MiXran Meg1006 UV-Fused Silica Plano-Concave Lens

Overview

The MiXran Meg1006 is a precision-engineered plano-concave lens fabricated from high-purity, synthetic UV-grade fused silica. Designed for demanding ultraviolet optical systems—including spectroscopy, excimer laser beam expansion, collimation of UV light sources, and vacuum UV (VUV) instrumentation—the Meg1006 leverages the exceptional transmission (>85% at 193 nm, >90% at 248 nm), low thermal expansion (α ≈ 0.55 × 10⁻⁶ /°C), and radiation resistance inherent to Corning 7980-class fused silica. Its plano-concave geometry introduces negative optical power, enabling beam divergence control, virtual image formation, and aberration correction in multi-element UV relay systems. Unlike standard BK7 or N-BK7 lenses, the Meg1006 exhibits negligible solarization under prolonged UV exposure and maintains sub-nanometer surface stability under thermal cycling—critical for alignment-sensitive applications such as EUV metrology tool calibration and synchrotron beamline optics.

Key Features

• UV-optimized fused silica substrate with OH content < 1 ppm, ensuring minimal absorption below 200 nm
• Two coating configurations: uncoated for maximum LIDT in high-peak-power pulsed UV systems (e.g., KrF, ArF excimers), or broadband anti-reflection (BBAR) coating optimized for 250–400 nm (average R < 1.0%, max R < 1.5%)
• Consistent surface figure accuracy: λ/4 wavefront error (WFE) @ 633 nm on plano surface; spherical surface polished to λ/2 WFE
• Diameter options from 4 mm to 25.4 mm; focal lengths spanning −4 mm to −400 mm, all with tight mechanical tolerances (±1% EFL, ±0.1 mm thickness)
• Edge durability enhanced via fine-ground, chamfered edges (0.1–0.2 mm × 45°) to prevent chipping during mounting in kinematic lens cells or SM-threaded mounts
• Traceable metrology: each lens batch accompanied by interferometric surface map reports and spectral transmittance data (200–1100 nm)

Sample Compatibility & Compliance

The Meg1006 is compatible with standard metric and imperial lens mount families including SM-series (SM05, SM1, SM2), RMS, and custom flange-mount configurations. Its UV-grade material meets ASTM F2734–19 requirements for optical components used in semiconductor photolithography equipment and complies with ISO 10110-1 (general tolerances), ISO 10110-7 (surface imperfections), and ISO 9022-3 (environmental testing—thermal shock, humidity). All coated variants are validated per MIL-C-48497A for adhesion and abrasion resistance. The lens is RoHS 2015/863/EU compliant and manufactured in an ISO 9001:2015 certified facility with full traceability to raw material lot numbers and polishing process logs—supporting GLP/GMP documentation requirements for regulated R&D environments.

Software & Data Management

While the Meg1006 is a passive optical component, MiXran provides downloadable optical design support resources: Zemax OpticStudio-compatible .ZAR files for all standard diameters and focal lengths, including full dispersion data (Sellmeier coefficients for fused silica), coating spectral reflectance curves (.CSV), and tolerance sensitivity analyses. These assets integrate directly into automated optical system simulation workflows. For quality assurance, customers receive digital certificates of conformance (CoC) with embedded spectral transmittance plots and interferometric surface maps—exportable in TIFF and HDF5 formats for archival in LIMS or ELN platforms. All data packages adhere to ISO/IEC 17025:2017 clause 7.8.2 for result reporting integrity.

Applications

• Excimer laser beam shaping: diverging collimated beams in lithography stepper illumination systems
• Vacuum UV spectrometer fore-optics: correcting spherical aberration in monochromator input arms
• UV fluorescence microscopy: generating uniform illumination fields via telecentric relay designs
• Photoelectron spectroscopy (PES) beamlines: pupil-matching optics between electron analyzers and UV photon sources
• UV-curable resin processing optics: high-LIDT elements in industrial DLP and SLA projection engines
• Astronomical instrumentation: field-flattening correctors in far-UV space telescope focal planes (e.g., heritage use in HST/COS calibration optics)

FAQ

What is the damage threshold for the UV-coated Meg1006 under 193 nm excimer laser exposure?
For 20 ns pulses at 10 Hz repetition rate, the typical LIDT is ≥5 J/cm² (uncoated) and ≥3 J/cm² (UV-BBAR coated). Exact values depend on beam profile homogeneity and pulse duration; test reports available upon request.
Can the Meg1006 be used in vacuum environments below 10⁻⁶ Torr?
Yes. Fused silica outgassing rates meet NASA ASTM E595 specifications (<1.0% TML, <0.1% CVCM), and no organic adhesives or coatings are used in fabrication.
Is custom radius or diameter available beyond the standard catalog?
Yes. MiXran offers OEM customization—including non-standard radii, wedge-controlled substrates, and ITO or metal-dielectric hybrid coatings—under NDA with lead times starting at 6 weeks.
How is center thickness measured for quality control?
Using dual-wavelength laser interferometry (633 nm + 1550 nm) to eliminate thermal drift errors; reported values include uncertainty budgets per GUM (JCGM 100:2018).
Do you provide mounting recommendations for minimizing stress-induced birefringence?
Yes. We supply detailed kinematic mounting guidelines—including recommended torque values for nylon-tipped setscrews, pad material selection (indium foil vs. Viton), and finite-element stress simulations for each diameter/focal length combination.