- All
- Favorite
- Popular
- Most rated
| Brand | AXIS-TEC |
|---|---|
| Origin | USA |
| Model | PE-100 |
| RF Frequency | 13.56 MHz |
| RF Power | 0–300 W (automatically adjustable) |
| Chamber Dimensions | 305 × 368 × 305 mm (L×D×H) |
| Chamber Volume | 34 L |
| Chamber Material | T6-aluminum monolithic construction |
| Operating Pressure Range | 1–2000 mTorr |
| Gas Flow Control | 0–50 sccm with precision needle valve |
| Vacuum Gauge | Pirani gauge (0–1 Torr) |
| Gas Inlet | Single or multi-channel configurable |
| Control System | PLC-based HMI automation |
| Configuration Options | Plasma cleaning, isotropic plasma etching, anisotropic RIE, and switchable mode architecture |
| Brand | AXIS-TEC |
|---|---|
| Origin | USA |
| Model | PlasmaSTAR100 / PlasmaSTAR200 |
| RF Frequency | 40 kHz (LF) or 13.56 MHz |
| RF Power | 600 W |
| Chamber Volume | 10 L |
| Chamber Material | Anodized Aluminum |
| Maximum Substrate Size | 8-inch wafer |
| Process Gas Pressure | 10 PSI |
| Control Interface | Touchscreen PC with Multi-step Programmable Logic |
| Vacuum System | Rotary Vane Pump (standard), optional Roots-boosted configuration |
| Gas Delivery | Mass Flow Controllers (MFCs) standard, downstream pressure controller optional |
| Brand | AXIS-TEC |
|---|---|
| Origin | USA |
| Model | PE-75 |
| RF Frequency | 13.56 MHz |
| Power Output | 0–150 W (automatically regulated) |
| Chamber Dimensions | Cylindrical, ID 273 mm × Depth 254 mm |
| Chamber Volume | 13.8 L |
| Chamber Material | T-6 Aluminum Monolithic Construction |
| Operating Gas | Single- or Multi-Gas Inlet |
| Vacuum Range | 1–2000 mT (via Pirani gauge, 0–1 Torr) |
| Gas Flow Control | 0–25 sccm with Precision Needle Valve |
| Control Mode | Fully Automated |
| Brand | ASH TECHNOLOGIES |
|---|---|
| Origin | Ireland |
| Model | Inspex 4K |
| Resolution | 3840 × 2160 (4K UHD) |
| Optical Zoom | 85× |
| Digital Zoom | 170× |
| Color Depth | 10-bit |
| Video Latency | <30 ms |
| Ergonomic Stand Configuration | Adjustable articulating arm with dual-axis tilt and height lock |
| Brand | ASH TECHNOLOGIES |
|---|---|
| Origin | Ireland |
| Model | ASH-4K-MIAS |
| Optical Zoom | 85× |
| Digital Zoom | 170× |
| Resolution | 3840 × 2160 pixels (4K UHD) |
| Interface | Intuitive GUI with ergonomic control layout |
| Latency | Low-latency real-time image processing and display |
| Brand | ASH TECHNOLOGIES |
|---|---|
| Origin | Ireland |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Omni |
| Price Range | USD 2,400 – 3,000 |
| Brand | ASH TECHNOLOGIES |
|---|---|
| Origin | Ireland |
| Model | Inspex |
| Resolution | 3840 × 2160 (4K UHD) |
| Optical Zoom | 85× |
| Digital Zoom | 170× |
| Color Depth | Enhanced 10-bit processing |
| Video Latency | <35 ms |
| Compliance | CE, RoHS, ISO 13584-42 (Digital Imaging for Industrial Metrology) |
| Brand | ASH TECHNOLOGIES |
|---|---|
| Origin | Ireland |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Omni3 |
| Price Range | USD 21,500 – 27,000 |
| Brand | ASH TECHNOLOGIES |
|---|---|
| Origin | Ireland |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Omni3 Third-Generation |
| Price Range | USD 2,500–2,800 |
| Brand | -- |
|---|---|
| Origin | Imported |
| Manufacturer Type | General Distributor |
| Model | WaveDriver 200 |
| Price | Upon Request |
| Working Electrode Configuration | Single or dual WE with shared RE and CE |
| Current Range | ±100 nA to ±1 A |
| Potential Range | ±2.5 V / ±10 V / ±15 V (selectable) |
| EIS Frequency Range | 10 µHz – 1 MHz |
| DC Techniques | CV, LSV, CA, DPV, SWV, NPV, ASV, OCP, ZRA, RCP, BE, etc. |
| AC Techniques | EIS, Mott-Schottky, iR Compensation Measurement |
| Optional Accessories | RRDE, RDE, Spectroelectrochemical Cells |
| Software | AfterMath (EIS equivalent circuit fitting, Kramers–Kronig validation, data transformation, advanced analysis modules) |
| Brand | -- |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | AT650T / AT-Ozone Generator / AT650P / AT200M |
| Pricing | Upon Request |
| Brand | -- |
|---|---|
| Origin | Ireland |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | ASH-INSPEX HD VESA |
| Pricing | Available Upon Request |
| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Models | SCS112 / SCSe124 / SCSe126 |
| Cleaning Method | Wet Chemical & DI Water-Based Cleaning |
| Equipment Type | Single-Wafer Manual Processing Station |
| Maximum Substrate Diameter | 8 in (SCS112) or 10 in (SCSe124/SCSe126) |
| System Dimensions (W×D×H) | 26 in × 21 in × 40 in |
| Spindle Speed | Up to 2500 rpm |
| Control Architecture | Microprocessor-Based with Touchscreen GUI (SCSe124/SCSe126) or Keypad Interface (SCS112) |
| Preset Recipes | 3 (SCS112) or 10 (SCSe124/SCSe126) |
| Mechanical Arms | 1 (SCS112), 2 (SCSe124), or 4 (SCSe126) |
| Chamber Material | Chemically Resistant Polypropylene |
| Exhaust Configuration | Radial Laminar Flow Chamber (SCSe124/SCSe126) |
| Drying Options | High-velocity N₂ purge, IR heating lamp, or heated DI water rinse |
| Safety Features | Interlocked lid, positive-pressure chamber cover, emergency stop circuitry |
| Power Supply | 220 VAC, 10 A, 50/60 Hz |
| Brand | Filmetrics |
|---|---|
| Origin | USA |
| Model | R50 |
| Measurement Principle | Contact Four-Point Probe (4PP) & Non-Contact Eddy Current (EC) |
| Max Sample Diameter | 300 mm |
| Max Mapping Area | 200 mm × 200 mm |
| XY Stage Travel Options | 100 mm × 100 mm or 200 mm × 200 mm (R50-200) |
| Z-Travel | 100 mm |
| Tilt Stage Range | ±5° |
| Mapping Speed | Up to 1 point/sec |
| Software | RsMapper™ with Pattern Generator, GLP-Compliant Data Logging |
| Brand | BEIJING EAST STAR LABS |
|---|---|
| Origin | Beijing, China |
| Model | RTP800V |
| Instrument Type | High-Vacuum Rapid Annealing Furnace |
| Sample Size | 200 mm (8-inch) wafers |
| Temperature Range | 150–1300 °C |
| Maximum Ramp Rate | 1–200 °C/s |
| Cooling Rate | ≥80 °C/s |
| Vacuum Level | ≤5×10⁻⁵ Pa (standard configuration) |
| Control Architecture | Multi-zone adaptive thermal regulation with non-PID real-time feedback |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Brand | Novascan |
|---|---|
| Origin | USA |
| Model Series | PSD & PSDP |
| Control Type | Digital (PSD) / Programmable Digital (PSDP) |
| UV Wavelengths | 185 nm and 254 nm |
| Lamp Type | Low-pressure mercury grid lamp with aluminum reflector |
| Lamp Lifetime | ~5,000 hours |
| Sample Stage | Height-adjustable with position lock |
| Chamber Access | Top-hinged lid for 360° sample loading |
| Safety Interlock | Automatic UV shutoff when chamber is open |
| Gas Options | Ambient air or optional O₂ feed via inlet ports |
| Exhaust Options | Integrated ozone destruct unit with pump (optional) |
| Temperature Capability | Up to 150 °C (200 °C or 300 °C heating plate available as option) |
| Vacuum Chamber | Customizable (aluminum or quartz) |
| Compliance | Designed for GLP-compliant environments |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | MR200 |
| Price Range | USD 13,500 – 40,500 (FOB) |
| Maximum Scribing Length | 200 mm |
| Scribing Force Range | 10 g – 130 g |
| Diamond Blade Contact Width | 5 µm – 10 µm |
| Zoom Microscope Magnification | 8× – 40× (continuous, stepless) |
| Optical Resolution at 10× | < 10 µm |
| X/Y Manual Stage Travel | 200 mm × 200 mm |
| Fine Positioning Accuracy | 0.01 mm (X/Y), 0.006° (rotation) |
| Wafer Chuck Diameter | 200 mm (standard), optional 100 mm |
| Vacuum Hold-Down Pressure | < 75 mbar |
| Power Supply | 100–220 V AC, 60 W |
| Dimensions (W×D×H) | 430 mm × 700 mm × 550 mm |
| Weight | ~16 kg |
| Brand | Laurell |
|---|---|
| Origin | USA |
| Model | WS-650Mz-23N |
| Maximum Speed | 12,000 rpm |
| Acceleration | 0–12,000 rpm/sec |
| Speed Accuracy | ≤ ±1 rpm (NIST-traceable) |
| Speed Stability | < ±1% |
| Time Resolution | 0.1 sec (1–5999.9 sec/step) |
| Chuck Compatibility | Ø10–150 mm wafers or 125×125 mm square substrates |
| Chamber Diameter | 9.5 in (241 mm) |
| Controller | PLC-based with SPIN3000 software integration |
| Construction Material | NPP (Natural Polypropylene) |
| Programmability | 20 stored recipes, up to 51 steps per recipe |
| Vacuum System | Oil-free pump, 220–240 VAC, 50/60 Hz |
| Leveling | Included NIST-calibrated digital level |
Show next
