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| Brand | ASTRO PLASMA |
|---|---|
| Origin | Singapore |
| Model | ASTRO PACTO-100 |
| Etching Principle | 2.45 GHz Microwave Plasma |
| Maximum Substrate Size | 300 × 400 mm |
| Application Scope | Pre-bonding cleaning, surface activation, organic/oxide removal, wafer-level packaging (WLP), PDMS bonding, leadframe and PCB cleaning |
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