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Shenzhen ZT Instruments Co., Ltd.

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BrandChotest
OriginGuangdong, China
ModelWD4000
Thickness Range150 µm – 2000 µm
3D Surface Topography Resolution (Z)≤ 0.1 nm
Roughness RMS Repeatability±0.005 nm
Supported Wafer Sizes4″, 6″, 8″, 12″
Optical PrincipleSpectral Confocal Dual-Side Scanning + White-Light Interferometry (WLI)
Max XY Travel400 mm × 400 mm
Z Travel75 mm
Scan ModesFull-map, Cross (‘+’), Custom Multi-point
Interferometric Objective Options2.5×, 5×, 10×, 20×, 50×
Reflectivity Range0.05% – 100%
Film Thickness Range (IR Interferometry)37 µm – 1850 µm (n ≈ 1.5)
Minimum Detectable Film Thickness0.4 µm
Vacuum ChuckESD-Safe Perforated Ceramic Vacuum Stage
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BrandChotest
OriginGuangdong, China
ModelWD4000
Measurement PrinciplesSpectral Confocal Reflectometry (thickness), White-Light Interferometry (3D topography)
Wafer Compatibility4″–12″
Max. Scan Area400 mm × 400 mm
Z-Axis Resolution≤ 0.1 nm
Thickness Range150 µm – 2000 µm
Surface Reflectivity Range0.05% – 100%
Roughness RMS Repeatability±0.005 nm
Motion StageGranite-based龙门 with AC servo direct-drive & 0.1 µm encoder resolution
Environmental IsolationActive vibration damping for sub-nm stability
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BrandChotest
OriginGuangdong, China
Manufacturer TypeAuthorized Distributor
Country of OriginChina
ModelWD4000
PriceUSD 420,000 (FOB Shenzhen)
Thickness Range150 µm – 2000 µm
TTV/Bow/Warp Measurement Accuracy±0.1 µm (typical, calibrated per ISO 21287)
Z-Axis Resolution (Interferometry)≤ 0.1 nm
Lateral Scan Area400 mm × 400 mm
Vertical Travel75 mm
Maximum Wafer Size300 mm (12″)
Surface Reflectivity Range0.05% – 100%
Roughness RMS Repeatability≤ 0.005 nm (ISO 25178-6 compliant)
Interferometric Objective Options2.5×, 5×, 10×, 20×, 50×
Spectral Confocal Thickness SensorDual-beam, high-stability SLED source, 90 µm measurement range (n = 1.5), minimum detectable thickness: 0.4 µm
Infrared Interferometry ModuleSLED source, 37–1850 µm range
Scan ModesFull-map, cross (‘X’), star (‘+’), user-defined multi-point
ComplianceISO 5725 (accuracy & precision), ISO 25178-2 (areal texture), ISO 10110-7 (optical surface form), SEMI D39 (wafer geometry), ASTM F39 (silicon wafer bow/warp)
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