Electron Microscope
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| Brand | Bestron |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Domestic |
| Model | INSTEMS MET/MT/ME/ET/M |
| Application Field | Materials Science |
| Instrument Classification | In Situ Tensile/Compression/Bending Holder |
| Thermal Range | RT–1200 °C |
| Max Force Output | >100 mN |
| Max Displacement | >4 µm |
| Minimum Step Resolution | <0.5 nm |
| Dual-Tilt Range (α/β) | ±25° each |
| Tilt Precision | <0.1° |
| Thermal Ramp Rate | >10,000 °C/s |
| Temperature Accuracy | ≥98% |
| Thermometry Method | Four-Probe Resistive |
| EDS Compatibility | Yes |
| Electrical Output | ±50 V |
| Current Measurement Range | 1 pA–1 A |
| Voltage Measurement Range | 100 nV–50 V |
| Spatial Resolution (in situ) | ≤0.1 nm |
| Drift Stability | <50 pm/s |
| Brand | Bestron |
|---|---|
| Model | INSTEMS-M |
| Type | MEMS-Based In Situ TEM Mechanical Testing Holder |
| Loading Modes | Tension, Compression, Nanoindentation, Bending, Impact, Creep, Fatigue |
| Force Range | >100 mN |
| Displacement Range | 4 µm |
| Actuation Resolution | <500 pm |
| Drift Rate | <50 pm/s |
| Spatial Resolution (TEM-compatible) | ≤0.1 nm |
| Dual-Axis Tilt | α ±20°, β ±10° |
| Compatibility | Standard 3-mm TEM specimen holders, Gatan/FEI/Thermo Fisher-compatible apertures |
| Chip Customization | User-configurable MEMS chip geometry and loading configuration |
| Brand | Bestron |
|---|---|
| Model | INSTEMS-ME |
| Type | Dual-Axis Tilt Electromechanical In Situ TEM Holder |
| Max Force | 100 mN |
| Max Displacement | 4 µm |
| Force Resolution | < 500 pm |
| Voltage Range | ±50 V |
| Current Range | 1 pA–1 A |
| Temperature Range | RT–1200 °C |
| Temp. Stability | < 0.1 °C |
| α/β Tilt Range | ±25° each |
| Drift Rate | < 50 pm/s |
| Spatial Resolution (TEM-compatible) | ≤0.1 nm |
| EDS-Compatible | Yes |
| Application Domain | Materials Science, Nanodevices, Energy Storage, Ferroelectrics, Piezoelectrics, Flexible Electronics |
| Brand | Bestron |
|---|---|
| Model | INSTEMS-MET |
| Type | In Situ TEM Dual-Axis Tilt Sample Holder with Integrated Mechanical, Electrical, and Thermal Actuation |
| Heating Range | RT to 1200 °C |
| Temperature Accuracy | < 0.1 °C |
| Max. Driving Force | > 100 mN |
| Drive Resolution | < 500 pm |
| Voltage Range | ±50 V (up to 150 V peak) |
| Current Range | 1 pA – 2 A |
| Dual-Axis Tilt | α/β ±25° |
| Spatial Resolution (TEM-compatible) | ≤ 0.1 nm |
| Sample Drift | < 50 pm/s |
| EDS-Compatible | Yes |
| Heating Rate | > 10,000 °C/s |
| Brand | Bestron |
|---|---|
| Model | INSTEMS-MT |
| Category | In Situ TEM Sample Holder |
| Heating Range | RT to 1200 °C |
| Temperature Accuracy | < 0.1 °C |
| Programmable Thermal Ramp Rate | >10,000 °C/s |
| Mechanical Load Capacity | >100 mN |
| Drive Resolution | < 500 pm |
| Dual-Axis Tilt | α ±20°, β ±10° |
| Sample Drift | < 50 pm/s |
| Spatial Resolution (TEM-compatible) | ≤0.1 nm |
| EDS-Compatible | Yes |
| Current Range | 0–2 A |
| Voltage Range | 0–150 V |
| Brand | Bestron |
|---|---|
| Model | INSTEMS-ET |
| Type | In Situ Dual-Axis Tilt TEM Sample Holder |
| Heating Range | RT to 1200 °C |
| Electrical Bias Range | 0–150 V |
| Current Range | 0–2 A |
| Dual-Axis Tilt | α ±20°, β ±10° |
| Spatial Resolution (in situ) | ≤0.1 nm |
| Sample Drift | <50 pm/s |
| EDS-Compatible | Yes |
| Heating Accuracy | ≥98% |
| Maximum Heating Rate | >10,000 °C/s |
| Current Measurement Range | 1 pA–1 A |
| Brand | Betop Scientific |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM Manufacturer |
| Country of Origin | China |
| Model | CSPM6000 |
| Instrument Type | Atomic Force Microscope (AFM) |
| Position Detection Noise | ≤0.1 nm |
| Sample Dimensions | Ø < 100 mm, Thickness < 40 mm |
| XY Sample Stage Travel Range | 100 mm × 100 mm |
| Force Sensitivity | ≤5 pN |
| Image Resolution Options | 128×128 to 4096×4096 pixels |
| Scan Rotation | 0–360° |
| Scan Frequency Range | 0.1–100 Hz |
| Control Architecture | Dual-core DSP+ARM processor (Texas Instruments) |
| Feedback System | Fully digital PID-controlled feedback with auto-tuning |
| Communication Interfaces | Gigabit Ethernet (TCP/IP) + High-Speed USB 2.0 |
| Display | 16×4 LCD with real-time system diagnostics |
| Software | Multi-language (EN/CN-Traditional/CN-Simplified), Windows 10/7/XP/Vista compatible |
| Brand | Betop Scientific |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Country of Origin | China |
| Model | OpenSPM |
| Instrument Category | Atomic Force Microscope (AFM) |
| Instrument Type | Materials Science AFM |
| Z-Direction Position Detection Noise (RMS) | ≤0.05 nm (calibrated on monolayer step height of HOPG graphite) |
| Maximum Sample Diameter | ≤30 mm |
| Maximum Sample Thickness | ≤20 mm |
| Sample Stage Travel Range (Auto-Approach) | ≥23 mm (one-click automated approach), Minimum Step Resolution: ≤50 nm |
| Manual XY Adjustment Range | ≥±8.0 mm |
| Scanner Type | Tube Scanner |
| Maximum Scan Range | ≥20 μm × 20 μm × 3 μm |
| Lateral Resolution | <0.02 nm (in-plane) |
| Scan Rate | 0.1–30 lines/sec |
| PID Feedback Loop Response Time | <10 μs |
| Max Pixel Density per Image | 4000 × 4000 physical pixels |
| Real-Time Simultaneous Data Channels | ≥5 |
| Control Architecture | Dual-Core Embedded System (ARM + DSP) |
| Communication Protocol | TCP/IP |
| Detection Mode | Frequency Modulation (FM-AFM) with Integrated Analog-Digital Lock-in Amplifier |
| Software Capabilities | Real-time 3D surface rendering, multi-parameter mapping (topography, phase, friction, current, force-distance, I–V, I–Z), tip characterization & image deconvolution algorithms |
| Compliance | Designed for GLP-compliant materials characterization workflows |
| Brand | Betop Scientific |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Country of Origin | China |
| Model | RamSPM |
| Price Range | USD 70,000 – 140,000 |
| Instrument Category | Atomic Force Microscope (AFM) |
| Instrument Class | Materials Science AFM |
| Z-direction RMS System Noise | ≤0.05 nm (calibrated on monolayer step height of HOPG) |
| Maximum Sample Diameter | ≤30 mm |
| Maximum Sample Thickness | ≤20 mm |
| Auto-approach Travel Range | ≥23 mm |
| Minimum Step Resolution | ≤50 nm |
| Brand | Betop Scientific |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Manufacturer |
| Product Category | Domestic |
| Model | TopSPM |
| Price Range | USD 84,000 – 182,000 |
| Instrument Type | Atomic Force Microscope (AFM) |
| Application Class | Materials Science AFM |
| Z-direction RMS System Noise | ≤0.05 nm (calibrated on graphite monolayer step height) |
| Maximum Sample Diameter | ≤30 mm |
| Maximum Sample Thickness | ≤20 mm |
| Auto-Approach Travel Range | ≥23 mm |
| Minimum Approach Step Resolution | ≤50 nm |
| Closed-Loop XY Scan Range | ≥30 µm × 30 µm |
| Closed-Loop Z Scan Range | ≥8 µm |
| Scan Resolution | <1.5 nm |
| Line Rate | 0.1–30 lines/sec |
| PID Feedback Response Time | <10 µs |
| Max Pixel Density per Image | 4000 × 4000 |
| Real-Time Simultaneous Data Channels | ≥5 |
| Control Architecture | Dual-Core Embedded System (ARM + DSP) |
| Communication Protocol | TCP/IP |
| Detection Mode | Frequency Modulation (FM-AFM) |
| Integrated Lock-in Amplifier | Analog-Digital Hybrid Structure |
| Probe Compatibility | Self-Sensing Probes & Conventional Laser-Detected Cantilevers |
| Brand | BM |
|---|---|
| Origin | Shanghai, China |
| Model | TM3030 |
| Instrument Type | Desktop SEM |
| Electron Source | Pre-aligned Tungsten Filament |
| Accelerating Voltages | 5 kV, 15 kV |
| Magnification Range | 15× to 30,000× (with digital zoom: 2×, 4×) |
| Maximum Sample Diameter | 70 mm |
| Sample Stage Travel | X: ±17.5 mm, Y: ±17.5 mm |
| Detector System | High-sensitivity 4-segment semiconductor backscattered electron (BSE) detector |
| Vacuum System | Turbo-molecular pump (30 L/s), diaphragm pump (1 m³/h), ultimate vacuum ≤1.5×10⁻⁵ Pa, variable pressure mode (6–270 Pa, 22 steps) |
| Control Interface | Two USB 2.0 ports, Ethernet port |
| Operating System | Microsoft Windows® 7 or later |
| Display | 15.4-inch LCD (1280×800 resolution) |
| Auto-functions | Auto filament saturation, auto beam alignment, auto stigmation, auto focus, auto brightness/contrast, overcurrent protection, leakage circuit breaker |
| Brand | BM |
|---|---|
| Origin | Shanghai, China |
| Model | U1510 |
| Instrument Type | Floor-standing SEM |
| Electron Source | Tungsten Filament |
| Vacuum Modes | High Vacuum & Variable Pressure (6–270 Pa) |
| Secondary Electron Resolution | 3.0 nm @ 30 kV (High Vacuum) |
| Backscattered Electron Resolution | 4.0 nm @ 30 kV (6 Pa, Low Vacuum) |
| Magnification Range | 5× to 300,000× |
| Accelerating Voltage | 0.3–30 kV |
| Max Sample Diameter | 153 mm |
| Stage Travel | X 0–80 mm, Y 0–40 mm, Z 5–50 mm, T –20° to +90°, R 360° |
| Standard Detectors | Everhart-Thornley-type Secondary Electron Detector (SED), High-Sensitivity Semiconductor Backscattered Electron Detector (BSE) |
| Vacuum System | Single Turbo-Molecular Pump + Rotary Mechanical Pump |
| Safety Features | Power Failure Protection, Leakage Current Interlock, Automatic Shutdown |
| Brand | LANScientific |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Origin Category | Domestic (China) |
| Model | SuperSEM N10 |
| Instrument Type | Benchtop SEM |
| Electron Source | Tungsten Filament |
| SEM Class | Entry-Level Tungsten-Filament SEM |
| Max Sample Diameter | 90 mm |
| Max Sample Thickness | 40 mm |
| Stage Travel | X: 25 mm, Y: 25 mm, Z: 30 mm |
| Brand | LANScientific |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | Domestic (China) |
| Model | SuperSEM N10eV |
| Instrument Type | Desktop / Benchtop SEM |
| Electron Gun Type | Tungsten Filament |
| Microscope Class | Entry-Level Tungsten-Filament SEM |
| Maximum Sample Dimensions | 90 mm (diameter) × 40 mm (thickness) |
| Stage Travel Range | X: 25 mm, Y: 25 mm, Z: 30 mm |
| Brand | LANScientific |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Region Classification | Domestic (China) |
| Model | SuperSEM N10eX |
| Instrument Type | Desktop SEM |
| Electron Source | Tungsten Filament |
| SEM Class | Entry-Level Tungsten-Filament SEM |
| Maximum Sample Diameter | 90 mm |
| Maximum Sample Thickness | 40 mm |
| Stage Travel | X: 25 mm, Y: 25 mm, Z: 30 mm |
| Brand | LANScientific |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Direct Manufacturer |
| Regional Category | Domestic (China) |
| Model | SuperSEM N10XL |
| Instrument Type | Desktop SEM |
| Electron Source | Tungsten Filament |
| SEM Class | Entry-Level Tungsten-Filament SEM |
| Sample Chamber Size | Up to 100 × 100 mm |
| Detector Configuration | Secondary Electron Detector (SED), Quadrant Backscattered Electron Detector (BSE), Integrated Silicon Drift Detector (SDD)-based EDS System |
| Real-Time Imaging Mode | Video-rate BSE + EDS spectral acquisition |
| Software Features | Auto-focus, Auto-stigmation, Auto-contrast/brightness, Large-area Stitching, Live EDS Mapping, Real-time Spectral Overlay |
| Power Requirement | Standard AC 220 V, 50 Hz |
| Footprint | < 0.8 m² |
| Brand | Bruker |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AMICS Automated Mineralogy System (MLA) |
| Price | USD 210,000 (FOB Hamburg) |
| Brand | Bruker |
|---|---|
| Origin | USA |
| Model | Dimension Edge |
| Instrument Type | Material-Focused AFM |
| Positioning Noise | X-Y ≤ 50 pm RMS, Z ≤ 50 pm RMS |
| Sample Diameter | 150 mm (vacuum chuck), Thickness: ≤ 15 mm |
| Scan Area | 150 mm × 150 mm |
| Imaging Bandwidth | Typical high-speed acquisition capability |
| Category | Scanning Probe Microscope (SPM) / Atomic Force Microscope (AFM) |
| Brand | Bruker |
|---|---|
| Origin | Malaysia |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | Dimension Edge |
| Price Range | USD 135,000 – 205,000 (FOB) |
| Instrument Type | Atomic Force Microscope (AFM) |
| Positional Noise (X-Y, Closed-Loop) | ≤0.15 nm RMS at standard imaging bandwidth (up to 625 Hz) |
| Z-Noise (Closed-Loop) | 35 pm RMS at standard imaging bandwidth (up to 625 Hz) |
| Sample Diameter Capacity | 210 mm |
| XY Stage Travel Range | 150 mm × 150 mm |
| Brand | Bruker |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | Dimension FastScan |
| Instrument Type | Materials-Focused AFM |
| Position Detection Noise | X-Y ≤ 0.15 nm RMS, Z = 35 pm RMS |
| Typical Imaging Bandwidth | Up to 625 Hz |
| Sample Diameter | 210 mm (vacuum chuck), Max Thickness: ≤ 15 mm |
| Stage Travel Range | 180 mm × 150 mm |
| Brand | Bruker |
|---|---|
| Origin | Germany |
| Model | Dimension FastScan |
| Instrument Type | Materials-Focused AFM |
| XY Positioning Noise | ≤0.15 nm |
| Sample Dimensions | Ø ≤ 15 mm, Thickness ≤ 5 mm |
| Stage Travel Range | 180 mm × 180 mm |
| Brand | Bruker |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Dimension FASTSCAN |
| Pricing | Available Upon Request |
| Brand | Bruker |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Dimension Icon |
| Price Range | USD 135,000 – 205,000 (est.) |
| Instrument Type | Atomic Force Microscope |
| Application Class | Materials Science AFM |
| Position Detection Noise | <0.15 nm RMS (at typical imaging bandwidth up to 625 Hz) |
| Sample Diameter | Up to 210 mm |
| Sample Thickness Limit | ≤5 mm |
| XY Stage Travel Range | 180 mm × 150 mm |
| XY Repeatability | 2 µm (unidirectional), 3 µm (bidirectional) |
| Brand | Bruker |
|---|---|
| Origin | Malaysia |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Dimension Icon |
| Instrument Type | Atomic Force Microscope |
| X-Y Positioning Noise (Closed-Loop) | ≤0.15 nm RMS (Standard Imaging Bandwidth, up to 625 Hz) |
| Z Positioning Noise (Closed-Loop) | 35 pm RMS (Standard Imaging Bandwidth, up to 625 Hz) |
| Maximum Sample Diameter | 210 mm |
| Sample Stage Travel Range | 150 mm |
| Brand | Bruker |
|---|---|
| Origin | USA |
| Model | Dimension Icon |
| Instrument Type | Atomic Force Microscope (AFM) |
| Vertical Noise Floor (Z-sensor, closed-loop) | <35 pm RMS |
| Typical Imaging Bandwidth | 625 Hz |
| Sample Stage | 210 mm vacuum chuck (Ø210 mm × 15 mm thick) |
| Stage Travel Range (X-Y visual field) | 180 mm × 180 mm |
| X-Y Scan Range (typical) | 90 µm × 90 µm |
| Z Scan Range (typical) | 10 µm |
| X-Y Positioning Noise (closed-loop) | <0.15 nm RMS (625 Hz) |
| Z Sensor Noise (closed-loop) | <35 pm RMS (625 Hz) |
| Overall Linearity Error (X-Y-Z) | 0.5% (typical) |
| Optical System | 5 MP digital camera, 180–1465 µm field of view, digital zoom & auto-focus |
| Controller | NanoScope V |
| Integrated Vibration Isolation | Monolithic pneumatic isolation table |
| Acoustic Enclosure | Rated for continuous ambient noise up to 85 dBC |
| Brand | Bruker |
|---|---|
| Origin | USA |
| Model | Dimension IconIR |
| Type | Modular Scanning Probe Microscope (SPM) with Integrated AFM-IR |
| Measurement Principle | Photothermal Induced Resonance (PTIR) / Nanoscale Fourier Transform Infrared (nano-FTIR) |
| Spatial Resolution | <10 nm |
| Sensitivity | Monolayer-level chemical detection |
| Compatibility | PeakForce Tapping® for nanomechanical & nanoelectrical correlative mapping |
| Software Platform | NanoScope Analysis with IR spectral library integration |
| Compliance | Supports GLP/GMP audit trails, ASTM E2987 (for nanoscale spectroscopic imaging), ISO/IEC 17025 traceability frameworks |
| Brand | Bruker |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Dimension Nexus |
| Instrument Type | Atomic Force Microscope |
| Application Class | Materials Science AFM |
| Architecture | Modular, Multi-Mode Scanning Probe Microscope |
| Controller Platform | NanoScope 6 |
| Core Imaging Modes | PeakForce Tapping®, PeakForce QNM®, PeakForce MFM®, ScanAsyst® Auto-Optimization |
| Environmental Operation | Air, Liquid, Controlled Atmosphere |
| Brand | Bruker |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | QUANTAX ED-XS |
| CCD Camera Resolution | 640 × 480 pixels |
| Maximum Stage Speed | 10 mm/s |
| Spatial Resolution | 50 nm |
| Angular Resolution | 0.2° |
| Brand | Bruker |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | OPTIMUS 2 QUANTAX EBSD eflash FS |
| CCD Camera Resolution | 640 × 480 |
| Maximum Stage Speed | 10 mm/s |
| Spatial Resolution | 1.5 nm |
| Angular Resolution | 0.2° |
| Brand | Bruker |
|---|---|
| Origin | Germany |
| Product Type | Imported Software for Electron Microscopy |
| Model | ESPRIT 2 |
| Price Range | USD 25,000 – 65,000 |