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| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Models | SCS112 / SCSe124 / SCSe126 |
| Cleaning Method | Wet Chemical & DI Water-Based Cleaning |
| Equipment Type | Single-Wafer Manual Processing Station |
| Maximum Substrate Diameter | 8 in (SCS112) or 10 in (SCSe124/SCSe126) |
| System Dimensions (W×D×H) | 26 in × 21 in × 40 in |
| Spindle Speed | Up to 2500 rpm |
| Control Architecture | Microprocessor-Based with Touchscreen GUI (SCSe124/SCSe126) or Keypad Interface (SCS112) |
| Preset Recipes | 3 (SCS112) or 10 (SCSe124/SCSe126) |
| Mechanical Arms | 1 (SCS112), 2 (SCSe124), or 4 (SCSe126) |
| Chamber Material | Chemically Resistant Polypropylene |
| Exhaust Configuration | Radial Laminar Flow Chamber (SCSe124/SCSe126) |
| Drying Options | High-velocity N₂ purge, IR heating lamp, or heated DI water rinse |
| Safety Features | Interlocked lid, positive-pressure chamber cover, emergency stop circuitry |
| Power Supply | 220 VAC, 10 A, 50/60 Hz |
| Brand | Filmetrics |
|---|---|
| Origin | USA |
| Model | R50 |
| Measurement Principle | Contact Four-Point Probe (4PP) & Non-Contact Eddy Current (EC) |
| Max Sample Diameter | 300 mm |
| Max Mapping Area | 200 mm × 200 mm |
| XY Stage Travel Options | 100 mm × 100 mm or 200 mm × 200 mm (R50-200) |
| Z-Travel | 100 mm |
| Tilt Stage Range | ±5° |
| Mapping Speed | Up to 1 point/sec |
| Software | RsMapper™ with Pattern Generator, GLP-Compliant Data Logging |
| Brand | BEIJING EAST STAR LABS |
|---|---|
| Origin | Beijing, China |
| Model | RTP800V |
| Instrument Type | High-Vacuum Rapid Annealing Furnace |
| Sample Size | 200 mm (8-inch) wafers |
| Temperature Range | 150–1300 °C |
| Maximum Ramp Rate | 1–200 °C/s |
| Cooling Rate | ≥80 °C/s |
| Vacuum Level | ≤5×10⁻⁵ Pa (standard configuration) |
| Control Architecture | Multi-zone adaptive thermal regulation with non-PID real-time feedback |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | MR200 |
| Price Range | USD 13,500 – 40,500 (FOB) |
| Maximum Scribing Length | 200 mm |
| Scribing Force Range | 10 g – 130 g |
| Diamond Blade Contact Width | 5 µm – 10 µm |
| Zoom Microscope Magnification | 8× – 40× (continuous, stepless) |
| Optical Resolution at 10× | < 10 µm |
| X/Y Manual Stage Travel | 200 mm × 200 mm |
| Fine Positioning Accuracy | 0.01 mm (X/Y), 0.006° (rotation) |
| Wafer Chuck Diameter | 200 mm (standard), optional 100 mm |
| Vacuum Hold-Down Pressure | < 75 mbar |
| Power Supply | 100–220 V AC, 60 W |
| Dimensions (W×D×H) | 430 mm × 700 mm × 550 mm |
| Weight | ~16 kg |
| Brand | Laurell |
|---|---|
| Origin | USA |
| Model | WS-650Mz-23N |
| Maximum Speed | 12,000 rpm |
| Acceleration | 0–12,000 rpm/sec |
| Speed Accuracy | ≤ ±1 rpm (NIST-traceable) |
| Speed Stability | < ±1% |
| Time Resolution | 0.1 sec (1–5999.9 sec/step) |
| Chuck Compatibility | Ø10–150 mm wafers or 125×125 mm square substrates |
| Chamber Diameter | 9.5 in (241 mm) |
| Controller | PLC-based with SPIN3000 software integration |
| Construction Material | NPP (Natural Polypropylene) |
| Programmability | 20 stored recipes, up to 51 steps per recipe |
| Vacuum System | Oil-free pump, 220–240 VAC, 50/60 Hz |
| Leveling | Included NIST-calibrated digital level |
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