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| Brand | BAQ |
|---|---|
| Origin | Germany |
| Model | KaloMAS II S |
| Ball Diameter | 15–40 mm |
| Planar Sample Clamp Range | 50 mm (customizable) |
| Cylindrical Sample Clamp Range | 3–30 mm (customizable) |
| Cross-Stage Travel | 25 × 25 mm |
| Display | 480 × 640 px color LCD |
| Rotational Speed | 50–1000 rpm |
| Grinding Time | Programmable |
| Dimensions (W×D×H) | 300 × 295 × 270 mm |
| Power Supply | 85–264 VAC, 47–63 Hz |
| Weight | ~8 kg |
| Measurable Coating Thickness | 0.3–50 µm |
| Ball Cap Diameter | 0.1–3 mm |
| Thickness Measurement Accuracy | 1–5% (surface roughness dependent) |
| Brand | BAQ |
|---|---|
| Origin | Germany |
| Model | kaloMAX II |
| Measuring Principle | Ball cratering (geometric depth determination via spherical indentation) |
| Thickness Range | 0.3 – 30 µm |
| Ball Diameter | 15 – 30 mm |
| Planar Sample Clamp Range | 50 mm |
| Circular Sample Clamp Range | 3 – 30 mm (customizable) |
| Cross-Stage Travel | 25 × 25 mm |
| Tilt Angle | 60° |
| Drive Shaft Speed | 100–1200 rpm (12 preset values) |
| Cycle Time | 5–180 s (20 preset values) |
| Display | 4-digit speed, 4-digit timer, 1-digit program ID |
| Input Voltage | 85–264 VAC |
| Input Frequency | 47–63 Hz |
| Dimensions (W×D×H) | 300 × 295 × 235 mm |
| Weight | ~8 kg |
| Accuracy | ±1–5% (surface roughness dependent) |
| Optional | Removable clamp base, graded abrasive slurries, high-resolution microscope camera system, kaloSOFT evaluation software, integrated automation-ready configuration |
| Brand | Applytest |
|---|---|
| Model | NMM-1020 |
| Measurement Principle | Eddy Current |
| Power Supply | Rechargeable Lithium Battery (20 h runtime) |
| Minimum Sample Size | 150 × 150 mm (flat) |
| Active Measurement Area | Ø40 mm |
| Measurement Mode | Contact or Non-Contact (non-contact requires optional probe holder) |
| Supported Substrates | Plastic, Glass, Polymer Films, Semiconductor Wafers |
| Bluetooth Data Transfer | Optional |
| Compliance | ISO/IEC 17025-compatible operation environment, supports GLP audit trails |
| Brand | Applied Spectroscopy |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | TranSpec Lite MC-UVNIR-H |
| Wavelength Range | 190–1020 nm |
| Measurement Range | 0.8–100 µm |
| Accuracy | ±0.005 µm |
| Repeatability | ±0.002 µm (per standard WEG test) |
| Brand | Applytest |
|---|---|
| Model | NMM-1020 |
| Measurement Principle | Eddy Current |
| Power Supply | Rechargeable Lithium Battery (20 h runtime) |
| Minimum Sample Size | 150 × 150 mm (flat) |
| Active Measurement Area | Ø40 mm |
| Surface Compatibility | Flat and Curved Substrates (custom calibration profiles supported) |
| Measurement Modes | Contact and Non-Contact (non-contact requires optional probe holder) |
| Connectivity | Bluetooth (optional) |
| Display | Integrated Touchscreen Interface |
| Compliance | Designed for ISO 2360, ASTM B244, and IEC 61000-4-3 compliant operation |
| Software | On-device measurement management with export to CSV/Excel |
| Key Measurables | Al (5–540 nm), In (24–2700 nm), Cr (24–2600 nm), Ti (102–11080 nm), Cu (3–340 nm), Ag (3–310 nm), Sn (21–2300 nm), Ni (12–1280 nm) |
| Brand | AMPTEK |
|---|---|
| Origin | USA |
| Model | FASTSDD |
| Active Area Options | 25 mm² (collimated to 17 mm²) or 70 mm² (collimated to 50 mm²) |
| Energy Resolution | ≤122 eV at 5.9 keV |
| Maximum Count Rate | >1,000,000 cps |
| Peak-to-Background Ratio | 26,000:1 |
| Preamplifier Rise Time | <35 ns |
| Window Options | Beryllium (0.5 mil / 12.5 µm) or Silicon Nitride (C-series / Si₃N₄) |
| Detector Thickness | 500 µm |
| Package | TO-8 |
| Cooling Delta-T | >85 K |
| Noise Performance | Optimized for low electronic noise and high charge collection efficiency |
| Brand | Anton Paar TriTec (formerly CSM Instruments, Switzerland) |
|---|---|
| Origin | Switzerland |
| Model | HIT 300 |
| Instrument Type | Nanoindentation and Scratch Tester |
| Thermal Drift | ≤0.0008 nm/s |
| Frame Stiffness | 10⁸ µN/µm |
| Positioning Accuracy | <1 µm |
| Repeatability | High |
| Compliance | ASTM E2546, ISO 14577, ISO 20519, USP <1089>, GLP/GMP-ready data traceability |
| Brand | Anton Paar TriTec (formerly CSM Instruments, Switzerland) |
|---|---|
| Origin | Switzerland |
| Model | NST³ |
| Instrument Type | Nano Scratch Tester |
| Application Scope | Thin film and coating adhesion, cohesion, scratch resistance, and mechanical integrity assessment for layers < 1 µm thick |
| Key Measurement Capabilities | Critical load (Lc) determination, real-time scratch depth profiling, friction force mapping, elastic recovery quantification, and simultaneous panoramic imaging |
| Brand | AIM Systems (Germany) |
|---|---|
| Origin | Germany |
| Model | CoatPro |
| Measurement Principle | Optical Interferometry & Spectral Reflectance Analysis |
| Measurement Type | Simultaneous Wet-Film and Dry-Film Thickness |
| Substrate Compatibility | Metallic, Polymeric, Glass, Rubber, Composite |
| Surface Geometry Support | Curved, Rough, Internal Walls, Complex Geometries |
| Environmental Rating | ATEX Zone 1 & Zone 2 Certified |
| Cooling Requirement | Passive Air-Cooled (No Water Cooling Required) |
| Data Output | Real-Time Streaming via EtherNet/IP, PROFINET, Modbus TCP |
| Reporting | Automated PDF/CSV Report Generation with Statistical Process Control (SPC) Metrics |
| Compliance | ISO 2808, ASTM D7091, EN ISO 19840, IEC 60079-0/-11, FDA 21 CFR Part 11 (Audit Trail Enabled) |
| Brand | Haoyuan |
|---|---|
| Origin | Jilin, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | XAFS2300+ |
| X-ray Source Power (XAFS mode) | 3 kW |
| X-ray Source Power (XES mode) | 50 W |
| Monochromatic Photon Flux | > 2 × 10⁶ photons/sec (at 7–9 keV) |
| Minimum Detectable Elemental Concentration | ≥ 1 wt% |
| Tunable X-ray Absorption Energy Range | 4.5–25 keV |
| Energy Resolution | 0.5–3 eV |
| Energy Scale Drift Reproducibility | < 50 meV per measurement session |
| Monochromator Architecture | Spherical-bent crystal on high-precision Rowland-circle geometry |
| Detector | High-resolution silicon drift detector (SDD) |
| Brand | CKIC |
|---|---|
| Origin | Hunan, China |
| Model | 5E-AF3000 |
| Maximum Temperature | 1600 °C |
| Sample Capacity | 5 ash cones per run |
| Temperature Control Accuracy | ±1 °C/min (under stable voltage) |
| Imaging System | Integrated CCD camera with real-time high-temperature imaging |
| Image Resolution | ~0.12 mm/pixel (typical spatial resolution) |
| Atmosphere Options | Oxidizing, Weakly Reducing (carbon-sealing method), Weakly Reducing (gas-flow method with H₂/CO₂ or CO/CO₂ mixtures) |
| Compliance | Designed to meet GB/T 219 requirements |
| Brand | Thicktest |
|---|---|
| Origin | Shaanxi, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | Domestic (China) |
| Model | SKT-500 |
| Pricing | Upon Request |
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