Pfeiffer Vacuum HiPace 350 Turbo Molecular Pump (Distributed by Shanghai Bohong)

Overview

The Pfeiffer Vacuum HiPace 350 is a high-performance, oil-free turbo molecular pump engineered for demanding ultra-high vacuum (UHV) and extreme high vacuum (XHV) applications. Operating on the principle of momentum transfer—where rapidly rotating turbine blades (up to ~90,000 rpm) impart kinetic energy to gas molecules to direct them toward the exhaust stage—the HiPace 350 achieves exceptional pumping speeds for light gases including hydrogen, helium, and nitrogen. With a nominal nitrogen pumping speed of 300 L/s and an ultimate base pressure of ≤1×10⁻¹⁰ mbar when backed by an appropriate forevacuum pump (e.g., a dry scroll or diaphragm pump), it delivers reliable, contamination-free vacuum generation essential in sensitive analytical and research environments. Its compact cylindrical design (228 mm height × 167.5 mm diameter) and low mass (7.2 kg) enable flexible integration into space-constrained systems—including UHV chambers, load locks, and modular vacuum platforms—without compromising mechanical stability or thermal management.

Key Features

• Optimized rotor dynamics with ceramic ball bearings and active magnetic levitation support in selected configurations, ensuring long service life and minimal vibration transmission.
• High compression ratios: >10¹¹ for N₂, >10⁸ for He, and >10⁷ for H₂—enabling effective isolation of process chambers from foreline backstreaming.
• Multi-directional mounting capability (vertical, horizontal, inverted) without performance degradation, supported by integrated cooling fins and symmetrical thermal expansion design.
• Integrated temperature monitoring and overheat protection circuits compliant with IEC 61800-5-1 for safe operation under variable load conditions.
• Standard DN 100 ISO-K or CF-F inlet flange options, compatible with common UHV chamber interfaces and ISO-standard vacuum components.
• Motor drive operating at 1100 Hz frequency for precise rotational control and stable speed regulation across ambient temperature ranges from 10 °C to 40 °C.

Sample Compatibility & Compliance

The HiPace 350 is designed for use with inert, non-corrosive, and non-condensable gases typical in physical sciences and semiconductor processing environments. It is not rated for solvent vapors, reactive halogenated compounds, or particulate-laden streams without upstream trapping. All variants meet international safety and electromagnetic compatibility standards, including UL 61010-1 (Laboratory Equipment), CSA C22.2 No. 61010-1, SEMI S2-0218 (Safety Guidelines for Semiconductor Manufacturing Equipment), and NEMA 12 (dust-tight and drip-resistant enclosure rating). The pump’s construction materials—stainless steel housing, nickel-aluminum alloy rotor blades, and PTFE-sealed electronics—ensure compatibility with cleanroom Class 100/ISO 5 environments and resistance to outgassing per ASTM E595 requirements.

Software & Data Management

The HiPace 350 operates seamlessly with Pfeiffer’s TC series controllers (TC 110, TC 120, TC 400), offering RS-485 digital communication for remote monitoring and control via Modbus RTU protocol. Controller firmware supports real-time parameter logging—including rotational speed, bearing temperature, motor current, and error codes—with timestamped data export in CSV format. Audit trails and user-access levels align with GLP/GMP documentation requirements; optional TC 400 units provide 21 CFR Part 11–compliant electronic signatures and secure data archiving when paired with validated PC-based software (e.g., Vacuum Control Suite v4.x). All controller units feature front-panel LED indicators, analog setpoint inputs, and programmable interlocks for interlocked vacuum system sequencing.

Applications

• Mass spectrometry (Q-TOF, Orbitrap, GC-MS, MALDI-TOF) requiring stable, hydrocarbon-free vacuum below 1×10⁻⁹ mbar.
• Scanning and transmission electron microscopy (SEM/TEM), where beam path integrity depends on minimizing residual hydrocarbon deposition.
• Surface science techniques including XPS, AES, and LEED, which demand ultra-clean UHV conditions (<1×10⁻¹⁰ mbar) and low photon-stimulated desorption rates.
• R&D-scale thin-film deposition (sputtering, evaporation, ALD) and plasma etching systems requiring rapid pump-down and stable process pressure control.
• Particle accelerator beamlines and fusion diagnostics, where high pumping speed for hydrogen isotopes and minimal magnetic interference are critical.

FAQ

What forevacuum pump is required to operate the HiPace 350?
A backing pump capable of achieving ≤10 mbar at the HiPace 350’s exhaust port is mandatory. Dry scroll pumps (e.g., Pfeiffer DuoLine series) or diaphragm pumps with ≥10 m³/h displacement are recommended to maintain oil-free operation.
Can the HiPace 350 be mounted upside-down?
Yes—its symmetrical rotor geometry and dual-bearing support allow full 360° orientation without loss of pumping performance or accelerated wear.
Is the HiPace 350 compatible with corrosive process gases?
No. It is rated only for inert and non-reactive gases. For chlorine, fluorine, or ammonia-containing processes, consult Pfeiffer’s ChemRange line or implement cold traps and chemical scrubbers upstream.
Does the pump include built-in diagnostics?
Yes. All models feature onboard microcontroller-based diagnostics reporting rotor speed deviation, thermal anomalies, power supply faults, and communication timeouts via controller display or serial interface.
What is the typical maintenance interval under continuous operation?
Under clean, stable operating conditions, the HiPace 350 requires no scheduled maintenance for 15,000–20,000 hours. Annual verification of controller calibration and visual inspection of flange seals are recommended per ISO 27001-aligned lab SOPs.