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| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PEALD E200SP |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | Room Temperature to 500 °C (customizable) |
| Precursor Channels | Up to 6 independent precursor lines (solid & liquid sources, customizable) |
| Reactant Gas Lines | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Lines | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touch-enabled HMI, embedded IPC, Windows 7 OS, PLC-based real-time control |
| Source Bottle Heating | RT–200 °C (independent modules) |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Ion-Assisted PLD System |
| Pricing | Upon Request |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Thermal-ALD E300S |
| Substrate Size | 300 mm (12 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C |
| Temperature Uniformity | ±1 °C (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid & liquid precursors with heated source bottles |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Range | 0.005–1000 Torr (dual corrosion-resistant capacitance manometers) |
| Base Pressure | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touchscreen HMI, embedded IPC running Windows 7, PLC-based real-time logic control with fieldbus support |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Thermal-ALD E200S |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | Room Temperature to 500 °C (customizable) |
| Precursor Channels | Up to 6 independent precursor lines (customizable), supporting both solid and liquid precursors with individual source heating (RT–200 °C) |
| Reactant Gas Lines | 2 (customizable) |
| Carrier Gas | N₂ with Mass Flow Controllers (MFCs) |
| Pressure Monitoring | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5×10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touch-enabled display, embedded industrial PC (Windows 7), PLC-based real-time control with fieldbus support |
| Plasma Upgrade Port | Integrated PEALD interface for seamless thermal-to-plasma ALD mode transition without chamber replacement |
| Brand | Lumina |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AT Series (AT1, AT1-Auto, AT2, AT2-EFEM) |
| Pricing | Available Upon Request |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | 180 PED |
| Quotation | Upon Request |
| Vacuum Chamber | 18" spherical chamber with 8" CF viewport, 6.75" CF PED source port, three 6" CF ports, two additional 2.75" and 1.33" CF ports |
| Electron Gun Energy | 8–20 keV |
| Pulse Energy | 100–800 mJ |
| Pulse Width | 100 ns |
| Max Repetition Rate | 10 Hz at 15 kV, 5 Hz at 20 kV |
| Beam Cross-Section (Min) | 8 × 10⁻² cm² |
| Peak Power Density | 1.3 × 10⁸ W/cm² |
| Z-Axis Alignment Range | 50 mm |
| XY Alignment Range | ±20 mm |
| Spark Plug Lifetime | ~3 × 10⁷ pulses |
| Substrate Heater | Ø2" max / 10×10 mm² min |
| Substrate Rotation | 1–30 RPM (360° continuous) |
| Target Carousel | 6 × 1" or 3 × 2" targets |
| Target Grid Scanning | Programmable raster ablation pattern |
| Target Height Adjustment | Motorized |
| Target Shutters | Individual shutters per target to prevent cross-contamination |
| Process Gas Compatibility | O₂, N₂, Ar |
| Pulse Energy Stability | ±10% |
| Base Pressure | ≤8 × 10⁻⁸ Torr (with dry pump + turbomolecular pump) |
| Software Platform | Windows 7 + LabVIEW 2013 |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Pioneer 120 PLD System |
| Substrate Heater Type | Conductive (electrical) heating stage |
| Max Substrate Temperature | 950 °C |
| Heater Compatibility | O₂-compatible up to 1 atm (760 Torr) |
| Target Changer | Motorized, programmable multi-target rotator with rastering and position indexing |
| Vacuum System | Dry-pump stack — turbomolecular pump backed by diaphragm or scroll pump |
| Deposition Chamber Ports | 8" CF for pump, 8" CF for heater, 8" CF for target assembly |
| Laser Source | KrF excimer laser (248 nm) |
| Optical Path | 45° turning mirror, plano-convex lens (f ≈ 50 cm) |
| Control Software | Windows 7 + LabVIEW 2013 (integrated real-time control of heater, target rotation, pressure regulation, pump sequencing, and laser triggering) |
| Compliance | Designed for GLP/GMP-aligned thin-film R&D |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Model | Glove Box Integrated |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C (customizable) |
| Precursor Channels | Up to 6 (solid & liquid sources supported, customizable) |
| Reactant Gas Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Channels | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5×10⁻³ Torr |
| Vacuum Pump | Standard oil-sealed rotary vane pump |
| Control System | 19″ industrial touch display, embedded IPC running Windows 7, PLC-based real-time control with fieldbus support |
| Source Bottle Heater | RT–200 °C |
| Glove Box Integration | Dual-glove, single-station configuration (customizable) |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Large-Area PLD Systems |
| Substrate Diameter | 4" (100 mm), 6" (150 mm), 8" (200 mm) |
| Chamber Type | 18-inch-diameter spherical or cylindrical vacuum chamber |
| Max. Substrate Temperature | 850 °C (for 4″), 750 °C (for 6″), 700 °C (for 8″) |
| Target Mount | 4 × 2-inch rotary target assembly |
| Thickness Uniformity | ±5% or better across full wafer |
| Process Gases | O₂, N₂, Ar with mass flow controllers (MFCs) |
| Load Lock | Integrated |
| Automation Platform | Windows 7 + LabVIEW 2013 |
| Laser Scanning | Programmable beam rastering with inverse-velocity dwell-time compensation |
| Oxygen-Compatible High-Temperature Operation | Yes |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | UHV ALD |
| Quotation | Upon Request |
| Substrate Diameter | 100 mm (4 inch), customizable |
| Process Temperature Range | RT to 400 °C, ±1 °C accuracy (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid and liquid precursors with dedicated heated source bottles |
| Reactant Channels | 2 standard (customizable) |
| Carrier Gas | N₂ with MFC-controlled flow (customizable) |
| Vacuum System | High-performance turbomolecular pump suite for ultra-high vacuum (UHV) base pressure <5×10⁻⁸ mbar |
| Heating Capability | Source bottles and reactor zone heated up to 150 °C |
| Control System | Industrial embedded IPC with 19″ capacitive touchscreen, Windows 7 OS, real-time PLC-based logic control via Ethernet |
| Transfer System | Manual magnetic wand loading with dedicated load-lock chamber, gate valves, and integrated vacuum interlocks |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Pioneer 120 Advanced PLD System |
| Substrate Heating | Up to 850°C, Radiant Heater, O₂-Compatible |
| Substrate Size | 10 mm × 10 mm to 2-inch diameter |
| Vacuum Base Pressure | ≤5×10⁻⁹ Torr |
| Chamber Diameter | 12 inches |
| Target Capacity | 6×1″ or 3×2″ targets |
| Turbo Pump Speed | 260 L/s (software-controlled) |
| In-situ Diagnostics | RHEED-compatible |
| Load Lock | Optional |
| Software Platform | Windows 7 + LabVIEW 2013 |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Pioneer 180 PLD System |
| Vacuum Base Pressure | ≤5×10⁻⁹ Torr |
| Chamber Diameter | 18 in |
| Max Substrate Size | 6 in |
| Max Target Capacity | 6×1″ or 3×2″ |
| Substrate Heater | Radiant, O₂-compatible up to 1 atm (760 Torr) |
| Max Substrate Temperature | 850 °C (upgradable to 1000 °C) |
| Turbo Pump Speed | 400 L/s (software-controlled) |
| In-situ Diagnostics Support | RHEED, LAXS, IES |
| Load-Lock Compatible | Yes |
| Multi-Source Integration Options | PED, RF/DC Sputtering, DC Ion Gun |
| UHV Cluster Integration Ready | XPS, ARPES, MBE |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Combinatorial PLD System |
| System Type | Turnkey Pulsed Laser Deposition Platform with Continuous Composition Spread (CCS-PLD) Capability |
| Substrate Compatibility | 2-inch wafers (4-inch and 6-inch available on request) |
| Operating Environment | Up to 800 °C, up to 500 mTorr O₂ partial pressure |
| Deposition Mode | Standard PLD + CCS-PLD (Continuous Composition Spread) |
| Target Configuration | Multi-target carousel for binary/ternary/quaternary combinatorial synthesis |
| Film Architecture Support | Epitaxial thin films, multilayer heterostructures, superlattices |
| Oxygen Compatibility | Fully compatible with reactive oxygen ambient for metal oxide epitaxy |
| Post-deposition Annealing | Not required due to in-situ compositional grading and kinetic control |
| Maskless Operation | Enabled by angular deposition gradient and laser fluence modulation |
| Layer Resolution | Sub-monolayer precision per pulse cycle |
| Compliance | Designed for GLP-compliant thin-film R&D environments |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Pioneer 180 MAPLE PLD System |
| Substrate Heating | Up to 500 °C with programmable controller |
| Substrate Size | Max. 2" diameter or multiple 1 cm × 1 cm samples |
| Substrate Rotation | 20 RPM |
| Vacuum Chamber Diameter | 18" |
| Target Stage | LN₂-cooled, single-target standard (multi-target optional) |
| Gas Flow Control | 50–100 SCCM MFC |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PA Series |
| Process Temperature Range | RT to 450°C |
| Precursor Channels | Up to 4 (customizable), supporting solid & liquid precursors |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Monitoring | Triple corrosion-resistant capacitance manometers, 0.005–1000 Torr |
| Base Vacuum | <5×10⁻³ Torr |
| Heating Zone Temperature Range | RT to 150°C |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Pioneer 180 Laser MBE/PLD System |
| Substrate Heating | 1000 °C (laser heater), 850 °C (radiant heater) |
| Substrate Size | 1 cm × 1 cm (laser-heated stage), 2″ diameter (radiant-heated stage) |
| Vacuum Chamber Diameter | 18″ |
| RHEED Gun Voltage | 30 keV |
| RHEED Operating Pressure | ≤500 mTorr (O₂) |
| Gas Flow Control | O₂/N₂ up to 100 SCCM |
| Software Platform | Windows 7 + LabVIEW 2013 |
| Target Mounting Options | 6 × 1″ or 3 × 2″ rotating target holder |
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