ELAS
Filter
Showing all 7 results
| Brand | ELAS |
|---|---|
| Origin | Imported (Non-Chinese) |
| Manufacturer Type | Authorized Distributor |
| Model | FemtoLAB (Laboratory Systems) |
| Core Components | Industrial-Grade Femtosecond Laser Source (PHAROS), Galvanometric Beam Steering, Nanopositioning XYZ Stages, SCA Control Software |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Software | SCA v4.x with hardware-integrated real-time control and GLP-compliant audit trail logging |
| Physical Footprint | ≤1.0 m × 2.5 m (fully assembled on optical table) |
| Laser Source | PHAROS femtosecond laser (1030 nm, up to 20 W avg. power, <290 fs pulse width, repetition rate 1–200 kHz) |
| Harmonic Generation | SHG (515 nm), THG (343 nm), FHG (257 nm) modules integrated |
| Positioning Accuracy | ±20 nm (closed-loop piezo-driven XYZ stages) |
| Beam Steering | Dual-axis galvo-scanners (±15° mechanical scan angle, <50 µrad pointing stability) |
| Autofocus | Motorized objective Z-stage + CMOS machine vision feedback loop |
| Optional Modules | SLM-based beam shaping, harmonic mirror turrets, 4F relay optics, polarization rotators, WATT PILOT attenuators |
| Brand | ELAS |
|---|---|
| Model | MASTER Series |
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Core Components | Semiconductor-based Ultrafast Laser System (Picosecond & Femtosecond) |
| Laser Types | Pulsed IR/Vis/UV (1064 nm, 532 nm, 355 nm, 1028 nm) |
| Positioning Accuracy | ±1 µm (XY/Z), Repeatability: ≤0.10 µm |
| Max XY Travel | 200 mm |
| Max Z Travel | 100 mm |
| Max XY Speed | 2000 mm/s |
| Max Acceleration | 30 m/s² |
| Spot Size | Down to 3 µm |
| Pulse Duration | <10 ps (ps-Master), <200 fs (fs-Master) |
| Repetition Rate | Single-shot to 500 kHz |
| Beam Quality | M² < 1.5 (ps), M² < 1.2 (fs) |
| Platform | Vibration-isolated Granite Base |
| Safety Class | Integrated Class 1 Enclosure |
| Software | SCA – Windows-based Laser Process Control & Pattern Design Suite |
| Power Requirement | Up to 4500 W |
| Dimensions (W×D×H) | ~1300 × 1200 × 1700 mm |
| Brand | ELAS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Mini MASTER GN532 |
| Core Component | Diode-Pumped Solid-State (DPSS) Green Laser System (532 nm) |
| Application | Ultrafast Laser Micromachining for Photovoltaic Edge Isolation |
| Laser Class | Class 1 Enclosed Workstation |
| Automation Level | Semi-Automated with Integrated Galvo-Scanning & Sliding Door Interface |
| Compliance | Designed to meet IEC 60825-1:2014 (Laser Safety), ISO 13857 (Safety of Machinery), and supports GLP/GMP-aligned process documentation workflows |
| Software | Proprietary GUI with real-time pulse parameter control, job logging, and audit-trail-ready operation history |
| Brand | ELAS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Mini MASTER |
| Core Component | Semiconductor-Based Ultrafast Laser System |
| Laser Types | Nanosecond, Picosecond, and Custom Wavelength Options (1064 nm / 532 nm / 355 nm) |
| Scanning Field | 100 × 100 mm |
| f-Theta Lens Focal Length | 160 mm |
| Max Marking Speed | 3.5 m/s |
| Max Positioning Speed | 15.0 m/s |
| Minimum Achievable Spot Size | ≤ 3 µm |
| Laser Pulse Synchronization | Yes |
| Beam Quality (M²) | < 1.3 (ns), < 1.5 (ps) |
| Power Requirement | Up to 2000 W |
| Dimensions (W×D×H) | 1110 × 760 × 1440 mm |
| Safety Class | IEC 60825-1 Class 1 Enclosed System |
| Software Platform | SCA Laser Micro Machining Suite (Windows OS) |
| Brand | ELAS |
|---|---|
| Model | PicoLAB Laboratory Systems |
| Type | Picosecond DPSS Laser Micro-Machining Workstation |
| Laser Source | Nd:YVO₄ (1064 nm / 355 nm) |
| Pulse Duration | < 10 ps |
| Avg. Power | 16 W @ 1064 nm / 4 W @ 355 nm |
| Repetition Rate | Single Shot to 500 kHz |
| Beam Quality (M²) | < 1.5 |
| Spatial Mode | TEM₀₀ |
| Positioning Stages | X/Y Travel 600 mm × 400 mm |
| Stage Accuracy | ±4.5 µm |
| Repeatability | ±0.5 µm |
| Resolution | 0.1 µm |
| Galvo-Scanner | Dual-Axis, Synchronized with Stages |
| Safety Class | IEC 60825-1 Class 1 Enclosed System |
| Vision System | High-Resolution Machine Vision with Sample Recognition |
| Operating Temp. | 18–27°C (±1°C stability) |
| Power Supply | 240 VAC, 50–60 Hz, < 3 kW |
| Brand | ELAS |
|---|---|
| Model | Ventu FNP1064 |
| Laser Type | MOPFA Q-switched Yb-doped fiber laser |
| Wavelength | 1064 nm (nominal, 1060–1070 nm range) |
| Avg. Output Power | 20 W |
| Pulse Duration | 120 ns |
| Repetition Rate | 20–100 kHz |
| Beam Diameter | ~6 mm |
| Beam Quality (M²) | < 1.6 |
| Positioning System | 3-phase ironless linear motor stage |
| Travel Range | 300 × 300 mm |
| Bidirectional Repeatability | 0.7 µm |
| On-Axis Accuracy | 5 µm |
| Max Speed | 500 mm/s |
| Max Acceleration (no load) | 20 mm/s² |
| Dimensions | 1500 × 1500 × 900 mm |
| Weight | ~350 kg |
| Input Voltage | 220 V AC |
| Max Power Consumption | < 3 kW |
| Operating Temp | 18–27 °C |
| RH | 10–80 % (non-condensing) |
| Brand | ELAS |
|---|---|
| Model | MicroLAB |
| Core Laser Source | EKSPLA NL200 Ultra-Compact Q-Switched Nd:YAG Laser |
| Wavelengths | 1064 nm (fundamental), 532 nm, 355 nm (harmonic options) |
| Pulse Energy | >0.9 mJ @ 1064 nm |
| Pulse Duration | ≤7 ns |
| Position Synchronization | Integrated PSO (Position Synchronized Output) |
| Motion Control | Physik Instrumente Piezo-Motor-Driven X-Y Stages |
| Control Platform | Dedicated Laptop-Based SCA Software Suite |
| Harmonic Switching | Automatic or Manual Selection of Up to 3 Harmonics |
| Stage Travel | Customizable X-Y Range |
| Application Scope | Micro-ablation, Surface & Bulk Marking, Biomedical Device Prototyping, Thin-Film Patterning, Solar Cell Scribing |