Empowering Scientific Discovery

Nanjing Qinsi Technology Co., Ltd.

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BrandSafematic
OriginSwitzerland
ModelCCU-010 HV_CT
Vacuum Level<5×10⁻⁷ mbar (base pressure)
Evaporation SourceAutomatic carbon fiber feed system
Thickness MonitoringDual-position quartz crystal microbalance (QCM)
Pumping SystemIntegrated oil-free turbomolecular + diaphragm pump
Plasma OptionsGD-010 glow discharge, ET-010 plasma etching
Control InterfaceTFT touchscreen with programmable recipes
Software OptionsCoating-LAB PC software, RC-010 glovebox remote control
Sample StageØ ≥60 mm, height-adjustable & tilt-capable, compatible with rotary, planetary, and slide holders
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BrandSafematic
OriginSwitzerland
ModelCCU-010 LV_SP
Vacuum TypeLow-Vacuum Magnetron Sputtering System
Coating ModesIon Sputtering (Au, Pt, Pd, Cr, Ir, etc.) and Optional Plasma Etching
Base Pressure≤5 × 10⁻² mbar (with dual-stage rotary vane pump)
Pumping Speed<90 s to operational vacuum (≤1 × 10⁻¹ mbar)
Sputtering Target Diameter50 mm
Film Thickness MonitoringDual-position quartz crystal microbalance (QCM) with real-time thickness readout
CoolingActive water-cooled sputter head
Plasma Etching ModuleET-010 (Ar, O₂, air configurable)
Control InterfaceTFT touchscreen + optional RC-010 Windows-based remote software
ComplianceCE, RoHS, ISO 9001-manufactured
Sample StageØ ≥60 mm, height-adjustable & tilt-capable
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