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| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PEALD E200SP |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | Room Temperature to 500 °C (customizable) |
| Precursor Channels | Up to 6 independent precursor lines (solid & liquid sources, customizable) |
| Reactant Gas Lines | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Lines | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touch-enabled HMI, embedded IPC, Windows 7 OS, PLC-based real-time control |
| Source Bottle Heating | RT–200 °C (independent modules) |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Thermal-ALD E300S |
| Substrate Size | 300 mm (12 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C |
| Temperature Uniformity | ±1 °C (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid & liquid precursors with heated source bottles |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Range | 0.005–1000 Torr (dual corrosion-resistant capacitance manometers) |
| Base Pressure | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touchscreen HMI, embedded IPC running Windows 7, PLC-based real-time logic control with fieldbus support |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Thermal-ALD E200S |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | Room Temperature to 500 °C (customizable) |
| Precursor Channels | Up to 6 independent precursor lines (customizable), supporting both solid and liquid precursors with individual source heating (RT–200 °C) |
| Reactant Gas Lines | 2 (customizable) |
| Carrier Gas | N₂ with Mass Flow Controllers (MFCs) |
| Pressure Monitoring | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5×10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touch-enabled display, embedded industrial PC (Windows 7), PLC-based real-time control with fieldbus support |
| Plasma Upgrade Port | Integrated PEALD interface for seamless thermal-to-plasma ALD mode transition without chamber replacement |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Model | Glove Box Integrated |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C (customizable) |
| Precursor Channels | Up to 6 (solid & liquid sources supported, customizable) |
| Reactant Gas Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Channels | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5×10⁻³ Torr |
| Vacuum Pump | Standard oil-sealed rotary vane pump |
| Control System | 19″ industrial touch display, embedded IPC running Windows 7, PLC-based real-time control with fieldbus support |
| Source Bottle Heater | RT–200 °C |
| Glove Box Integration | Dual-glove, single-station configuration (customizable) |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | UHV ALD |
| Quotation | Upon Request |
| Substrate Diameter | 100 mm (4 inch), customizable |
| Process Temperature Range | RT to 400 °C, ±1 °C accuracy (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid and liquid precursors with dedicated heated source bottles |
| Reactant Channels | 2 standard (customizable) |
| Carrier Gas | N₂ with MFC-controlled flow (customizable) |
| Vacuum System | High-performance turbomolecular pump suite for ultra-high vacuum (UHV) base pressure <5×10⁻⁸ mbar |
| Heating Capability | Source bottles and reactor zone heated up to 150 °C |
| Control System | Industrial embedded IPC with 19″ capacitive touchscreen, Windows 7 OS, real-time PLC-based logic control via Ethernet |
| Transfer System | Manual magnetic wand loading with dedicated load-lock chamber, gate valves, and integrated vacuum interlocks |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PA Series |
| Process Temperature Range | RT to 450°C |
| Precursor Channels | Up to 4 (customizable), supporting solid & liquid precursors |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Monitoring | Triple corrosion-resistant capacitance manometers, 0.005–1000 Torr |
| Base Vacuum | <5×10⁻³ Torr |
| Heating Zone Temperature Range | RT to 150°C |
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