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| Brand | LabTech |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Instrument Type | Sequential Scanning ICP-OES |
| Detection Limit | <1 ppb (typ. for key elements) |
| Precision (RSD) | ≤1% |
| Stability (RSD, 4h) | ≤2% |
| Wavelength Range | 165–900 nm |
| Optical Resolution | 6 pm / 7 pm / 10 pm @ 257.610 nm (Mn line, measured) |
| Brand | LabTech |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Manufacturer |
| Regional Category | Domestic (China) |
| Model | LabICP 2000 ICP-OES |
| Instrument Type | Full-Spectrum Simultaneous ICP-OES |
| Optical Design | Prism + High-Resolution Echelle Grating Two-Dimensional Cross-Dispersed System |
| Detector | Megapixel Large-Area CCD |
| Plasma Orientation | Vertical Torch |
| Observation Modes | Radial, Axial, Dual-View, and Attenuated Variants |
| Gas Control | Mass Flow Controllers (MFCs) for All Gases |
| Software | HiICP Platform with Real-Time & Offline Analysis Capabilities |
| Cooling | Thermoelectrically Cooled CCD with MPS Thermal Isolation Structure |
| Purge | Positive-Pressure Sealed Spectrometer Chamber with Independent Front-Optics Purge |
| RF Generator | Solid-State Crystal-Controlled RF Source with Real-Time Power Monitoring |
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