Empowering Scientific Discovery

Microno Technology Co., Ltd.

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BrandAXIS-TEC
OriginUSA
ModelPE-100
RF Frequency13.56 MHz
RF Power0–300 W (automatically adjustable)
Chamber Dimensions305 × 368 × 305 mm (L×D×H)
Chamber Volume34 L
Chamber MaterialT6-aluminum monolithic construction
Operating Pressure Range1–2000 mTorr
Gas Flow Control0–50 sccm with precision needle valve
Vacuum GaugePirani gauge (0–1 Torr)
Gas InletSingle or multi-channel configurable
Control SystemPLC-based HMI automation
Configuration OptionsPlasma cleaning, isotropic plasma etching, anisotropic RIE, and switchable mode architecture
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BrandAXIS-TEC
OriginUSA
ModelPlasmaSTAR100 / PlasmaSTAR200
RF Frequency40 kHz (LF) or 13.56 MHz
RF Power600 W
Chamber Volume10 L
Chamber MaterialAnodized Aluminum
Maximum Substrate Size8-inch wafer
Process Gas Pressure10 PSI
Control InterfaceTouchscreen PC with Multi-step Programmable Logic
Vacuum SystemRotary Vane Pump (standard), optional Roots-boosted configuration
Gas DeliveryMass Flow Controllers (MFCs) standard, downstream pressure controller optional
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BrandAXIS-TEC
OriginUSA
ModelPE-75
RF Frequency13.56 MHz
Power Output0–150 W (automatically regulated)
Chamber DimensionsCylindrical, ID 273 mm × Depth 254 mm
Chamber Volume13.8 L
Chamber MaterialT-6 Aluminum Monolithic Construction
Operating GasSingle- or Multi-Gas Inlet
Vacuum Range1–2000 mT (via Pirani gauge, 0–1 Torr)
Gas Flow Control0–25 sccm with Precision Needle Valve
Control ModeFully Automated
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BrandASH TECHNOLOGIES
OriginIreland
ModelInspex 4K
Resolution3840 × 2160 (4K UHD)
Optical Zoom85×
Digital Zoom170×
Color Depth10-bit
Video Latency<30 ms
Ergonomic Stand ConfigurationAdjustable articulating arm with dual-axis tilt and height lock
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BrandASH TECHNOLOGIES
OriginIreland
ModelASH-4K-MIAS
Optical Zoom85×
Digital Zoom170×
Resolution3840 × 2160 pixels (4K UHD)
InterfaceIntuitive GUI with ergonomic control layout
LatencyLow-latency real-time image processing and display
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BrandASH TECHNOLOGIES
OriginIreland
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelOmni
Price RangeUSD 2,400 – 3,000
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BrandASH TECHNOLOGIES
OriginIreland
ModelInspex
Resolution3840 × 2160 (4K UHD)
Optical Zoom85×
Digital Zoom170×
Color DepthEnhanced 10-bit processing
Video Latency<35 ms
ComplianceCE, RoHS, ISO 13584-42 (Digital Imaging for Industrial Metrology)
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BrandASH TECHNOLOGIES
OriginIreland
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelOmni3
Price RangeUSD 21,500 – 27,000
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BrandASH TECHNOLOGIES
OriginIreland
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelOmni3 Third-Generation
Price RangeUSD 2,500–2,800
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Brand--
OriginImported
Manufacturer TypeGeneral Distributor
ModelWaveDriver 200
PriceUpon Request
Working Electrode ConfigurationSingle or dual WE with shared RE and CE
Current Range±100 nA to ±1 A
Potential Range±2.5 V / ±10 V / ±15 V (selectable)
EIS Frequency Range10 µHz – 1 MHz
DC TechniquesCV, LSV, CA, DPV, SWV, NPV, ASV, OCP, ZRA, RCP, BE, etc.
AC TechniquesEIS, Mott-Schottky, iR Compensation Measurement
Optional AccessoriesRRDE, RDE, Spectroelectrochemical Cells
SoftwareAfterMath (EIS equivalent circuit fitting, Kramers–Kronig validation, data transformation, advanced analysis modules)
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Brand--
OriginImported
Manufacturer TypeAuthorized Distributor
ModelAT650T / AT-Ozone Generator / AT650P / AT200M
PricingUpon Request
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Brand--
OriginIreland
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelASH-INSPEX HD VESA
PricingAvailable Upon Request
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OriginUSA
Manufacturer TypeAuthorized Distributor
Import StatusImported
ModelsSCS112 / SCSe124 / SCSe126
Cleaning MethodWet Chemical & DI Water-Based Cleaning
Equipment TypeSingle-Wafer Manual Processing Station
Maximum Substrate Diameter8 in (SCS112) or 10 in (SCSe124/SCSe126)
System Dimensions (W×D×H)26 in × 21 in × 40 in
Spindle SpeedUp to 2500 rpm
Control ArchitectureMicroprocessor-Based with Touchscreen GUI (SCSe124/SCSe126) or Keypad Interface (SCS112)
Preset Recipes3 (SCS112) or 10 (SCSe124/SCSe126)
Mechanical Arms1 (SCS112), 2 (SCSe124), or 4 (SCSe126)
Chamber MaterialChemically Resistant Polypropylene
Exhaust ConfigurationRadial Laminar Flow Chamber (SCSe124/SCSe126)
Drying OptionsHigh-velocity N₂ purge, IR heating lamp, or heated DI water rinse
Safety FeaturesInterlocked lid, positive-pressure chamber cover, emergency stop circuitry
Power Supply220 VAC, 10 A, 50/60 Hz
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BrandFilmetrics
OriginUSA
ModelR50
Measurement PrincipleContact Four-Point Probe (4PP) & Non-Contact Eddy Current (EC)
Max Sample Diameter300 mm
Max Mapping Area200 mm × 200 mm
XY Stage Travel Options100 mm × 100 mm or 200 mm × 200 mm (R50-200)
Z-Travel100 mm
Tilt Stage Range±5°
Mapping SpeedUp to 1 point/sec
SoftwareRsMapper™ with Pattern Generator, GLP-Compliant Data Logging
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BrandBEIJING EAST STAR LABS
OriginBeijing, China
ModelRTP800V
Instrument TypeHigh-Vacuum Rapid Annealing Furnace
Sample Size200 mm (8-inch) wafers
Temperature Range150–1300 °C
Maximum Ramp Rate1–200 °C/s
Cooling Rate≥80 °C/s
Vacuum Level≤5×10⁻⁵ Pa (standard configuration)
Control ArchitectureMulti-zone adaptive thermal regulation with non-PID real-time feedback
ComplianceDesigned for ISO/IEC 17025-aligned lab environments
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BrandNovascan
OriginUSA
Model SeriesPSD & PSDP
Control TypeDigital (PSD) / Programmable Digital (PSDP)
UV Wavelengths185 nm and 254 nm
Lamp TypeLow-pressure mercury grid lamp with aluminum reflector
Lamp Lifetime~5,000 hours
Sample StageHeight-adjustable with position lock
Chamber AccessTop-hinged lid for 360° sample loading
Safety InterlockAutomatic UV shutoff when chamber is open
Gas OptionsAmbient air or optional O₂ feed via inlet ports
Exhaust OptionsIntegrated ozone destruct unit with pump (optional)
Temperature CapabilityUp to 150 °C (200 °C or 300 °C heating plate available as option)
Vacuum ChamberCustomizable (aluminum or quartz)
ComplianceDesigned for GLP-compliant environments
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OriginGermany
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelMR200
Price RangeUSD 13,500 – 40,500 (FOB)
Maximum Scribing Length200 mm
Scribing Force Range10 g – 130 g
Diamond Blade Contact Width5 µm – 10 µm
Zoom Microscope Magnification8× – 40× (continuous, stepless)
Optical Resolution at 10×< 10 µm
X/Y Manual Stage Travel200 mm × 200 mm
Fine Positioning Accuracy0.01 mm (X/Y), 0.006° (rotation)
Wafer Chuck Diameter200 mm (standard), optional 100 mm
Vacuum Hold-Down Pressure< 75 mbar
Power Supply100–220 V AC, 60 W
Dimensions (W×D×H)430 mm × 700 mm × 550 mm
Weight~16 kg
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BrandLaurell
OriginUSA
ModelWS-650Mz-23N
Maximum Speed12,000 rpm
Acceleration0–12,000 rpm/sec
Speed Accuracy≤ ±1 rpm (NIST-traceable)
Speed Stability< ±1%
Time Resolution0.1 sec (1–5999.9 sec/step)
Chuck CompatibilityØ10–150 mm wafers or 125×125 mm square substrates
Chamber Diameter9.5 in (241 mm)
ControllerPLC-based with SPIN3000 software integration
Construction MaterialNPP (Natural Polypropylene)
Programmability20 stored recipes, up to 51 steps per recipe
Vacuum SystemOil-free pump, 220–240 VAC, 50/60 Hz
LevelingIncluded NIST-calibrated digital level
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