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| Brand | EULITHA AG |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Template |
| Pricing | Upon Request |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | Laser MBE |
| Vacuum Class | Ultra-High Vacuum (UHV) |
| Base Pressure | ≤5×10⁻¹⁰ mbar (typical) |
| Substrate Heater | Resistive, 100–1000 °C (±0.5 °C stability) |
| Target Capacity | Up to 5 × 1-inch targets on rotating carousel |
| Laser Integration | Nd:YAG or excimer laser compatible (193–266 nm, pulse energy up to 500 mJ, repetition rate 1–10 Hz) |
| Load-Lock Capacity | 5 substrates + 2 target carousels |
| In-situ Diagnostics Ports | RHEED, OES, FTIR, QMS (CF-63/CF-100 flanges) |
| Automation Level | Fully programmable deposition sequence with real-time parameter logging and audit trail |
| Compliance | Designed for GLP/GMP-aligned lab environments |
| Brand | Klocke Nanotechnik |
|---|---|
| Origin | Germany |
| Model | Micro Production |
| Type | Precision Nanomanipulation & 3D Coordinate Metrology Platform |
| Application Domain | Semiconductor Process Development, In-situ SEM/TEM Nanomanipulation, MEMS/NEMS Characterization, Nanofabrication Integration |
| Compliance | Designed for ISO 14644-1 Class 5 cleanroom environments |
| Positioning Resolution | Sub-nanometer (≤1 nm) in X/Y/Z |
| Force Sensing Capability | Integrated piezoresistive microforce feedback (mN range) |
| Vacuum Compatibility | Fully compatible with high-vacuum SEM/TEM chambers (10⁻⁷ mbar and below) |
| Interface | Standardized flange mounts (CF, KF, or custom) for JEOL, Zeiss, Thermo Fisher (FEI), Hitachi, TESCAN, and Raith systems |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | PLD-Workstation |
| Excimer Laser | Coherent COMPexPro 201F or 205F (248 nm) |
| Laser Gas | 20 L premixed KrF gas + 10 L He |
| Process Gases | 2× Mass Flow Controllers (MFC) |
| Substrate Heater | 2" up to 850 °C or 1"/3" up to 1000 °C |
| Substrate Rotation | 0–50 RPM |
| Target Carousel | 4×2" targets, rotation 0–50 RPM |
| Vacuum Chamber | Modular flanged design with multiple CF/NW ports |
| Control System | PC-based LabVIEW software with integrated TFT display |
| Dimensions | ~2200 × 850 × 1600 mm |
| Power Supply | 3×400 VAC/50 Hz or 3×208 VAC/60 Hz |
| Cooling | Integrated chiller unit |
| Compliance | CE-marked, Class 1 laser enclosure per IEC 60825-1 |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Type | Imported Chemical Reagent |
| Product Line | AR-N (Negative Tone), AR-P (Positive Tone), CAR (Chemical Amplified Resist), E-Beam Resists |
| Compliance | ISO 9001-certified manufacturing, compatible with standard cleanroom protocols (Class 100/ISO 5) |
| Packaging Options | 30 mL, 100 mL, 250 mL, 1 L, 2.5 L |
| Storage | Light-sensitive, refrigerated (2–8 °C), nitrogen-purged sealed containers |
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