KJG OTF-1200X-5S Benchtop Opening-Type Large-Diameter Tube Furnace
| Brand | KJG (Hefei Kejing) |
|---|---|
| Origin | Anhui, China |
| Model | OTF-1200X-5S |
| Max Operating Temperature | 1000 °C (≤1 hr), Continuous: 900 °C |
| Temperature Uniformity | ±1 °C over 100 mm (isothermal zone), ±2 °C over 140 mm |
| Heating Rate | 20 °C/min |
| Control Accuracy | ±1 °C |
| Power | 3 kW |
| Voltage | 220 VAC, 50/60 Hz |
| Tube Dimensions | 130 mm O.D. × 120 mm I.D. × 640 mm L |
| Heating Zone Length | 300 mm |
| Weight | 48 kg |
| Certification | CE, UL/MET/CSA compliant for all components >24 V |
Overview
The KJG OTF-1200X-5S is a CE-certified, benchtop-opening tube furnace engineered for precise thermal processing under controlled atmosphere or vacuum conditions. Designed with a large-diameter quartz tube (130 mm O.D.), it supports uniform heating of substrates up to 4-inch wafers and accommodates extended sample geometries. Its dual-layer shell construction incorporates high-purity alumina fiber insulation and a high-emissivity aluminum oxide coating—enhancing thermal efficiency, minimizing radial temperature gradients, and ensuring axial stability across the 300 mm heating zone. The furnace operates on resistive heating with PID-based temperature regulation and features an integrated safety architecture including over-temperature cutoff and thermocouple break detection. It is rated for continuous operation at 900 °C and short-term exposure up to 1000 °C, with strict adherence to IEC 61000-6-3 (EMC) and IEC 61000-6-2 (immunity) standards.
Key Features
- Opening-type design enables rapid access to the furnace chamber without disassembling flanges—ideal for iterative sample loading/unloading in R&D workflows.
- High-purity fused quartz tube (130 mm O.D., 120 mm I.D., 640 mm L) with optional quartz end plugs for improved vacuum integrity and particulate control.
- Stainless steel vacuum flanges: right-side KF25 port for mechanical pump connection; left-side 1/4″ VCR fitting with analog pressure gauge (–0.1 to 0.15 MPa range).
- 30-segment programmable temperature controller with ramp/soak capability; optional Eurotherm 3504 controller compatible with LabVIEW™ for automated process scripting and data logging.
- Water-cooled hinge flange (optional) enables safe operation up to 1100 °C by mitigating thermal stress at the seal interface.
- UL/MET/CSA-certified electrical components (>24 V) meet North American safety requirements; TÜV or CSA single-unit certification available upon request.
Sample Compatibility & Compliance
The OTF-1200X-5S is routinely deployed in semiconductor annealing, catalyst activation, thin-film sintering, and precursor decomposition studies where atmospheric purity, thermal repeatability, and pressure management are critical. Its quartz tube complies with ASTM F798 for semiconductor-grade silica purity. Vacuum performance reaches ≤10−2 Torr using a standard rotary vane pump; optional digital corrosion-resistant vacuum gauge (3.8×10−5–1125 Torr) supports multi-gas calibration-free measurement above 10 mbar. For GLP/GMP-aligned environments, the optional MTS02-B module provides audit-trail-capable temperature logging compliant with FDA 21 CFR Part 11 when paired with validated software. All operational limits—including maximum internal pressure (0.02 MPa), gas flow rate (<200 SCCM), and mandatory use of inline pressure regulators—are defined per ISO 10012:2003 (metrological confirmation systems) and IEC 61508 (functional safety of electrical systems).
Software & Data Management
Temperature profiles are configured via front-panel interface or external PC using RS485/Modbus RTU protocol. The optional MTS02-B module delivers real-time temperature acquisition at 1 Hz resolution, stores up to 100 programs, and exports CSV-formatted logs with timestamps, setpoints, and measured values. When integrated with Eurotherm 3504, the system supports LabVIEW™ driver libraries and OPC UA connectivity—enabling synchronization with MES platforms for traceability in regulated manufacturing. Data integrity safeguards include write-protected memory, cyclic redundancy checks (CRC), and configurable alarm thresholds with email/SNMP notification (via gateway add-on). All firmware updates undergo regression testing against IEC 62304 Class B software lifecycle requirements.
Applications
- Solid-state synthesis of Li-ion battery cathodes (e.g., NMC, LFP) under Ar/H2 atmospheres.
- Graphene CVD growth on Cu/Ni foils using CH4/H2 mixtures at 1000 °C.
- Post-deposition annealing of ALD-grown HfO2 gate dielectrics on Si wafers.
- Thermal gravimetric analysis (TGA) coupling via optional quartz microbalance integration.
- Low-pressure chemical vapor infiltration (LPCVI) of ceramic matrix composites.
FAQ
Can this furnace operate under full vacuum at 1000 °C?
No. At temperatures exceeding 1000 °C, the quartz tube must be maintained at ambient pressure to prevent devitrification and mechanical failure. Vacuum operation is restricted to ≤1000 °C with active pressure monitoring.
What is the recommended gas pressure regulator specification?
A precision regulator with 0.01–0.1 MPa range and stainless-steel diaphragm is required. KJG-supplied regulators meet ISO 8503-2 surface finish and leak-tightness Class VI standards.
Is the isothermal zone length verified per ASTM E220?
Yes. Calibration reports (traceable to NIST SRM 1750a) document ±1 °C uniformity over 100 mm at 900 °C using 5-point thermocouple mapping per ASTM E220 Annex A3.
Can I integrate a custom thermocouple for direct sample temperature measurement?
Yes. Optional K-type armored thermocouples insert through dedicated feedthrough ports on the flange, enabling in-situ measurement with ≤±0.5 °C uncertainty at 900 °C.
Does the furnace support automated purge cycles?
Not natively—but programmable ramp/soak sequences combined with external mass flow controllers (MFCs) enable repeatable inert-gas purging protocols compliant with SEMI S2-0201 safety guidelines.
