Betop Scientific HTC2300 High-Temperature Vacuum Optical Contact Angle Analyzer
| Brand | Betop Scientific |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | HTC2300 |
| Instrument Category | High-Temperature Vacuum Contact Angle Measurement System |
| Instrument Form Factor | Benchtop Laboratory System |
| Contact Angle Measurement Range | 0–180° |
| Contact Angle Measurement Accuracy | ±0.1° |
| Contact Angle Resolution | 0.01° |
| Sample Stage Dimensions | 15 × 15 mm |
| Optical Magnification | 0.7–4.5× |
| Maximum Sample Size | 5 × 5 × 5 mm |
| Sample Stage Load Capacity | Application-Dependent |
| Heating Capability | Up to 2300 °C (long-term use up to 2200 °C) |
| Atmosphere Control | High Vacuum (≤1 × 10⁻³ Pa) or Inert Gas (Ar, N₂) |
| Temperature Control | 30-Stage Programmable Ramp/Soak Profile |
| Heating Rate | ≤15 K/min |
| Thermocouple | Tungsten-Rhenium + Dual-Wavelength Infrared Pyrometry |
| Temperature Uniformity | ±2 °C across sample zone |
| Imaging Speed | ≥220 fps at 1600 × 1200 resolution |
| Light Source | Adjustable 470 nm Blue LED Illumination |
| Data Interface | USB 3.0 |
| Software Features | Real-time contact angle calculation, dual-side θ tracking, automated video capture, time-temperature-angle synchronized export |
Overview
The Betop Scientific HTC2300 High-Temperature Vacuum Optical Contact Angle Analyzer is an engineered platform for quantitative interfacial characterization of solid–molten phase systems under precisely controlled thermal and atmospheric conditions. It operates on the principle of sessile drop optical analysis—capturing high-speed, high-resolution silhouette images of molten droplets on substrates while simultaneously monitoring temperature, atmosphere, and geometric evolution in real time. Designed specifically for materials science R&D and advanced metallurgy applications, the HTC2300 enables direct observation and quantification of wettability dynamics—including spreading kinetics, retraction behavior, dewetting onset, and interfacial reaction progression—across a continuous thermal domain from ambient to 2300 °C. Its integrated vacuum furnace (≤1 × 10⁻³ Pa base pressure) and inert gas purging capability eliminate oxidation and volatile loss, ensuring thermodynamic fidelity during high-temperature measurements on refractory metals, ceramics, carbides, and composite precursors.
Key Features
- Triple-tier programmable furnace architecture supporting long-term operation at 2200 °C with tungsten-rhenium thermocouples and dual-wavelength infrared pyrometry for traceable, cross-validated temperature measurement (±1 °C uncertainty with IR; ±1 °C with W–Re)
- Optical path optimized for high-temperature stability: quartz–sapphire viewport assembly, motorized zoom lens (0.7–4.5×), and 1600 × 1200 monochrome CMOS sensor capturing ≥220 fps at full resolution
- Blue LED illumination (470 nm) with analog intensity control to maximize contrast of molten droplet boundaries against heated substrates—critical for sub-degree contact angle resolution
- Benchtop-integrated vacuum manifold with turbomolecular pumping, gas purification module, and pressure feedback loop enabling seamless transition between high-vacuum and inert-gas (Ar/N₂) environments
- 30-segment temperature programming with ramp/soak logic, allowing replication of complex thermal cycles (e.g., sintering profiles, transient melting–solidification sequences, or reactive wetting protocols)
- Automated contact angle computation engine applying five validated fitting algorithms (Circle, Ellipse, Young–Laplace, Spline, and Axisymmetric Drop Shape Analysis) with side-specific θ extraction and statistical averaging
Sample Compatibility & Compliance
The HTC2300 accommodates compact, geometrically stable specimens up to 5 × 5 × 5 mm—ideal for single-crystal wafers, polished ceramic tiles, pressed powder compacts, and thin-film-coated substrates. Sample mounting utilizes a low-thermal-mass molybdenum stage (15 × 15 mm) compatible with rapid thermal transients and minimal parasitic heat loss. All internal furnace components—including heating coil (induction), insulation (multilayer W/Mo/SS radiation shields), and chamber lining (high-purity tungsten mesh)—meet ASTM E2550 and ISO 11357 standards for high-temperature dimensional stability and emissivity consistency. The system supports GLP-compliant operation through audit-trail-enabled software logging (user actions, parameter changes, calibration events), timestamped video archiving, and export of raw image stacks with embedded metadata (temperature, pressure, frame index, exposure settings).
Software & Data Management
HTC2300’s proprietary analysis suite (v5.2+) provides synchronized acquisition and processing across thermal, imaging, and environmental domains. Video recording initiates automatically upon temperature stabilization or user-defined trigger (e.g., reaching target T, pressure threshold). Each frame is tagged with calibrated temperature, chamber pressure, elapsed time, and stage position. Contact angle values are computed continuously using adaptive edge detection and dynamic baseline correction—accounting for substrate thermal expansion and droplet center-of-mass drift. Export formats include CSV (time–θ–T–P series), MP4 (H.264-encoded video with overlay), and TIFF image sequences. Data files conform to FAIR principles (Findable, Accessible, Interoperable, Reusable) and integrate natively with MATLAB, Python (via provided SDK), and LabVIEW environments. Optional 21 CFR Part 11 compliance package includes electronic signatures, role-based access control, and immutable audit logs.
Applications
- Quantifying wetting behavior of molten Al, Cu, Ni, Ti, and refractory alloys (Mo, W, Nb) on ceramic substrates (Al₂O₃, SiC, ZrO₂, graphite) under controlled pO₂
- Determining critical temperatures for reactive wetting, interfacial compound formation (e.g., Al₄C₃, TiC), and spontaneous spreading in metal–ceramic joining processes
- Mapping solid-state sintering kinetics via in situ monitoring of pore closure, grain boundary migration, and neck growth in oxide and carbide powders
- Characterizing thermal stability of protective coatings (e.g., YSZ, Cr₂O₃) by measuring contact angle hysteresis evolution during cyclic heating–cooling
- Validating thermodynamic models (e.g., Young’s equation extensions for high-T interfaces) using experimentally derived θ(T) curves with <0.01° temporal resolution
FAQ
What is the maximum sustained operating temperature, and how is temperature uniformity ensured across the sample zone?
The HTC2300 supports continuous operation at 2200 °C. Temperature uniformity (±2 °C over 3 mm diameter) is maintained via concentric induction coil geometry, multi-layer reflective shielding, and real-time dual-sensor feedback (W–Re thermocouple + broadband IR pyrometer).
Can the system perform dynamic contact angle measurements during heating or cooling ramps?
Yes. The software synchronizes frame capture, thermal profiling, and angle computation at user-defined intervals (100 ms–10 s), enabling full θ(t,T) trajectory reconstruction during non-isothermal conditions.
Is vacuum-level data logged alongside contact angle results?
Yes. Chamber pressure (measured via capacitance manometer) is sampled at 1 Hz and embedded in all exported datasets and video metadata.
Does the system support custom substrate geometries beyond flat plates?
While optimized for planar samples (5 × 5 × 5 mm max), optional holders accommodate cylindrical rods (Ø ≤ 3 mm) and thin foils (≥25 µm thickness) with mechanical clamping and thermal anchoring.
How is calibration traceability established for both temperature and optical measurements?
Temperature calibration follows NIST-traceable W–Re thermocouple certificates and independent IR validation against blackbody reference sources. Optical scale calibration uses certified stage micrometers imaged at each magnification setting, with software-enforced pixel-to-µm mapping.



