ZEISS
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| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Model | Visioner 1 |
| Technology | Micro-Mirror Array Lens System (MALS™) |
| Max. Height Difference Coverage | 69 mm |
| Micro-Mirror Size | ~100 × 100 µm |
| Mirror Actuation | Independent rotation and lateral translation |
| EDoF Enhancement Factor | Up to 100× vs. conventional optical microscopy |
| Imaging Mode | Real-time, focus-free, full-field extended depth of field |
| Compliance | Designed for ISO/IEC 17025-aligned inspection environments, compatible with GLP/GMP documentation workflows |
| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Model | Volutome |
| Application | Integrated in-chamber ultramicrotome for serial block-face imaging in field-emission scanning electron microscopy (FE-SEM) |
| Detector | Volume BSD (Backscattered Electron Detector optimized for volumetric surface imaging) |
| Charge Compensation | Patented localized charge compensation system |
| Automation | Unattended operation up to 72 hours |
| Workflow Integration | End-to-end solution from sectioning and imaging to 3D reconstruction and visualization |
| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Model | Xradia 515 Versa |
| Spatial Resolution | ≤500 nm (true native resolution) |
| Imaging Modes | Absorption Contrast, Propagation-Based Phase Contrast |
| Software Platform | Scout-and-Scan Control System with ART 3.0 Advanced Reconstruction Toolbox |
| Compatibility | In Situ Mechanical & Thermal Stages, Automated Sample Handling, Flat-Panel Detector Options |
| Regulatory Compliance | Designed for GLP/GMP-aligned workflows |
| Brand | ZEISS |
|---|---|
| Origin | Germany |
| Detector Type | Scintillator-based Detector |
| Scan Mode | Translation-Rotation (TR) |
| Spatial Resolution | 0.5 µm |
| Minimum Voxel Size | 40 nm |
| Sample Dimensions (X/Y/Z) | 50 mm × 50 mm × 100 mm |
| Maximum Sample Weight | 25 kg |
| Dual Magnification Architecture | Optical + Geometric |