Electron Microscope
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| Brand | Fischione |
|---|---|
| Origin | USA |
| Manufacturer Status | Authorized Distributor |
| Origin Category | Imported |
| Model | 170 |
| Price | Upon Request |
| Brand | GATAN |
|---|---|
| Origin | USA |
| Manufacturer | GATAN, Inc. |
| Model | ChromaCL2 |
| Optical Collection Angle | Parabolic Diamond-Machined Mirror |
| Spectral Range | 400–800 nm |
| Detector | High-Gain Array Photomultiplier Tube (PMT) |
| Signal Processing | Integrated Pulse Amplification & Discrimination Electronics |
| Control & Acquisition | DigiScan II Digital Beam Controller with 3 TTL Channels Dedicated to CL |
| Software | DigitalMicrograph® with ChromaCL Plugin (Real-Time RGB Mixing, Post-Processing, GLP-Compliant Metadata Logging) |
| Dynamic Range | Up to 600,000 counts/sec per pixel |
| Retraction Range | 150 mm |
| Integrated BSED Capability | Simultaneous Secondary Electron (SE), Backscattered Electron (BSE), and CL Acquisition |
| Mounting | Fixed Insertion Geometry with Lockable Retraction |
| Operating System | Windows 7 (32-/64-bit) |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Model | Halcyonics Explorer |
| Sensor Technology | Piezoelectric Ceramic |
| Axes | X, Y, Z (Triaxial) |
| Detection Principle | Non-contact Capacitive / Laser Doppler (Configurable) |
| Power Supply | Independent AC Input |
| Dual-Sensor Capability | Yes |
| Compliance | CE, RoHS, ISO 10816-1 (Vibration Evaluation of Machines) |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Halcyonics Nano Series Micro Active Vibration Isolation Platform |
| Price | Upon Request |
| Load Capacity | Nano_20: 0–8 kg |
| Nano_30 | 5–25 kg |
| Dimensions | Nano_20: 204 mm × 204 mm × 69 mm |
| Nano_30 | 400 mm × 300 mm × 75 mm |
| Vibration Attenuation Range | 1–200 Hz |
| Resonant Frequency | < 5 Hz |
| Actuation Principle | Piezoelectric Force Feedback |
| Operating Voltage | Low-Voltage DC (Non-Interfering) |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Halcyonics Sandwich |
| Price Range | USD 27,000 – 68,000 (FOB Hamburg) |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Halcyonics Vario Series |
| Price | Upon Request |
| Load Capacity | 0–600 kg |
| Operating Frequency Range | <5 Hz (effective isolation down to DC) |
| Power Supply | Standard DC Input |
| System Architecture | Separated Actuator Units + Dedicated Controller Unit |
| Key Technology | Piezoelectric Sensor Feedback + Real-Time Active Force Cancellation |
| Compliance | Designed for ISO 20483-compliant lab environments |
| Brand | Accurion |
|---|---|
| Origin | Germany |
| Model | Halcyonics Workstations Active Vibration Isolation Tables |
| Load Capacity Range | 80–320 kg |
| Isolation Performance | >98.22% at 10 Hz |
| Effective Low-Frequency Cutoff | <5 Hz |
| Interface | USB 1.1 |
| Software | Windows-based Evaluation Suite |
| Dimensions (L×W×H) | 770×770×700 mm to 1070×1170×700 mm |
| Series | Workstation_Vario, Workstation_Micro |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Model | TM4000II / TM4000PlusII |
| Accelerating Voltage | 5 kV / 10 kV / 15 kV (4-step current adjustment per voltage) |
| Magnification Range | 10× to 100,000× |
| Detector Configuration | Quad-segment backscattered electron detector (BSE) |
| Sample Chamber Dimensions | Ø80 mm × 50 mm (max. height) |
| Imaging Modes | Conductive mode (TM4000PlusII), Standard mode, Charge-free mode |
| Software Features | SEM-MAP navigation, report-generation export (PDF/HTML), real-time BSE + SE image overlay (TM4000PlusII) |
| Camera Resolution | 2560 × 1920 (CCD) |
| EDS Compatibility | Integrated EDX interface |
| Brand | HORIBA |
|---|---|
| Origin | France |
| Manufacturer Type | Manufacturer |
| Import Status | Imported |
| Model | Signature SPM |
| Instrument Category | Atomic Force Microscope |
| Instrument Type | Materials-Focused AFM |
| Spectroscopy Integration | Confocal Raman & Photoluminescence (PL) |
| Core Capability | True Co-Localized Multimodal Imaging (Topography + Nanomechanics + Electrostatics + Magnetism + Chemical Fingerprinting) |
| Scanner Range | 100 × 100 × 15 µm |
| Optical Access | Dual-Path, IR AFM Laser (1310 nm) + Visible/NIR Excitation Lasers (e.g., 532 nm, 638 nm, 785 nm) |
| Spectrometer | Achromatic, >95% Reflectivity, Triple-Grating Support (150–6000 cm⁻¹) |
| Software Feature | “Probe Away” / “Probe Back” Automated Tip Retraction & Re-Registration |
| Compliance | Designed for GLP/GMP-adjacent research environments |
| Brand | JEOL |
|---|---|
| Origin | Japan |
| Model | CRYO ARM™ 200 II (JEM-Z200CA) |
| Acceleration Voltage | 200 kV |
| Magnification Range | ×100 to ×1,000,000 |
| Spherical Aberration Coefficient (Cs) | 1.5 mm |
| Chromatic Aberration Coefficient (Cc) | 1.8 mm |
| Specimen Temperature | ≤100 K |
| Sample Storage Capacity | Up to 12 cryo-samples |
| Energy Filter | Integrated Omega-type Energy Filter |
| Optional Software | JEOL Automated Data Acquisition System (JADAS) |
| Brand | JEOL |
|---|---|
| Origin | Japan |
| Model | JEM-2800 |
| Point Resolution | 0.21 nm |
| Lattice Resolution | 0.10 nm |
| STEM Resolution | 0.16 nm |
| Secondary Electron Resolution | 0.5 nm |
| EDS Configuration | Dual Ultra-High-Sensitivity Silicon Drift Detectors (SDD) |
| Lorentz Mode | Standard Equipment |
| Brand | JEOL (Japan Electron Optics Laboratory) |
|---|---|
| Origin | Japan |
| Model | JXA-iHP100 |
| Acceleration Voltage | 0–30 kV (0.1 kV step) |
| Beam Current Range | 10⁻¹² – 10⁻⁵ A |
| Beam Current Stability | ±5% / h, ±0.3% / 12 h (W) |
| Secondary Electron Resolution | 6 nm (W), 5 nm (LaB₆) at WD = 11 mm, 30 kV |
| Scan Magnification | ×40 – ×300,000 (WD = 11 mm) |
| Max. Image Resolution | 5,120 × 3,840 pixels |
| Display | Dual LCDs (1,280 × 1,024 each) for EPMA and SEM/EDS operation |
| Optical Microscope Resolution | ~1 µm |
| Depth of Field | ~1 µm |
| Vacuum System | Mechanical pump + turbomolecular pump + ion pump |
| Chamber Vacuum | <8.0 × 10⁻⁴ Pa |
| Gun Vacuum | <9.0 × 10⁻⁵ Pa |
| Elemental Detection Range | WDS: Be (optional) to U |
| EDS | B to U |
| WDS Wavelength Range | 0.087–9.3 nm |
| EDS Energy Range | 0–20 keV |
| WDS Spectrometer Channels | 1–5 (configurable) |
| EDS Detector | One SDD (Silicon Drift Detector), fanless option available |
| Max. Sample Size | 100 mm × 100 mm × 50 mm (H) |
| Brand | JEOL |
|---|---|
| Origin | Japan |
| Model | SXES |
| Energy Resolution | 0.3 eV (at Al-L edge, 73 eV) |
| Detection Energy Range | 50–170 eV (JS50XL grating) / 70–210 eV (JS50XL grating) |
| Mounting Interface | EPMA WDS Port #2 (front right) or FE-SEM WDS port (front left-rear) |
| Dimensions (W×D×H) | 168 mm × 348 mm × 683 mm (including CCD distance from interface) |
| Weight | 25 kg |
| Compatible Instruments | EPMA — JXA-8530F, JXA-8230, JXA-8500F, JXA-8200 |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Class | Floor-Standing Conventional SEM |
| Electron Source | Tungsten Filament |
| SEM Category | Entry-Level Tungsten-Filament SEM |
| Secondary Electron (SE) Resolution | 3 nm @ 30 kV, 8 nm @ 3 kV |
| Accelerating Voltage Range | 0.2–30 kV |
| Backscattered Electron (BSE) Resolution | 4 nm @ 30 kV |
| Sample Chamber | Optional Large-Capacity Chamber |
| Vacuum Mode | Compatible with Low-Vacuum Module |
| Load Lock System | Max. Sample Diameter ≤75 mm, Height ≤15 mm |
| Navigation Camera | Integrated Wide-Field CCD Navigation Camera |
| Imaging Modes | Simultaneous SE/BSE Dual-Channel Imaging |
| Image Stitching | Automated Full-Field Matrix Acquisition & Real-Time High-Throughput Mosaic Reconstruction |
| Particle Analysis | AI-Driven Morphometric Quantification (size, aspect ratio, circularity, convexity, Feret diameter, etc.) with Auto-Scale Calibration |
| Metrology Tools | Distance, Angle, Line (horizontal/vertical), Circle Diameter, and Profile Analysis |
| Electron Beam Lithography (EBL) Capability | Integrated Vector-Scan EBL Subsystem Supporting Pattern Definition, Dose Control, and Concurrent SEM Observation |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Floor-standing SEM |
| Electron Gun Type | Schottky Thermal Field Emission |
| SEM Class | Entry-level Field Emission SEM |
| Secondary Electron Resolution | 1.5 nm @ 15 kV |
| Accelerating Voltage Range | 0.2–30 kV |
| Backscattered Electron Resolution | 3 nm @ 30 kV |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Floor-Model SEM |
| Electron Gun | Thermal Field-Emission (TFE) |
| SEM Class | High-Resolution Field-Emission SEM |
| Secondary Electron (SE) Resolution | 0.9 nm @ 30 kV |
| Magnification Range | 1×–3,000,000× (optical: 1×–100×) |
| Accelerating Voltage | 0.2–30 kV |
| Brand | KYKY |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Floor-Standing SEM |
| Electron Gun | Thermal Field Emission |
| SEM Class | Ultra-High-Resolution Field Emission |
| Secondary Electron Resolution | 0.8 nm @ 15 kV, 1.5 nm @ 1 kV |
| Magnification Range | 1×–3,000,000× (electronic), 1×–100× (optical) |
| Accelerating Voltage | 0.2–30 kV |
| Brand | LARGEBEAM |
|---|---|
| Origin | USA |
| Manufacturer Type | OEM Manufacturer |
| Import Status | Imported |
| Model | RIIDEye |
| Pricing | Upon Request |
| Detector Type | 2×2 NaI(Tl) scintillator & 1.5×1.5″ LaBr₃(Ce) crystal |
| Energy Range | 20 keV – 3 MeV |
| Display | 3.5″ TFT-LCD, 320×240 resolution, 32,000-color backlight |
| Battery Life | 8 hours (rechargeable Li-ion), with 6 spare AA battery slots |
| Weight | 2.6 kg (5.7 lb) with NaI configuration |
| Dimensions | 27.9 × 12.0 × 21.9 cm (11.0 × 4.7 × 8.6 in) |
| Operating Temperature | −20 °C to +50 °C (−4 °F to 122 °F) |
| Neutron Detection | 1.8 × 3.4 cm Ce-doped Cs₂LiYCl₆ (CLYC) crystal |
| Isotope Library | 47 nuclides |
| Trigger Modes | ANSI, ANSI+, Security, Medical, Industrial, User-Defined |
| Stabilization | Automatic K-40 background compensation, no external reference source required |
| Brand | LaVision GmbH |
|---|---|
| Country of Origin | Germany |
| Model | TriM Scope |
| Scan Mode Flexibility | Single-beam to multi-beam configurable scanning |
| Software Control | ImSpector Pro with millisecond-scale region switching |
| Detection Channels | Up to 8 non-descanned detectors (NDDs) |
| Detector Options | Cooled Generation III GaAsP PMTs or APDs |
| Quantum Efficiency Gain | Up to 40% higher than standard PMTs |
| OPO Compatibility | Full integration support for optical parametric oscillator excitation sources |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM ACE200 |
| Configuration Options | Sputter Coating / Carbon Evaporation / Dual-Source Interchangeable Setup |
| Optional Modules | Quartz Crystal Thickness Monitor, Planetary Rotating Stage, Glow Discharge Unit |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM ACE200 |
| Vacuum Level | ≤7 × 10⁻³ mbar |
| Chamber Dimensions (W×D×H) | 140 mm × 145 mm × 150 mm |
| Sample Stage Diameter | 80 mm |
| Working Distance | 30–100 mm |
| Sputtering Current | ≤150 mA |
| Film Thickness Resolution (with QCM option) | 0.1 nm |
| Coating Modes | Ion Sputtering, Carbon Wire Evaporation, Dual-Mode, Optional Glow Discharge |
| Optional Features | Quartz Crystal Microbalance (QCM), Planetary Rotation, Interchangeable Shields, Directional Sputtering, Pulsed Carbon Evaporation |
| Brand | Mel-Build |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Dual-Tilt Probe TEM Sample Holder |
| Pricing | Available Upon Request |
| Brand | MicroInno |
|---|---|
| Model | MIVTHD-TF/JL |
| Compatibility | Thermo Fisher, JEOL, Hitachi TEMs |
| Dual-Axis Tilt Range | α/β ±30° (typ.) |
| Tilt Resolution | < 0.1° |
| Linear Translation Resolution | < 1.5 nm/min |
| Sealing Mechanism | Retractable Viton O-ring |
| Sample Mounting | Hex-screw clamping |
| Vacuum Compatibility | ≤1×10⁻⁷ Pa |
| Gas Environment | Inert gas (Ar/N₂) or high vacuum transfer |
| Brand | Makeway |
|---|---|
| Model | MKW-3000 |
| Origin | Shanghai, China |
| Detector Type | Multi-probe EDS-compatible |
| Energy Resolution | 120 eV |
| Operating Environments | High Vacuum & Ambient Air |
| Maximum Beam Scan Area | 60 × 60 mm² |
| Sample Positioning | 4-axis Motorized Stage (Vacuum & Air) |
| Beam Control | Motorized Variable Aperture & Remote Focusing |
| Compliance | Designed for ISO/IEC 17025-aligned radiation effects testing workflows |
| Brand | MX-AFM |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | MX-plorer Premium |
| Instrument Type | Atomic Force Microscope (AFM) |
| Position Detection Noise | ≤ 50 pm |
| XY Sample Stage Travel Range | ≥ 5 mm |
| Operating Modes | Contact, Tapping, Phase Imaging, Conductive AFM (C-AFM), Kelvin Probe Force Microscopy (KPFM), Force Spectroscopy, Nanolithography |
| Control Architecture | Closed-Loop Piezoelectric Scanning System |
| Brand | Nano analytik |
|---|---|
| Origin | Germany |
| Model | AFM Series (SmartProbe Platform) |
| Instrument Type | Atomic Force Microscope |
| Vertical Position Detection Noise | 0.01 nm RMS |
| Maximum Sample Diameter | ≤10 cm |
| Scanner Range (Adeona) | 15 µm × 15 µm × 4 µm |
| Dimensions (Vacuum-Compatible Version) | 140 mm × 100 mm × 60 mm |
| Integrated Actuation & Sensing | Piezoresistive readout + bimaterial excitation on SmartProbe |
| XYZ Nanopositioning Range (Vacuum Variant) | 20 µm × 10 µm × 10 µm |
| Brand | Nano analytik |
|---|---|
| Origin | Germany |
| Model | SPL |
| Instrument Type | Atomic Force Microscope-based Scanning Probe Lithography System |
| Positioning Detection Noise | 0.01 nm (X, Y, Z) |
| Maximum Sample Diameter | 150 mm (6 in) |
| Stage Travel Range | 18 mm × 18 mm (expandable to 150 mm × 150 mm) |
| Minimum Feature Size | 5 nm (verified) |
| Direct-Write Speed | 300 µm/s |
| Overlay Accuracy | < 7 nm |
| Stitching Accuracy | < 10 nm |
| Maximum Writing Area per Field | 200 µm × 200 µm |
| Footprint | 80 cm × 100 cm × 190 cm |
| AFM Imaging Range | 10 µm × 10 µm × 5 µm (expandable to 200 µm × 200 µm) |
| Vertical RMS Noise | 0.01 nm |
| Closed-Loop Scan Linearity | 99.7% |
| Real-Time FPGA Feedback Bandwidth | 8 MHz |
| Data Acquisition Resolution | 16-bit (amplitude/phase) |
| Output Formats | BMP, PNG, JPG, TXT |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | FLEX-AFM |
| Instrument Type | Atomic Force Microscope |
| XY Positioning Noise | ≤ 0.15 nm (RMS, in air & liquid) |
| Sample Dimensions | Ø ≤ 100 mm, Thickness ≤ 5 mm |
| Sample Stage Travel Range | 300 mm × 300 mm |
| Scan Range | 100 µm × 100 µm × 10 µm (XY × Z) |
| XY Drive Resolution | 0.152 nm |
| Z Drive Resolution | 0.046 nm |
| Minimum Z Noise Floor | 0.15 nm (RMS, closed-loop) |
| Compatible Environments | Ambient air, liquid, controlled atmosphere (e.g., inert gas, low-oxygen), temperature-controlled stages |
| Controller | C3000 (24-bit, dual-channel lock-in amplifiers, digital feedback) |
| Optical Integration | Fully compatible with inverted optical microscopes |
| Modular Add-ons | ECS 204 electrochemical stage, ATS 204 automated translation stage, Isostage active vibration isolation, acoustic enclosure, glovebox integration kit |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | FlexAFM |
| Instrument Type | Material-Focused AFM |
| Position Detection Noise | <35 pm |
| Maximum Sample Diameter | ≤120 mm |
| Control Electronics | C3000i (24-bit), upgradeable to CX (28-bit) |
| Software | Nanosurf Software Suite |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments, supports GLP/GMP audit trails via optional software modules |
| Brand | NCS |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | FE-1050 Series |
| Instrument Form Factor | Floor-Standing |
| Electron Gun Type | Thermal Field Emission |
| Secondary Electron (SE) Resolution | 1.5 nm @ 1 kV, 0.9 nm @ 15 kV |
| Magnification Range | 10× to 1,000,000× |
| Accelerating Voltage | 0.02–30 kV |
| Backscattered Electron (BSE) Resolution | 2.5 nm @ 1 kV, 1.5 nm @ 15 kV |
| Sample Chamber Port Count | 27 |
| Stage Motion | 5-Axis Motorized (X = 140 mm, Y = 140 mm, Z = 60 mm, Rotation = 360°, Tilt = −10° to +80°) |
| Standard Detectors | In-Column SE Detector, Everhart-Thornley SE Detector, Optional Insertable BSE Detector, Optional STEM Detector, Triple-Channel IR CCD Chamber Monitoring System |