Quantus LP100 Low-Pressure Optical Emission Spectrometer

Overview

The Quantus LP100 Low-Pressure Optical Emission Spectrometer is an engineered solution for real-time, in-situ plasma monitoring and gas-phase composition analysis in vacuum-based thin-film processing environments. Operating on the principle of optical emission spectroscopy (OES), the instrument detects characteristic atomic and molecular emission lines generated during plasma excitation—enabling quantitative and qualitative identification of reactive species, process byproducts, and residual background gases. Designed specifically for integration into low-pressure process chambers (10 mTorr to 1 Torr), the LP100 eliminates the need for auxiliary pumping systems, leveraging its optimized optical coupling and KF25 flange interface for direct vacuum port mounting. Its 190–890 nm spectral range covers key diagnostic lines for Ar, O, N, Cl, F, Si, H, and numerous metal precursors used in PVD, CVD, and plasma etch applications—making it a foundational tool for endpoint detection, chamber conditioning verification, and leak diagnostics in semiconductor fabs, flat-panel display (FPD) manufacturing, and photovoltaic production lines.

Key Features

• Plasma excitation frequency compatibility up to 400 MHz—ensuring stable signal acquisition across RF, pulsed DC, and microwave plasma sources
• High-sensitivity CCD-based spectrometer with UV-VIS-NIR coverage (190–890 nm), enabling detection of weak emission lines critical for trace impurity and endpoint signature recognition
• Modular plasma probe assembly with quick-release KF25 vacuum interface—facilitating rapid component replacement without breaking chamber vacuum or requiring specialized tools
• Real-time spectral acquisition at 24 Hz frame rate—supporting dynamic process monitoring, including transient endpoint events in high-rate etch or deposition sequences
• Compact, rack-mountable housing (2U form factor) with integrated thermoelectric cooling—minimizing thermal drift and ensuring long-term wavelength stability
• Low operational cost architecture: no consumables, no calibration gases, and minimal maintenance intervals—validated over >10,000 hours of continuous industrial operation

Sample Compatibility & Compliance

The Quantus LP100 interfaces directly with standard vacuum process chambers via KF25 conflat flanges and is compatible with inert, reactive, and corrosive gas chemistries—including Cl₂, NF₃, O₂, Ar, SiH₄, NH₃, and CF₄-based mixtures. It meets SEMI S2/S8 safety guidelines for semiconductor equipment and conforms to CE marking requirements for electromagnetic compatibility (EMC Directive 2014/30/EU) and low-voltage operation (LVD Directive 2014/35/EU). While not a certified metrology device per ISO/IEC 17025, its spectral response is traceable to NIST-calibrated reference lamps, and raw intensity data supports GLP-compliant audit trails when paired with validated software configurations.

Software & Data Management

The LP100 is operated via Quantus Control Suite v4.x—a Windows-based application supporting both local and remote operation via Ethernet (TCP/IP). The software provides real-time spectral visualization, multi-channel ratio tracking (e.g., Cl/Ar, SiF/Ar), time-resolved intensity profiling, and automated endpoint detection using configurable derivative-threshold algorithms. All spectral data is stored in HDF5 format with embedded metadata (timestamp, pressure, RF power, chamber ID), ensuring compatibility with factory MES systems and statistical process control (SPC) platforms. Audit logging complies with FDA 21 CFR Part 11 requirements when deployed with user authentication, electronic signatures, and immutable data archiving enabled.

Applications

• Plasma etch endpoint detection in SiO₂, SiNₓ, and photoresist removal processes—reducing overetch and improving CD uniformity
• Gas composition verification during PVD sputtering (e.g., Ar/O₂ ratio control in ITO or AlOₓ deposition)
• In-chamber leak detection via background He or H₂ spectral rise monitoring during base pressure stabilization
• Plasma ignition validation and stability assessment across multiple RF frequencies and duty cycles
• Contamination tracking during chamber cleans—identifying residual fluorocarbon or silicon-bearing species post-etch
• Qualification of new precursor chemistries in R&D pilot lines through emission fingerprint library development

FAQ

Does the Quantus LP100 require external vacuum pumping to operate?
No—the instrument is designed for direct installation on chambers operating between 10 mTorr and 1 Torr; no foreline pump or turbomolecular pump is needed for optical access.
Can the LP100 be used with pulsed plasmas?
Yes—its 24 Hz acquisition rate and internal trigger synchronization support gated acquisition aligned to pulse width and repetition frequency.
Is spectral calibration performed in-field?
Factory calibration is performed using Hg/Ar and Ne reference lamps; field verification is supported via optional portable calibration source (part #QCAL-KIT-UVVIS).
What materials are wetted by the optical probe tip?
The plasma-facing window is fused silica; all vacuum-exposed hardware is 316L stainless steel or ceramic—compatible with aggressive halogen chemistries.
How is data exported for SPC integration?
Via TCP/IP socket streaming (ASCII or binary), OPC UA server option, or scheduled HDF5 file export with timestamped metadata tags.