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Micro-Nano Cube Technology (Beijing) Co., Ltd.

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BrandKLOE
OriginFrance
ModelDilase 250
Exposure ModeNon-contact (Flying Spot)
Resolution≤100 nm (line width, under optimal resist & process conditions)
Wavelength375 nm or 405 nm (solid-state laser)
Beam Spot SizeAdjustable from 1 µm to 50 µm
Writing Area100 mm × 100 mm
Stage Positioning Accuracy100 nm (standard), 40 nm (optional)
Repeatability±100 nm
Overlay Accuracy (Multi-layer)≤1 µm
Orthogonality Error<1 mrad
Maximum Sample SizeUp to 125 mm square (5-inch equivalent)
Substrate Thickness Range250 µm – 5 mm
Laser Lifetime>10,000 h
File Format SupportGDSII, OASIS, DXF, LWO
Safety ComplianceEN 60825-1, IEC 61000-6-2/6-4, CE Marked
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OriginBeijing, China
Manufacturer TypeAuthorized Distributor
Origin CategoryDomestic (PRC)
ModelSC100D
Price RangeUSD 1,400 – 2,800
Max. Rotation Speed0–10,000 rpm
Speed Resolution1 rpm
Timing Resolution0.1 s
Acceleration Range (no-load)10–50,000 rpm/s
Maximum Substrate Diameter203 mm (8-inch wafer)
Chamber Diameter203 mm
Programmable Recipes100 recipes × 100 steps
Max. Process Duration3000 s
Control SystemIndustrial PLC with servo motor drive
HMI7-inch full-color capacitive touchscreen
Chamber MaterialHDPE inner cavity
EnclosureStainless steel (SUS304)
Viewing WindowSolvent-resistant polycarbonate (PC)
Spray SystemQuadruple independent nozzle array (developer, DI water, optional process chemicals)
ComplianceDesigned for Class 1000 cleanroom-compatible operation
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