Aolong ALYX-500 Automatic X-ray Crystal Orientation Instrument
| Brand | Aolong |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Manufacturer |
| Origin Category | Domestic (China) |
| Model | ALYX-500 |
| Price | Upon Request |
| Input Power | 220 V AC, 50 Hz, 0.3 kW |
| X-ray Tube | Cu anode, air-cooled, 30 kV, 0–5 mA |
| Detector | Geiger–Müller counter |
| Angular Range | θ = −10° to +50°, 2θ = −10° to +100° |
| Angular Resolution | Digital readout with programmable positioning |
| Beam Shutter | Motorized |
| Dimensions | 700 × 530 × 1400 mm (L × W × H) |
| Weight | 100 kg |
Overview
The Aolong ALYX-500 Automatic X-ray Crystal Orientation Instrument is a precision benchtop diffractometer engineered for non-destructive crystallographic orientation analysis of single-crystal wafers—primarily sapphire (Al2O3), silicon carbide (SiC), quartz, lithium niobate (LiNbO3), and other optoelectronic or piezoelectric substrates. It operates on the Bragg diffraction principle: monochromatic Cu Kα radiation (λ = 1.5418 Å) is directed onto the sample surface; angular scanning of the incident and diffracted beams enables precise determination of lattice plane orientation relative to the physical wafer geometry. Unlike full-scale XRD systems, the ALYX-500 is purpose-built for rapid, high-reproducibility orientation verification in crystal slicing, lapping, and epitaxial growth preparation workflows—where alignment accuracy directly impacts device yield and layer uniformity.
Key Features
- Computer-controlled goniometric stage with digital angular encoders enabling repeatable positioning within ±0.02° over the full θ/2θ range
- Integrated motorized beam shutter compliant with IEC 61000-6-3 and IEC 61000-6-4 electromagnetic compatibility standards
- Real-time intensity acquisition via Geiger–Müller detector with pulse-height discrimination to suppress noise from scattered radiation
- Automated peak search algorithm that identifies primary diffraction maxima, calculates angular deviation from ideal Miller indices, and quantifies full-width-at-half-maximum (FWHM) as a proxy for mosaic spread
- Modular software architecture supporting user-defined measurement protocols—including multi-point mapping across wafer surfaces to assess orientation homogeneity
- Robust mechanical design with vibration-damped baseplate and rigid aluminum frame to minimize thermal drift and mechanical hysteresis during extended operation
Sample Compatibility & Compliance
The ALYX-500 accommodates circular and rectangular wafers up to Ø150 mm or 100 × 100 mm, with thicknesses ranging from 0.3 mm to 5 mm. Samples are mounted manually on a kinematic stage with three-point contact and vacuum-assisted clamping to ensure planar stability during angular rotation. The instrument complies with national safety regulations for Class II X-ray generating equipment (GBZ 138–2017) and incorporates interlocked shielding housing rated for ≤1 µSv/h at 5 cm from any external surface under normal operating conditions. All operational logs—including tube voltage/current settings, exposure duration, and angular coordinates—are timestamped and stored locally in accordance with GLP documentation requirements.
Software & Data Management
The proprietary ALYX Control Suite runs on Windows 10/11 (64-bit) and provides dual-mode operation: guided wizard-based measurement for routine orientation checks, and advanced script-driven mode for batch processing and custom scan definitions. Raw diffraction data are saved in ASCII-compatible .xy format for third-party analysis (e.g., in OriginLab or Python-based tools). Measurement reports include annotated diffraction curves, tabulated peak parameters (2θ position, intensity, FWHM), angular deviation vectors, and pass/fail flags against user-specified tolerance thresholds (e.g., ±0.1° for (0001) sapphire c-plane). Audit trails record operator ID, system configuration changes, and calibration events—supporting FDA 21 CFR Part 11 readiness when deployed in regulated manufacturing environments.
Applications
- Pre-epitaxy verification of sapphire substrate orientation prior to MOCVD or MBE growth of GaN-based LEDs and power electronics
- Quality control of SiC wafers used in high-voltage Schottky diodes and MOSFETs, where off-axis cut angles critically influence carrier mobility
- Calibration of crystal saws and lapping machines by correlating measured lattice tilt with mechanical cutting angle
- Rapid screening of boule-to-wafer orientation consistency in crystal production facilities
- Teaching and research applications in solid-state physics laboratories requiring accessible, low-maintenance X-ray diffraction capability
FAQ
What crystal systems can the ALYX-500 characterize?
It supports hexagonal (e.g., sapphire, SiC), cubic (e.g., silicon, diamond), trigonal, and tetragonal crystals—provided the dominant diffraction peak falls within the accessible 2θ range and exhibits sufficient intensity under Cu Kα excitation.
Is the instrument compliant with international radiation safety standards?
Yes—the system meets GBZ 138–2017 (China) and incorporates engineering controls aligned with IEC 61010-1 for laboratory electrical safety and IEC 62495 for X-ray equipment classification.
Can measurement data be exported for statistical process control (SPC)?
Yes—CSV and XML export options are available; peak deviation values can be fed directly into SPC software for real-time trend monitoring across production lots.
Does the ALYX-500 require liquid cooling or external water supply?
No—it uses an air-cooled Cu-target X-ray tube rated for continuous operation at ≤3 mA, eliminating dependency on chillers or plumbing infrastructure.
Is remote operation or network integration supported?
Local Ethernet connectivity enables remote desktop access and file transfer; however, the system does not feature native OPC UA or Modbus TCP interfaces—custom API integration requires coordination with Aolong’s technical support team.
