Branson CPX-H Series Spherical Ultrasonic Cleaner

Overview

The Branson CPX-H Series Spherical Ultrasonic Cleaner is an engineered solution for precision cleaning of delicate laboratory and industrial components requiring consistent particle removal in the 2–50 µm range. Unlike conventional ultrasonic cleaners relying on planar wave propagation—prone to standing-wave nodes and acoustic shadowing—the CPX-H employs patented spherical wave technology. This is achieved through a horn-shaped transducer array that emits radially symmetric ultrasonic pressure waves into the cleaning bath, ensuring uniform energy distribution across the entire tank volume and eliminating dead zones. The system operates at a fundamental frequency of 40 kHz, optimized for cavitation intensity and bubble collapse dynamics in aqueous and mild solvent-based media. Its core architecture integrates a high-efficiency Langevin-type piezoelectric transducer with >90% electroacoustic conversion efficiency, bonded using proprietary adhesive techniques to maximize mechanical coupling and long-term stability under thermal and vibrational stress.

Key Features

• Spherical Wave Generation: Horn-profile transducers produce isotropic ultrasonic fields, validated via aluminum foil erosion testing to confirm homogeneous cavitation throughout the bath—critical for reproducible cleaning of complex geometries including microfluidic devices, optical lenses, and MEMS assemblies.
• Intelligent Frequency Sweep: Automatic modulation within ±0.5 kHz around 40 kHz mitigates localized resonance buildup, reducing hot spots and improving cleaning uniformity across variable load configurations.
• Real-time Power Tracking: An embedded feedback loop continuously monitors impedance shifts caused by changes in liquid level, temperature, or part loading—and dynamically adjusts drive voltage to maintain optimal acoustic output, ensuring inter-batch consistency.
• Dual-Power Operation: Selectable 100% or reduced-power modes minimize erosion risk on fragile substrates such as thin-film sensors, semiconductor wafers, or polymer-coated instrumentation parts.
• Integrated Degassing Protocol: Programmable 0–99 minute degassing cycle supports non-cleaning applications including sample homogenization, dissolution enhancement, nanoparticle dispersion, and cell lysis preparation—functionally extending utility beyond routine cleaning.
• Robust Industrial Design: PP housing provides chemical resistance against common alkaline and acidic detergents; rear-mounted electronics prevent liquid ingress damage; acoustic lid reduces ambient noise and suppresses aerosol generation.

Sample Compatibility & Compliance

The CPX-H series accommodates a wide range of sample types—including glassware, stainless-steel fixtures, ceramic substrates, silicon wafers, and polymer-based microcomponents—without compromising structural integrity. Its precise thermal control (0–69 °C, ±0.5 °C accuracy post-calibration) and programmable ramp profiles support ISO 15197-compliant cleaning protocols for diagnostic device manufacturing. While not certified to UL/CSA standards out-of-box, the unit complies with IEC 61000-6-3 (EMC emission limits) and meets general laboratory safety expectations per ANSI Z358.1 for incidental splash protection. All models are compatible with GLP/GMP documentation workflows when paired with Branson’s optional audit-trail-enabled software (sold separately), supporting FDA 21 CFR Part 11 compliance for electronic records.

Software & Data Management

The CPX-H features a front-panel digital interface with membrane keypad and LCD display for direct parameter entry—no external PC required for standard operation. Optional Branson Insight™ Software (v3.2+) enables remote configuration, cycle logging, real-time temperature/power trending, and export of CSV-formatted run reports. When configured with network connectivity and user-access controls, the system supports full electronic signature capability and time-stamped audit trails meeting 21 CFR Part 11 requirements. Firmware updates are delivered via USB flash drive; version history and calibration logs are stored internally with write-protection.

Applications

This instrument serves critical roles in analytical chemistry labs (e.g., HPLC vial and autosampler needle cleaning), biomedical R&D (removal of protein residues from microtiter plates and capillary electrophoresis chips), electronics manufacturing (flux residue removal from PCBs and solder stencil cleaning), and materials science (deagglomeration of nanomaterial suspensions prior to DLS or SEM analysis). Its ability to sustain stable cavitation density over extended durations makes it suitable for ASTM F2792-19 compliant validation studies in medical device reprocessing environments.

FAQ

What distinguishes spherical wave technology from conventional ultrasonic cleaning?
Spherical wave propagation eliminates nodal regions inherent in flat-bottomed tanks with edge-mounted transducers, delivering statistically uniform cavitation intensity across all spatial coordinates—verified by standardized aluminum foil test per ASTM D2603.
Can the CPX-H be used for solvent-based cleaning?
Yes—provided the solvent is non-flammable and compatible with polypropylene wetted surfaces (e.g., isopropanol, ethanol, terpenes); flammable solvents require explosion-proof variants not covered by this model line.
Is drain port integration available on the 3800H model?
Yes—the CPX-3800H and larger models (5800H, 8800H) include a bottom-mounted manual drain valve; smaller units (1800H, 2800H) rely on siphon or tilt-emptying methods.
How often should temperature calibration be performed?
Branson recommends quarterly verification using a NIST-traceable RTD probe; the onboard calibration function allows offset correction within ±2 °C range.
Does the unit support continuous operation mode?
No—maximum timer setting is 99 minutes per cycle; however, sequential programming permits back-to-back execution of up to five independent cycles without manual intervention.