliance | ASTM D5453, D7183, ISO 20846, ISO 29189, GB/T 17040, GB/T 17674, USP <233>, EPA Method 1664A (adapted), GLP/GMP-ready |
| Automation | Fully automated calibration, parameter optimization, and continuous unattended operation |
| Footprint | < 0.3 m² |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | multi EA 5010 |
| Pricing | Available Upon Request |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | multi EA 5010 |
| Price | Upon Request |
| Detector | HiPerSens UV Fluorescence & Chemiluminescence Detector |
| Measurement Range | 0.0x ppm to 100% (w/w or v/v) |
| Sample Volume | Liquids: 50 µL |
| Gases | 20 mL |
| Combustion Furnace Temperature | Up to 1100 °C |
| Compliance | ASTM D5453, D7183, D7039, ISO 20846, ISO 20884, UOP 97, IP 433, IP 541, EN 15486 |
| Software | multiWin v5.x with 21 CFR Part 11 compliance modules |
| Connectivity | Ethernet, LIMS-ready, Remote Web Access via Browser or Mobile App |
| Safety | Automated Self-Check, Real-Time Parameter Monitoring, Push Notification Alert System |
| Brand | analytik jena |
|---|---|
| Origin | Germany |
| Model | multi EA 5100 |
| Detection Elements | C, N, S, Cl |
| Furnace Configurations | Dual-mode vertical & horizontal combustion furnace |
| Detector Technology | HiPerSens® electrochemical and thermal conductivity detection |
| Sample Forms | Solid, liquid, gaseous & supercritical fluid |
| Automation | Fully automated direct injection |
| Compliance | Designed for GLP/GMP environments |
| Safety Systems | Integrated self-diagnostic module, flame sensor (horizontal mode), aerosol/liquid ingress protection, auto-leak monitoring, active gas stream drying & purification |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported Instrument |
| Model | multi EA 5100 |
| Pricing | Available Upon Request |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | multi EA H 5000 |
| Price Range | USD 68,000 – 109,000 |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported Instrument |
| Model | multi EA S 5000 |
| Measurement Principle | Infrared Absorption (for C), Chemiluminescence (for N), UV Fluorescence or Microcoulometric Detection (for S), Microcoulometric Detection (for Cl) |
| Furnace System | Dual-mode resistive furnace (vertical/horizontal configuration) |
| Detection Limit | ppb-level |
| Measurement Range | ppb to wt% |
| Accuracy | ±0.01 ppm |
| Analysis Time | 2–4 minutes |
| Maximum Furnace Temperature | 1100 °C |
| Liquid Sample Volume | 1–100 µL |
| Gas Sample Volume | up to 100 mL |
| Solid Sample Mass | up to 100 mg |
| LPG Sample Volume | 1–50 µL |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena GmbH & Co. KG |
| Type | Imported Instrument |
| Model | multi EA® 5000 |
| Detection Principles | Chemiluminescence (N), UV Fluorescence or Microcoulometry (S), Microcoulometry (Cl), NDIR (C) |
| Furnace Configuration | Dual-mode vertical/horizontal high-temperature combustion furnace (up to 1100 °C) |
| Sample Forms | Liquid (1–100 µL), Gas (up to 100 mL), LPG (1–50 µL), Solid (up to 100 mg) |
| Detection Range | 0.0x ppm to % level |
| Automatic Mode Recognition | Yes |
| Flame Monitoring Sensor | Integrated real-time combustion state feedback |
| Gas Pressure Tolerance | 0.2–0.6 MPa (O₂), with under/over-pressure alarm |
| Calibration | Single calibration curve applicable across full dynamic range |
| Compliance | Designed for GLP/GMP environments |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Flame and Graphite Furnace AAS |
| Monochromator | Plane Grating |
| Optical System | Dual-Beam with Automatic Switching to Single-Beam |
| Detector | CCD Array (185–900 nm) |
| Background Correction | Automatic Deuterium/Halogen Lamp or Zeeman (software-selectable) |
| Spectral Resolution | ≤ 0.1 nm |
| Sensitivity | ≥ 0.9 A for 5 mg/L Cu solution (279.5 nm, air-acetylene flame) |
| Precision (RSD) | < 0.5% (n = 10, typical aqueous standards) |
| Detection Limit (Flame Mode) | < 0.005 mg/L Cu |
| Detection Limit (Graphite Furnace Mode) | Sub-pg range for Cd/Pb (e.g., < 3 pg for Cd) |
| Baseline Stability | < 0.002 A/h (typical, 24 h drift monitoring) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | novAA 800F |
| Atomization Type | Flame |
| Detector | SiOSens solid-state semiconductor detector |
| Lamp Holder | Integrated 8-position auto-rotating turret with coded lamp recognition |
| Background Correction | Deuterium arc lamp |
| Optical System | Switchable single-beam / double-beam / emission modes |
| Automation Level | Fully automated dual atomizer switching (flame/graphite/hydride), auto-optimization, programmable dilution & autosampling |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Type | Full-Spectrum Simultaneous ICP-OES |
| Detection Limit (Zn at 213.856 nm) | 0.06 ppb |
| Precision (RSD) | ≤0.5% |
| Long-Term Stability (RSD, 4h) | ≤1.5% |
| Wavelength Range | 160–900 nm |
| Optical Resolution | 0.003 nm (at 200 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | PlasmaQuant 9100 |
| Instrument Type | Laboratory ICP-OES |
| Application Scope | Universal |
| Compliance | ASTM D5185, ISO 11885, USP <232>/<233>, EPA Methods 200.7, 200.8, 6010D, 6020B |
| Optical Resolution | ≤2 pm at 200 nm |
| Wavelength Range | 160–900 nm |
| Detector | High-resolution CCD with 43,000 resolvable emission lines |
| RF Generator | Self-oscillating 40 MHz, 700–1700 W |
| Plasma Observation | Enhanced 2+2 dual-view (axial + radial, with signal attenuation and torch tail-flame suppression) |
| Torch Design | V-Shuttle detachable quartz torch with auto-alignment and argon interlock |
| Warm-up Time | <15 min (cold start to quantitative analysis) |
| Software | PQ 9000 Suite with 21 CFR Part 11 compliance mode, audit trail, electronic signatures |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported Instrument |
| Model | PlasmaQuant 9100 |
| Detection Principle | Full-Spectrum Direct-Reading ICP-OES |
| Optical Range | 160–900 nm |
| Optical Resolution | ≤3 pm |
| Wavelength Accuracy | <0.0004 nm |
| Observation Modes | Dual-View (Radial + Axial) with Four Simultaneous Viewing Configurations |
| Plasma System | High-Stability, High-Power RF Generator (27.12 MHz) |
| Detector | Back-Illuminated CCD with Deep-UV Sensitivity |
| Startup Time | <5 minutes |
| Gas Efficiency | Integrated Plasma Gas Recycling for Cooling & Purge Streams |
| Software | Aspect PQ with ABC and CSI Background Correction Algorithms |
| Compliance | Designed for GLP/GMP environments |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported |
| Model | PlasmaQuant 9200 |
| Instrument Category | Full-Spectrum Simultaneous ICP-OES |
| Wavelength Range | 160–900 nm |
| Optical Resolution | 0.002 nm (at 200 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | PlasmaQuant MS |
| Instrument Type | Quadrupole ICP-MS |
| Application Environment | Laboratory |
| Mass Range (amu) | Not Specified |
| Mass Resolution (Unit Mass Resolution, amu) | Not Specified |
| Detection Limit (ng·L⁻¹) | Not Specified |
| Sensitivity (Mcps/mg·L⁻¹) | Not Specified |
| Short-Term Stability (RSD) | Not Specified |
| Long-Term Stability (RSD) | Not Specified |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | PlasmaQuant MS |
| Instrument Type | Full-Spectrum Direct-Reading ICP-MS |
| Detection Limits | Be ≤ 0.1 ppt, Co ≤ 0.2 ppt, In ≤ 0.05 ppt, Bi ≤ 0.05 ppt, U ≤ 0.01 ppt |
| Precision (RSD) | < 3% |
| Short-Term Stability | < 3%, Long-Term Stability: < 4% |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Instrument Type | Quadrupole ICP-MS |
| Model | PlasmaQuant MS |
| Application Domain | Laboratory-based elemental and isotopic analysis |
| Regulatory Compliance | Designed for GLP/GMP environments |
| Gas Consumption | <9 L/min Ar plasma gas |
| Oxide Rate (CeO⁺/Ce⁺) | ≤1.8% |
| Double-Charge Rate (Ba²⁺/Ba⁺) | ≤2% |
| Detection Limit Performance | 7Li ≥100 Mcps/ppm, 115In ≥500 Mcps/ppm, 238U ≥500 Mcps/ppm |
| Dynamic Range | 0.1–10¹⁰ cps (11-decade linear range in pulse-counting mode) |
| Quadrupole Drive Frequency | 3.0 MHz |
| Mass Scan Speed | 5115 amu/s |
| Minimum Dwell Time | 50 µs |
| iCRC Collision/Reaction Cell | Dual-gas (He/H₂) configurable, with BOOST technology for sensitivity preservation |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | PQ LC–PlasmaQuant MS |
| Instrument Type | Triple Quadrupole ICP-MS Coupled with Liquid Chromatography |
| Application Scope | Universal Elemental Speciation |
| Interface Configuration | Integrated LC–ICP-MS Coupling Kit |
| Software Platform | Clarity Chromatography Software (DataApex) + ASpect MS |
| Regulatory Compliance | FDA 21 CFR Part 11–Ready, GLP/GMP-Compatible Data Handling |
| Automation Level | Fully Automated Unattended Operation Support |
| Column Compatibility | Reversed-Phase HPLC, Ion Chromatography (IC), Size-Exclusion Chromatography (SEC) |
| Detection Capability | Sub-ng/kg LODs for As/Cr species |
| Dynamic Range | 11 orders of magnitude (ADD11 digital detector) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Model | RXN |
| Instrument Type | In-line Raman Spectrometer |
| Probe Compatibility | PhAT and non-PhAT probes |
| Sample Phase Support | Solid and liquid (dual-channel configuration) |
| Optical Spot Size Range | 1 µm to 6 mm |
| Application Environment | Certified for hazardous / classified areas (ATEX/IECEx compliant) |
| Spectral Resolution | High (typical < 4 cm⁻¹ FWHM) |
| Architecture | Modular, rack-mountable industrial platform |
| Software Compliance | Supports 21 CFR Part 11 audit trail, electronic signatures, and GLP/GMP data integrity requirements |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Type | Imported Instrument |
| Model | SPECORD 200 PLUS |
| Optical Design | Double-Beam |
| Detector | Photodiode Array (PDA) |
| Wavelength Range | 190–1100 nm |
| Automation | Motorized Wavelength Scanning |
| Spectral Bandwidth | 1.4 nm |
| Wavelength Accuracy | < ±0.1 nm (full range) |
| Wavelength Repeatability | < ±0.01 nm |
| Stray Light | < 0.005% @ 340 nm (NaNO₂) |
| Baseline Stability | ≤ 0.0001 A (RMS) |
| Photometric Range | –5 to +5 A |
| Scan Speed | 12,000 nm/min |
| Light Sources | Deuterium Lamp + Tungsten-Halogen Lamp (automatically switched) |