Empowering Scientific Discovery

Beijing Zhengtong Yuanheng Technology Co., Ltd.

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BrandSUPERALD
OriginGuangdong, China
Manufacturer TypeAuthorized Distributor
Product OriginDomestic (China)
ModelPEALD E200SP
Substrate Size200 mm (8 inch) diameter (customizable)
Process Temperature RangeRoom Temperature to 500 °C (customizable)
Precursor ChannelsUp to 6 independent precursor lines (solid & liquid sources, customizable)
Reactant Gas Lines2 (customizable)
Carrier GasN₂ with MFC flow control (customizable)
Plasma Gas Lines4 (customizable)
RF Power0–1000 W
Pressure MeasurementDual corrosion-resistant capacitance manometers (0.005–1000 Torr)
Base Vacuum<5 × 10⁻³ Torr
Vacuum SystemStandard oil-sealed rotary vane pump
Control System19-inch industrial touch-enabled HMI, embedded IPC, Windows 7 OS, PLC-based real-time control
Source Bottle HeatingRT–200 °C (independent modules)
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BrandSUPERALD
OriginGuangdong, China
Manufacturer TypeAuthorized Distributor
Country of OriginChina
ModelThermal-ALD E300S
Substrate Size300 mm (12 inch) diameter (customizable)
Process Temperature RangeRT to 500 °C
Temperature Uniformity±1 °C (customizable)
Precursor ChannelsUp to 6 independent, supporting solid & liquid precursors with heated source bottles
Reactant Channels2 (customizable)
Carrier GasN₂ with MFC flow control (customizable)
Pressure Range0.005–1000 Torr (dual corrosion-resistant capacitance manometers)
Base Pressure<5 × 10⁻³ Torr
Vacuum SystemStandard oil-sealed rotary vane pump
Control System19-inch industrial touchscreen HMI, embedded IPC running Windows 7, PLC-based real-time logic control with fieldbus support
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BrandSUPERALD
OriginGuangdong, China
Manufacturer TypeAuthorized Distributor
Country of OriginChina
ModelThermal-ALD E200S
Substrate Size200 mm (8 inch) diameter (customizable)
Process Temperature RangeRoom Temperature to 500 °C (customizable)
Precursor ChannelsUp to 6 independent precursor lines (customizable), supporting both solid and liquid precursors with individual source heating (RT–200 °C)
Reactant Gas Lines2 (customizable)
Carrier GasN₂ with Mass Flow Controllers (MFCs)
Pressure MonitoringDual corrosion-resistant capacitance manometers (0.005–1000 Torr)
Base Vacuum<5×10⁻³ Torr
Vacuum SystemStandard oil-sealed rotary vane pump
Control System19-inch industrial touch-enabled display, embedded industrial PC (Windows 7), PLC-based real-time control with fieldbus support
Plasma Upgrade PortIntegrated PEALD interface for seamless thermal-to-plasma ALD mode transition without chamber replacement
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BrandSUPERALD
OriginGuangdong, China
ModelGlove Box Integrated
Substrate Size200 mm (8 inch) diameter (customizable)
Process Temperature RangeRT to 500 °C (customizable)
Precursor ChannelsUp to 6 (solid & liquid sources supported, customizable)
Reactant Gas Channels2 (customizable)
Carrier GasN₂ with MFC flow control (customizable)
Plasma Gas Channels4 (customizable)
RF Power0–1000 W
Pressure MeasurementDual corrosion-resistant capacitance manometers (0.005–1000 Torr)
Base Vacuum<5×10⁻³ Torr
Vacuum PumpStandard oil-sealed rotary vane pump
Control System19″ industrial touch display, embedded IPC running Windows 7, PLC-based real-time control with fieldbus support
Source Bottle HeaterRT–200 °C
Glove Box IntegrationDual-glove, single-station configuration (customizable)
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BrandSUPERALD
OriginGuangdong, China
Manufacturer TypeAuthorized Distributor
Country of OriginChina
ModelUHV ALD
QuotationUpon Request
Substrate Diameter100 mm (4 inch), customizable
Process Temperature RangeRT to 400 °C, ±1 °C accuracy (customizable)
Precursor ChannelsUp to 6 independent, supporting solid and liquid precursors with dedicated heated source bottles
Reactant Channels2 standard (customizable)
Carrier GasN₂ with MFC-controlled flow (customizable)
Vacuum SystemHigh-performance turbomolecular pump suite for ultra-high vacuum (UHV) base pressure <5×10⁻⁸ mbar
Heating CapabilitySource bottles and reactor zone heated up to 150 °C
Control SystemIndustrial embedded IPC with 19″ capacitive touchscreen, Windows 7 OS, real-time PLC-based logic control via Ethernet
Transfer SystemManual magnetic wand loading with dedicated load-lock chamber, gate valves, and integrated vacuum interlocks
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BrandSUPERALD
OriginGuangdong, China
Manufacturer TypeAuthorized Distributor
Product OriginDomestic (China)
ModelPA Series
Process Temperature RangeRT to 450°C
Precursor ChannelsUp to 4 (customizable), supporting solid & liquid precursors
Reactant Channels2 (customizable)
Carrier GasN₂ with MFC flow control (customizable)
Pressure MonitoringTriple corrosion-resistant capacitance manometers, 0.005–1000 Torr
Base Vacuum<5×10⁻³ Torr
Heating Zone Temperature RangeRT to 150°C
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