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| [Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Benchtop Laboratory GC |
| Detection Principle | Gas Chromatography (GC) |
| Configuration | Dedicated TVOC Analyzer |
| Detection Range | 0–1000 ppm |
| Resolution | < 0.5 µg/m³ (based on 10 L air sample) |
| Accuracy | < 0.5% RSD |
| Response Time | 1–40 min |
| Temperature Control Range | Ambient +3 °C to 450 °C |
| Column Oven Programmable Ramp | Up to 16 stages (expandable) |
| EPC/EFC Precision | ±0.001 psi (pressure), ±0.001 mL/min (flow) |
| Retention Time Reproducibility | < 0.008% RSD |
| Peak Area Reproducibility | < 1.0% RSD |
| Cooling Rate | ≤5 min (350 °C → 50 °C) |
| Dimensions (W×D×H) | 530 × 570 × 506 mm |
| Weight | ≤50 kg] |
| Brand | SciTec |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Product Origin | Domestic (China) |
| Model | GC9800 + HL-800 Dual-Stage Thermal Desorber |
| Detection Principle | Gas Chromatography (GC) |
| Instrument Type | Benchtop Laboratory System |
| Configuration | TVOC Analysis System |
| Detection Range | 0–1000 ppm |
| Resolution | 0.1 ppm |
| Accuracy | ±5% of reading |
| Response Time | <60 s |
| Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Region Category | Domestic (China) |
| Model | GC9800 High-Purity Gas Analyzer |
| Detection Targets | Trace impurity analysis in high-purity gases (He, H₂, N₂, CO₂, CH₄, O₂, CO, NH₃, Ar, etc.) |
| Detector | TC-1H Thermal Conductivity Detector (TCD) |
| TCD Sensitivity | ≥5000–10000 mV·mL/mg (benzene) |
| Baseline Noise | ≤0.01 mV |
| Baseline Drift | ≤0.1 mV/30 min |
| Linear Range | 10⁵ |
| Oven Temperature Range | 8°C above ambient to 400°C |
| Temperature Control Accuracy | ±0.5% |
| Programmable Temperature Ramping | 8-step |
| Ramp Rate | 0–39°C/min (0.1°C/min increment) |
| Ramp Reproducibility | ≤1% |
| Communication Interface | 10/100M Ethernet |
| Remote Control Capacity | Up to 253 units per workstation |
| Column Oven | Large-volume oven with automatic rear-door opening |
| Near-Ambient Operation | Enabled down to ambient +8°C |
| Self-Diagnostic System | Real-time fault localization and type identification |
| Over-Temperature Protection | Independent thermal cutoff for all six temperature zones |
| Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Regional Classification | Domestic (China) |
| Model | HL-800 |
| Instrument Type | Laboratory Benchtop GC System |
| Detection Principle | Gas Chromatography–Flame Photometric Detection (GC-FPD) for Sulfur-Selective Quantification |
| Target Analytes | H₂S, Methanethiol (CH₃SH), Dimethyl Sulfide (DMS), Dimethyl Disulfide (DMDS) |
| Detection Range | 0.1–10 ppm (as sulfur) |
| Column Oven Temperature Program | 100 °C (1 min), then ramp at 5 °C/min to 240 °C |
| Typical Retention Times (H₂S, CH₃SH, DMS, DMDS) | 1.12–1.13 min, 2.72–2.73 min, 6.08–6.10 min, 16.58–16.60 min |
| Detector | Dual-Channel FPD with S-Mode optimization |
| Data Output | Peak Area, Peak Height, Retention Time, Calculated Concentration (ppm) |
| Compliance Framework | Designed for ASTM D5504, ISO 8573-5, and EPA Method 16, supporting GLP-compliant data integrity workflows |
| Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | GC9800 (N/SF₆/FPD) |
| Detection Targets | HCl, SiH₄, CF₄, SO₂F₂, S₂OF₂, S₂OF₁₀ (ppm-level trace impurities in ultra-high-purity SF₆) |
| FPD Sensitivity | ≤5.0×10⁻¹¹ g/s (n-hexadecane) |
| Baseline Noise | ≤0.1 mV |
| Baseline Drift | ≤0.5 mV / 0.5 h |
| Oven Temp Range | 8 °C above ambient to 400 °C |
| Temperature Control Accuracy | ±0.5% |
| Programmable Temperature Steps | 8 |
| Ramp Rate | 0–39 °C/min (0.1 °C/min increment) |
| Retention Time Reproducibility | ≤1% RSD |
| Brand | SciTech |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Region of Origin | Domestic (China) |
| Model | GC2002-N/PDHID |
| Detection Capability | ppb-level trace impurities in ultra-high-purity bulk and specialty gases (e.g., H₂, N₂, O₂, Ar, He, Ne, Kr, Xe, SiH₄, PH₃, B₂H₆, NF₃, Cl₂, F₂, HCl, HF) |
| Detector | VICI Pulsed Discharge Helium Ionization Detector (PDHID) with integrated high-voltage pulse generator and helium purifier |
| Valve System | Four-valve, multi-column configuration with carrier gas purge protection |
| Column Configuration | Separated temperature-controlled pre-column and analytical column |
| Sample Introduction | Pre-flush injection system with low dead-volume sampling loop |
| Communication Interface | Ethernet (10/100 Mbps), PC remote control, embedded chromatography workstation |
| Brand | SCI-TECH |
|---|---|
| Model | GC2002 |
| Detection Principle | Gas Chromatography with Pulsed Discharge Helium Ionization Detection (PDHID) |
| Detector | VICI PDHID (Imported) |
| Column System | Dual Oven, Multi-Valve, Multi-Capillary Column Configuration |
| Temperature Control | 10 Independent Zones, Range: Ambient +3°C to 400°C, Stability: ±0.01°C |
| Cooling Rate | ≤5 min (350°C → 50°C) |
| Detection Limits (ppb) | H₂ (5), O₂ (5), N₂ (5), CO (2), CH₄ (5), CO₂ (5), Ne (5), Ar (5), Kr (5), Xe (10), H₂O (10) |
| Retention Time RSD | <0.01% |
| Peak Area RSD | <3.0% |
| Data Interface | RJ45 Ethernet, Embedded Chromatography Workstation, Remote Control up to 253 Units |
| Display | 10-inch Touchscreen, Real-time Baseline & Chromatogram Visualization |
| Power | 220 V ±10%, 50 Hz ±5%, Max 3000 W |
| Dimensions (W×D×H) | 890 × 570 × 500 mm |
| Weight | 55 kg |
| Operating Environment | 5–35°C, RH ≤85% |
| Compliance | Designed for ISO/IEC 17025-compliant labs |
| Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | OEM Manufacturer |
| Region Category | Domestic (China) |
| Model | GC9800 (N₂/CO₂/THC Configuration) |
| Detection Targets | Trace Impurities in High-Purity Gases (He, H₂, N₂, CO₂, CH₄, CO, O₂, Total Hydrocarbons) |
| Detectors | TCD (TC-1H) + FID + Ni Catalyst Methanizer |
| Temperature Range | 8 °C above ambient to 400 °C |
| Temperature Control Accuracy | ±0.5% |
| Max. Programmed Ramps | 8 steps |
| Ramp Rate | 0–39 °C/min (0.1 °C/min increment) |
| TCD LOD | H₂ ≤ 0.5 ppm, O₂ ≤ 1 ppm, N₂ ≤ 3 ppm |
| FID LOD | CO 0.1–0.2 ppm, THC ≤ 2 ppm (Ar carrier) |
| Linear Range | FID 10⁷, TCD 10⁵ |
| Baseline Noise | FID ≤ 1×10⁻¹³ A, TCD ≤ 10 µV |
| Baseline Drift | FID ≤ 5×10⁻¹³ A/30 min, TCD ≤ 60 µV/30 min |
| Stabilization Time | FID ≤ 1 h, TCD ≤ 2 h |
| Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | OEM Manufacturer |
| Product Category | Domestic |
| Model | GC2002 |
| Detection Targets | Trace Impurity Analysis in High-Purity Gases (He, H₂, N₂, CO₂, etc.) |
| Temperature Control Precision | ±0.01 °C |
| EPC/EFC Pressure Accuracy | 0.001 psi |
| EPC/EFC Flow Accuracy | 0.001 mL/min |
| Column Oven Cooling Time | ≤5 min (350 °C → 50 °C) |
| Max Programmed Temperature Ramps | 16 stages (extendable to unlimited) |
| Detector Options | TCD, FID, ECD, FPD |
| Data Interface | RJ45 Ethernet (TCP/IP), Embedded Chromatography Workstation |
| Remote Control Capacity | Up to 253 units per workstation |
| Brand | Kechuang |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | GC9800N/TFH |
| Detection Targets | Trace impurities in high-purity helium (Ne, O₂, N₂, H₂, CO₂, CH₄), hydrogen, nitrogen, and carbon dioxide |
| Detectors | TCD (TC-1H) + FID + Ni methanizer |
| Minimum Detectable Concentration | Ne: 0.18 ppb v/v, O₂: 0.09 ppb v/v, N₂: 0.08 ppb v/v |
| Temperature Range | 8 °C above ambient to 400 °C |
| Temperature Control Accuracy | ±0.5% |
| Programmable Temperature Ramping | 8-step, 0–39 °C/min (0.1 °C/min increment) |
| Baseline Noise | ≤0.01 mV |
| Baseline Drift | ≤0.1 mV/30 min |
| Linear Range | 10⁵ |
| Column Oven | Motorized auto-back-opening, near-ambient operation (≥8 °C above ambient) |
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