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| Brand | ZENO |
|---|---|
| Model | QUASAR-S Series |
| Application | In-line optical metrology for semiconductor wafer fabrication |
| Wafer Sizes | 150 mm (6″), 200 mm (8″), 300 mm (12″) |
| Measurement Principle | Spectroscopic Ellipsometry (SE) and Spectral Reflectometry (SR) |
| Spectral Range | UV–Vis–NIR (e.g., 190–1700 nm) |
| Thickness Resolution | ≤ 0.005 nm (3σ) |
| Throughput | Up to 120 wafers/hour |
| Sample Interfaces | Open cassette, SMIF pod, FOUP |
| Measurement Capabilities | Single-layer & multi-layer film thickness, refractive index (n), extinction coefficient (k), patterned & unpatterned wafer alignment, waferless recipe setup |
| Compliance | Designed for integration into ISO Class 1–5 cleanroom environments |
| Software | ZENO MetroSuite™ with audit trail, user access control, and 21 CFR Part 11–compliant electronic records |
| Brand | ZENO |
|---|---|
| Model | R100 |
| Origin | Shanghai, China |
| Type | Benchtop Spectral Reflectometer |
| Measurement Principle | Broadband Spectral Reflectance Analysis (350–1000 nm) |
| Sample Compatibility | 4–8 inch wafers, square substrates, irregular shapes |
| Measurable Parameters | Film Thickness, Refractive Index (n), Extinction Coefficient (k), Reflectance (R) |
| Repeatability | ≤±0.15 nm (for 500 nm SiO₂ on Si, n=30) |
| Optical Spot Size | Standard 2 mm Ø |
| Software | ZENO-Metro v4.x with GLP-compliant audit trail, data export (CSV, XML), and ASTM E2372-22 compliant reporting |
| Compliance | ISO/IEC 17025-ready workflow architecture, supports FDA 21 CFR Part 11 electronic signature configuration |
| Brand | ZENO |
|---|---|
| Model | E100 |
| Type | Spectroscopic Ellipsometer |
| Form Factor | Benchtop |
| Measurement Principle | Null- and Rotating-Analyzer-Based Spectroscopic Ellipsometry (SE) |
| Wavelength Range | 240–1700 nm (configurable UV-VIS-NIR) |
| Spot Size | Standard 3 mm Ø |
| Substrate Compatibility | 4″ to 12″ wafers, irregular shapes, rigid/flexible substrates |
| Measured Parameters | Film thickness (sub-nm resolution), complex refractive index (n + ik), extinction coefficient (k), interfacial roughness, optical bandgap |
| Precision | ≤0.01 nm RMS repeatability on SiO₂/Si reference samples (t < 30 nm, n=30 measurements) |
| Compliance | ASTM F1599, ISO 15632, SEMI MF1530 |
| Software | ZENO-EllipSuite v4.x with GLP-compliant audit trail, user role management, and 21 CFR Part 11-ready data export |
| Automation Options | Motorized XYZ stage, auto-alignment module, wafer handler integration |
| Origin | Shanghai, China |
| Distribution | Authorized Global Distributor Network |
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