Empowering Scientific Discovery

Beijing Zhengtong Yuanheng Technology Co., Ltd.

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BrandNeocera
OriginUSA
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelIon-Assisted PLD System
PricingUpon Request
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BrandNeocera
OriginUSA
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
Model180 PED
QuotationUpon Request
Vacuum Chamber18" spherical chamber with 8" CF viewport, 6.75" CF PED source port, three 6" CF ports, two additional 2.75" and 1.33" CF ports
Electron Gun Energy8–20 keV
Pulse Energy100–800 mJ
Pulse Width100 ns
Max Repetition Rate10 Hz at 15 kV, 5 Hz at 20 kV
Beam Cross-Section (Min)8 × 10⁻² cm²
Peak Power Density1.3 × 10⁸ W/cm²
Z-Axis Alignment Range50 mm
XY Alignment Range±20 mm
Spark Plug Lifetime~3 × 10⁷ pulses
Substrate HeaterØ2" max / 10×10 mm² min
Substrate Rotation1–30 RPM (360° continuous)
Target Carousel6 × 1" or 3 × 2" targets
Target Grid ScanningProgrammable raster ablation pattern
Target Height AdjustmentMotorized
Target ShuttersIndividual shutters per target to prevent cross-contamination
Process Gas CompatibilityO₂, N₂, Ar
Pulse Energy Stability±10%
Base Pressure≤8 × 10⁻⁸ Torr (with dry pump + turbomolecular pump)
Software PlatformWindows 7 + LabVIEW 2013
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BrandNeocera
OriginUSA
ModelPioneer 120 PLD System
Substrate Heater TypeConductive (electrical) heating stage
Max Substrate Temperature950 °C
Heater CompatibilityO₂-compatible up to 1 atm (760 Torr)
Target ChangerMotorized, programmable multi-target rotator with rastering and position indexing
Vacuum SystemDry-pump stack — turbomolecular pump backed by diaphragm or scroll pump
Deposition Chamber Ports8" CF for pump, 8" CF for heater, 8" CF for target assembly
Laser SourceKrF excimer laser (248 nm)
Optical Path45° turning mirror, plano-convex lens (f ≈ 50 cm)
Control SoftwareWindows 7 + LabVIEW 2013 (integrated real-time control of heater, target rotation, pressure regulation, pump sequencing, and laser triggering)
ComplianceDesigned for GLP/GMP-aligned thin-film R&D
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BrandNeocera
OriginUSA
ModelLarge-Area PLD Systems
Substrate Diameter4" (100 mm), 6" (150 mm), 8" (200 mm)
Chamber Type18-inch-diameter spherical or cylindrical vacuum chamber
Max. Substrate Temperature850 °C (for 4″), 750 °C (for 6″), 700 °C (for 8″)
Target Mount4 × 2-inch rotary target assembly
Thickness Uniformity±5% or better across full wafer
Process GasesO₂, N₂, Ar with mass flow controllers (MFCs)
Load LockIntegrated
Automation PlatformWindows 7 + LabVIEW 2013
Laser ScanningProgrammable beam rastering with inverse-velocity dwell-time compensation
Oxygen-Compatible High-Temperature OperationYes
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BrandNeocera
OriginUSA
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelPioneer 120 Advanced PLD System
Substrate HeatingUp to 850°C, Radiant Heater, O₂-Compatible
Substrate Size10 mm × 10 mm to 2-inch diameter
Vacuum Base Pressure≤5×10⁻⁹ Torr
Chamber Diameter12 inches
Target Capacity6×1″ or 3×2″ targets
Turbo Pump Speed260 L/s (software-controlled)
In-situ DiagnosticsRHEED-compatible
Load LockOptional
Software PlatformWindows 7 + LabVIEW 2013
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BrandNeocera
OriginUSA
ModelPioneer 180 PLD System
Vacuum Base Pressure≤5×10⁻⁹ Torr
Chamber Diameter18 in
Max Substrate Size6 in
Max Target Capacity6×1″ or 3×2″
Substrate HeaterRadiant, O₂-compatible up to 1 atm (760 Torr)
Max Substrate Temperature850 °C (upgradable to 1000 °C)
Turbo Pump Speed400 L/s (software-controlled)
In-situ Diagnostics SupportRHEED, LAXS, IES
Load-Lock CompatibleYes
Multi-Source Integration OptionsPED, RF/DC Sputtering, DC Ion Gun
UHV Cluster Integration ReadyXPS, ARPES, MBE
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BrandNeocera
OriginUSA
ModelCombinatorial PLD System
System TypeTurnkey Pulsed Laser Deposition Platform with Continuous Composition Spread (CCS-PLD) Capability
Substrate Compatibility2-inch wafers (4-inch and 6-inch available on request)
Operating EnvironmentUp to 800 °C, up to 500 mTorr O₂ partial pressure
Deposition ModeStandard PLD + CCS-PLD (Continuous Composition Spread)
Target ConfigurationMulti-target carousel for binary/ternary/quaternary combinatorial synthesis
Film Architecture SupportEpitaxial thin films, multilayer heterostructures, superlattices
Oxygen CompatibilityFully compatible with reactive oxygen ambient for metal oxide epitaxy
Post-deposition AnnealingNot required due to in-situ compositional grading and kinetic control
Maskless OperationEnabled by angular deposition gradient and laser fluence modulation
Layer ResolutionSub-monolayer precision per pulse cycle
ComplianceDesigned for GLP-compliant thin-film R&D environments
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BrandNeocera
OriginUSA
ModelPioneer 180 MAPLE PLD System
Substrate HeatingUp to 500 °C with programmable controller
Substrate SizeMax. 2" diameter or multiple 1 cm × 1 cm samples
Substrate Rotation20 RPM
Vacuum Chamber Diameter18"
Target StageLN₂-cooled, single-target standard (multi-target optional)
Gas Flow Control50–100 SCCM MFC
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BrandNeocera
OriginUSA
ModelPioneer 180 Laser MBE/PLD System
Substrate Heating1000 °C (laser heater), 850 °C (radiant heater)
Substrate Size1 cm × 1 cm (laser-heated stage), 2″ diameter (radiant-heated stage)
Vacuum Chamber Diameter18″
RHEED Gun Voltage30 keV
RHEED Operating Pressure≤500 mTorr (O₂)
Gas Flow ControlO₂/N₂ up to 100 SCCM
Software PlatformWindows 7 + LabVIEW 2013
Target Mounting Options6 × 1″ or 3 × 2″ rotating target holder
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