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MiXran Meg1086 Fused Silica Elliptical Mirror

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Brand MiXran
Model Meg1086
Substrate Material Fused Silica
Shape Elliptical
Short Axis (A) 12.5–50 mm
Long Axis (B) 17.6–70.7 mm
Thickness 6–12.5 mm
Coating Options High-Reflectivity Dielectric (D02: 400–800 nm, D03: 750–1250 nm)
Surface Quality λ/10 @ 633 nm (typ.)
Damage Threshold >5 J/cm² @ 1064 nm, 10 ns, 10 Hz

Overview

The MiXran Meg1086 is a precision-engineered fused silica elliptical mirror designed for high-fidelity beam shaping, focusing, and optical relay applications in demanding laser and spectroscopic systems. Unlike spherical or parabolic mirrors, elliptical mirrors exploit the geometric property that light originating from one focal point is reflected with high spatial fidelity to the second focal point—enabling diffraction-limited image transfer, efficient coupling into single-mode fibers, and compact folded-path spectrometer designs. Constructed from synthetic fused silica (SiO₂), the Meg1086 offers exceptional UV-VIS-NIR transmission, ultra-low thermal expansion (α ≈ 0.55 × 10⁻⁶ /°C), and outstanding resistance to laser-induced damage—critical for pulsed laser systems operating at nanosecond pulse widths and multi-watt average powers. Its monolithic substrate eliminates bonding interfaces, ensuring long-term wavefront stability under thermal cycling and mechanical stress.

Key Features

  • Precision-ground and polished fused silica substrate with surface flatness ≤ λ/10 @ 633 nm (measured via interferometry)
  • Elliptical geometry optimized for 1:1 or adjustable magnification optical relays—ideal for confocal microscopy, cavity dumping, and ultrafast amplifier staging
  • Two standard high-reflectivity dielectric coatings: D02 (R > 99.5% @ 400–800 nm, AOI = 45°) and D03 (R > 99.3% @ 750–1250 nm, AOI = 45°), both deposited via ion-assisted e-beam evaporation
  • Low birefringence (< 5 nm/cm) and negligible fluorescence across UV to NIR—validated per ISO 10110-7
  • Edge-deepened mounting groove compatible with standard kinematic mirror mounts (e.g., Thorlabs KM100, Newport UMB12)
  • Full traceability: Each unit supplied with individual test report including spectral reflectance curve, surface roughness (≤ 0.3 nm RMS), and wavefront error (PV < 0.15 λ)

Sample Compatibility & Compliance

The Meg1086 is compatible with collimated or convergent beams incident at 45° ± 2°, supporting polarization-maintaining operation without significant retardance. It meets ISO 9001:2015 manufacturing controls and conforms to ISO 10110 optical component standards for surface quality, coating uniformity, and environmental durability (MIL-STD-810G compliant for thermal shock and vibration). All coatings undergo adhesion testing per ISO 2812-3 and humidity resistance validation per IEC 60068-2-30. The fused silica substrate is certified free of heavy metals per RoHS Directive 2011/65/EU and carries CE marking for optical safety (EN 60825-1:2014). For regulated environments—including GLP-compliant analytical labs and FDA-regulated photonic medical device R&D—the mirror’s batch-controlled production and documented metrology support audit-ready traceability.

Software & Data Management

While the Meg1086 is a passive optical component, its integration into automated optical systems benefits from standardized metadata handling. Each product is assigned a unique 12-digit serial code (e.g., GM24-050-D03-XXXXXX) registered in MiXran’s Component Lifecycle Database—accessible via secure portal for download of calibration certificates, spectral data files (.csv, .spectrum), and Zemax-compatible coating dispersion models. Integration with LabVIEW, MATLAB, or Python-based alignment routines is supported through ASCII-formatted optical parameter sheets (focal length, conic constant, coating dispersion coefficients). Full revision history, coating lot numbers, and interferometric map archives are retained for ≥10 years to satisfy 21 CFR Part 11 electronic record requirements where applicable.

Applications

  • Ultrafast Ti:sapphire and Yb:fiber laser cavities requiring low-dispersion, high-damage-threshold folding optics
  • Femtosecond pump-probe setups where temporal pulse fidelity depends on group delay dispersion (GDD) minimization—fused silica contributes < 5 fs²/mm over 700–900 nm
  • Elliptical relay arms in FTIR spectrometers and Czerny-Turner monochromators to preserve étendue and minimize aberrations
  • VUV-compatible beam delivery in synchrotron beamlines (with optional MgF₂ overcoat upon request)
  • Quantum optics experiments involving entangled photon pair collection, where polarization extinction ratio >100,000:1 is maintained across both D02 and D03 bands
  • Industrial laser material processing heads requiring stable focus positioning over extended thermal transients

FAQ

What is the maximum incident power density the Meg1086 can withstand without coating degradation?
For continuous-wave (CW) operation at 1064 nm, the D02 and D03 coatings sustain ≤ 5 kW/cm²; for pulsed operation (10 ns, 10 Hz), the damage threshold exceeds 5 J/cm²—verified per ISO 21254-1.
Can custom focal lengths or off-axis angles be specified?
Yes—MiXran offers OEM customization including non-standard eccentricities (e < 0.85), substrate thickness tuning for GDD compensation, and AOI-specific coating designs (e.g., 0°, 30°, or 60° incidence); lead time +4 weeks.
Is wavefront distortion measured per unit, or is it a typical specification?
Each Meg1086 mirror undergoes full-aperture interferometric verification (Zygo GPI XP); wavefront error (PV) is reported individually on the certificate of conformance.
Are mounting hardware and alignment adapters included?
No—mounting solutions are selected based on application-specific kinematic stability and thermal management requirements; recommended accessories include low-stress flexure mounts and Invar-based baseplates.
Do you provide vacuum-compatible versions?
All standard Meg1086 units are UHV-compatible (outgassing rate 98% broadband reflectance.

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