VICI Valco HP2 High-Purity Helium and Inert Gas Purifier

Overview

The VICI Valco HP2 is a high-performance, thermally regulated gas purifier engineered for the removal of trace reactive impurities from helium and other inert carrier gases—including argon, neon, krypton, xenon, and radon—used in ultra-sensitive analytical applications such as gas chromatography (GC), residual gas analysis (RGA), mass spectrometry (MS), and semiconductor process monitoring. Unlike catalytic or filtration-based systems, the HP2 employs a non-evaporable getter (NEG) alloy—specifically formulated for high surface-area adsorption and thermal stability—to chemically bind and permanently sequester reactive contaminants at elevated operating temperatures. This sorption mechanism ensures consistent purification performance over extended service life without saturation-induced breakthrough, provided inlet impurity concentrations remain within specified limits (≤10 ppm total reactive impurities). The device operates at up to 1000 psi working pressure and maintains stable thermal equilibrium via an integrated feedback-controlled heater assembly, eliminating cold spots and ensuring uniform getter activation across the entire sorbent bed.

Key Features

• Non-evaporable getter (NEG) technology based on zirconium–vanadium–iron alloy, hermetically sealed in stainless-steel housing for long-term stability and zero outgassing
• Thermally regulated operation with embedded temperature sensor and closed-loop power control to sustain optimal getter activation (typically 350–420 °C)
• CE-marked design compliant with IEC 61000-6-3 (EMC) and IEC 61000-6-2 (immunity) standards for laboratory integration
• In-line mounting configuration compatible with standard 1/4″ or 1/8″ Swagelok® or VCR® fittings; designed for installation upstream of GC injectors or MS inlets
• Modular cartridge architecture enabling field-replacement of the getter element (part no. MNK283165) without system venting or recalibration
• Two voltage variants available: 110 VAC (HP2) and 230 VAC (MNK283129), supporting global laboratory power infrastructure

Sample Compatibility & Compliance

The HP2 is validated for continuous purification of helium, argon, neon, krypton, xenon, and radon at flow rates typical of capillary GC systems (0.5–100 mL/min). It removes sub-ppb levels of H₂O, H₂, O₂, N₂, CO, NO, NH₃, and CO₂ when inlet concentrations are ≤10 ppm. Additional volatile contaminants—including CF₄, CCl₄, SiH₄, and low-molecular-weight hydrocarbons—are also effectively scavenged. The unit does not remove the carrier gas itself nor noble gas isotopes; therefore, it is unsuitable for isotopic enrichment or separation. As a Class I, Division 2 rated device per UL 61010-1, it meets safety requirements for use in general laboratory environments. Documentation supports GLP-compliant instrument qualification, including IQ/OQ protocols aligned with ASTM E2655 and ISO/IEC 17025 guidelines.

Software & Data Management

The HP2 is a standalone hardware purifier with no embedded firmware, network interface, or digital data output. Its operational status is monitored via external infrared pyrometry or thermocouple-based verification during preventive maintenance. Temperature calibration records, replacement cartridge lot traceability, and pressure-drop trending (via upstream/downstream gauges) constitute the primary data management elements required for audit readiness under FDA 21 CFR Part 11 and EU Annex 11 frameworks. Users are advised to log heater activation cycles and cartridge service intervals in their laboratory’s instrument maintenance database to support GMP traceability.

Applications

• Carrier gas purification for high-resolution capillary GC and GC–MS, particularly with electron-capture (ECD), pulsed-discharge helium ionization (PDHID), and atomic emission (AED) detectors
• Ultra-high-purity gas supply for residual gas analyzers (RGAs) in vacuum chamber leak testing and thin-film deposition processes
• Pre-purification stage for cryogenic trapping systems requiring sub-ppb moisture and oxygen levels
• Gas delivery conditioning in semiconductor fab cleanrooms where helium or argon serves as purge or blanket gas
• Reference gas stream conditioning for calibration gas generators used in environmental air monitoring networks

FAQ

What impurities does the HP2 remove—and what does it leave unchanged?

The HP2 reduces H₂O, H₂, O₂, N₂, CO, NO, NH₃, and CO₂ to <10 ppb at the outlet, assuming ≤10 ppm total reactive impurities at the inlet. It does not remove helium, argon, neon, krypton, xenon, or radon—the carrier gases themselves.
Can the HP2 be used with nitrogen gas?

No. For nitrogen purification, VICI offers the NP2 model (part no. MNK283434), which uses a getter formulation optimized specifically for N₂ matrix gas and achieves equivalent <10 ppb removal of the same reactive species.
How often must the getter cartridge be replaced?

Service life depends on cumulative impurity exposure. Under typical GC lab conditions (≤1 ppm average H₂O/O₂), cartridges last 12–24 months. Replacement is indicated by sustained outlet impurity rise above specification or inability to maintain setpoint temperature despite full heater power.
Is the HP2 compatible with high-pressure gas delivery systems?

Yes. Rated for continuous operation at up to 1000 psi (69 bar), the HP2 integrates directly into high-pressure gas manifolds using appropriate pressure-rated fittings and upstream regulators.
Does the HP2 require periodic regeneration?

No. The NEG alloy is activated once during initial heating and remains active until fully saturated. Regeneration is neither possible nor recommended; replacement of the sealed cartridge is the only maintenance procedure.