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| Brand | Gatan |
|---|---|
| Origin | USA |
| Model | PECS II 685 |
| Ion Source | Two rare-earth magnet-equipped Penning ion guns (maintenance-free) |
| Beam Energy Range | 100 eV – 8.0 keV |
| Beam Current Density | 10 mA/cm² (peak) |
| Beam Diameter Control | Via gas flow or discharge voltage |
| Sample Capacity | Ø ≤ 32 mm, H ≤ 15 mm |
| Polishing Angle Adjustment | ±10° per gun, independently adjustable |
| Dual-Beam Modulation | Single- or dual-beam angular modulation |
| Sample Rotation | 1–6 rpm, continuously variable |
| Cooling | Liquid nitrogen-cooled stage |
| Vacuum System | 80 L/s turbomolecular pump + dual-stage diaphragm pump |
| Base Pressure | ≤ 5 × 10⁻⁶ Torr |
| Operating Pressure | ≤ 8 × 10⁻⁵ Torr |
| Vacuum Gauge | Cold-cathode gauge (main chamber), solid-state gauge (foreline) |
| Load Lock | Whisperlok™ airlock technology (< 1 min exchange, no main chamber vent) |
| User Interface | 10-inch color touchscreen with recipe-based operation |
| Compliance | Designed for GLP-compliant lab environments |
| Brand | Gatan |
|---|---|
| Origin | USA |
| Model | 697 Ilion II |
| Ion Gun Type | Dual Penning-type with Triode (Cathode/Anode/Focusing Electrode) Construction |
| Beam Energy Range | 100 eV – 8 keV |
| Beam Current Control | 0–100 mA per gun via Mass Flow Controller |
| Beam Angle Adjustment | ±10° per gun, 0.1° incremental resolution |
| 扇形抛光角 | ��Sector Polish Angle）: Programmable 10°–90° |
| Polishing Rate | Up to 300 µm/h (on Si at 8 keV) |
| Vacuum Base Pressure | 5×10⁻⁶ Torr |
| Operating Pressure | 8.5×10⁻⁵ Torr |
| Pumping System | 80 L/s Turbo-Molecular Pump + Dual-Stage Diaphragm Pump |
| Sample Stage Rotation | 0.5–6 rpm, continuously adjustable |
| Cryogenic Stage | Liquid Nitrogen-cooled, down to −120 °C |
| Integrated Imaging | Digital Zoom Microscope (300×–2200×), real-time acquisition via Gatan DigitalMicrograph® software |
| Sample Exchange Time | < 60 s via WhisperLock™ pneumatic airlock |
| Ion Source Lifetime | > 30,000 hours, maintenance-free operation |
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