Shumei KQ-AS2000GVDE Dual-Frequency Programmable Temperature-Controlled Ultrasonic Cleaner

Overview

The Shumei KQ-AS2000GVDE is a dual-frequency, microprocessor-controlled ultrasonic cleaning system engineered for high-reproducibility cleaning of precision components, laboratory glassware, semiconductor wafers, medical instruments, and optical assemblies. It operates on the principle of cavitation—generating controlled acoustic pressure waves in liquid media to dislodge particulate contaminants, organic residues, and biofilms from submerged surfaces. Its dual-frequency capability (45 kHz and 80 kHz) enables selective optimization: lower frequency delivers higher energy cavitation for robust particle removal from macro-scale surfaces, while higher frequency provides finer, more uniform cavitation suitable for delicate substrates and sub-micron contamination. Integrated temperature regulation (0–80 °C), programmable duty cycling, and real-time monitoring ensure consistent process control under GLP-compliant laboratory conditions.

Key Features

• Dual-frequency transducer array with independent 45 kHz and 80 kHz excitation channels, configurable via front-panel interface or remote software
• 2000 W total ultrasonic output power, continuously adjustable from 40% to 100% in 1% increments for process optimization and energy efficiency
• Programmable frequency switching interval (0–999 seconds), enabling synchronized alternating-mode operation to enhance cleaning uniformity across heterogeneous loads
• High-capacity 160 L stainless steel tank (800 × 500 × 400 mm internal dimensions), constructed entirely from electropolished AISI 304 stainless steel for corrosion resistance and cleanability
• Integrated thermoelectric heating (9000 W) and active cooling (1500 W) subsystems, maintaining setpoint stability within ±2 °C across full operating range (0–80 °C)
• Motorized noise-reduction cover with safety interlock and position-sensing feedback; electrically actuated inlet and drain valves with flow monitoring
• Real-time digital display of actual and set values for temperature, ultrasonic power, elapsed time, frequency mode, frequency switch timer, and liquid level
• Comprehensive protection logic: low-level detection, dry-run prevention, overtemperature cutoff, overcurrent shutdown, and solution filtration status monitoring

Sample Compatibility & Compliance

The KQ-AS2000GVDE accommodates a wide range of sample geometries—including large-volume reaction vessels, multi-tiered instrument trays, and irregularly shaped industrial parts—without compromising acoustic field homogeneity. Its large tank volume and uniform transducer distribution support ASTM D2299-22 (Standard Practice for Cleaning and Degreasing Metal Surfaces) and ISO 13485:2016 requirements for reusable medical device reprocessing validation. The system’s sealed construction, stainless steel wetted path, and absence of silicone or organic gasket materials meet USP material compatibility guidelines. All electrical systems comply with IEC 61010-1:2010 for laboratory equipment safety, and firmware architecture supports audit-trail generation per FDA 21 CFR Part 11 when connected to validated networked data management platforms.

Software & Data Management

The embedded microcontroller supports RS-485 and optional Ethernet connectivity for integration into centralized lab automation networks. Firmware includes non-volatile memory for up to 99 user-defined cleaning protocols, each storing frequency sequence, power ramp profiles, thermal soak durations, and dwell times. Optional Shumei LabLink™ software (Windows-based) enables remote parameter configuration, real-time telemetry logging (temperature, power, level), and CSV export of time-stamped operational records. All parameter changes are timestamped and logged with operator ID fields, satisfying GLP/GMP documentation requirements for traceability and process validation.

Applications

• Pre-analytical preparation of HPLC vials, GC autosampler inserts, and ICP-MS sample introduction components
• Removal of photoresist residues and metal ion contamination from silicon wafers and MEMS devices
• Decontamination of surgical instruments, endoscopes, and dental handpieces prior to sterilization
• Surface activation and degreasing of aluminum, titanium, and ceramic substrates before coating or bonding
• Cleaning of electron microscopy grids, TEM holders, and quartz crystal microbalance (QCM) sensors
• Support of ISO 14644-1 Class 5–7 cleanroom maintenance protocols through validated residue-free processing

FAQ

What is the purpose of dual-frequency operation in this ultrasonic cleaner?

Dual-frequency operation allows users to alternate between 45 kHz (higher cavitation intensity, suited for heavy particulate removal) and 80 kHz (finer bubble collapse, ideal for sensitive surfaces), improving cleaning efficacy across diverse substrate types without manual intervention.
Does the system support automated process validation documentation?

Yes—when paired with optional LabLink™ software and configured for network logging, it generates time-stamped, operator-identified records of all critical parameters, fulfilling 21 CFR Part 11 electronic record requirements.
Is the cooling system integrated or external?

The 1500 W thermoelectric cooling module is fully integrated into the base chassis, requiring no external chiller connection or coolant circulation loop.
Can the tank be operated without heating or cooling enabled?

Yes—the temperature control subsystem operates independently; users may disable heating/cooling while retaining full ultrasonic functionality and ambient-temperature cleaning.
What safety certifications does the unit carry?

It complies with IEC 61010-1:2010 (Safety Requirements for Electrical Equipment for Measurement, Control, and Laboratory Use) and meets CE marking requirements for EMC and Low Voltage Directive conformity.