Empowering Scientific Discovery

Nanjing Qinsi Technology Co., Ltd.

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BrandSafematic
OriginSwitzerland
ModelCCU-010 LV
Instrument TypeBenchtop Coating System
Secondary Electron Image Resolution3–8 nm
Maximum Magnification<100,000×
Accelerating Voltage0.5–30 kV
Sample Stage≥60 mm diameter, height-adjustable, tilt-capable, optional planetary or rotation stage
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BrandTousimis
OriginUSA
ModelCleanroom Series (Autosamdri-931 / -934 / -936 / -938 variants)
Pressure Range0–2000 psi
Temperature Range−30°C to +60°C
Chamber Volumes25 mL, 100 mL, 186 mL, 326 mL, 679 mL, or 1162 mL (model-dependent)
Filtration0.08 µm internal CO₂ filter (≥99.999% particle retention)
Control InterfaceVGA LCD touchscreen with Stasis™ software
ComplianceDesigned for ISO Class 1–5 cleanroom environments
Sample CapacityUp to 5 wafers or dies per run (1″ to 8″ diameter or 10 mm square)
Key TechnologySOTER™ condenser for ethanol/CO₂ phase separation
Regulatory ContextSupports GLP-compliant documentation workflows
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BrandTRAD (Tests & Radiations)
OriginFrance
ModelRayXpert 2.0
Core EngineGeant4 v11.2-based Monte Carlo simulation platform
Particle Supportγ, β⁻/β⁺, e⁻/e⁺, n, p, d, t, α, ³He, heavy ions
Source TypesPoint, surface, volume, spectrum (user-defined or library-based), complex energy spectra
GeometryNative 3D CAD modeling + STEP import (ISO 10303-21)
Material DefinitionCustom elemental composition, density, mixture, isotopic enrichment
Output MetricsDose rate (Gy/h), absorbed dose (Gy), equivalent dose (Sv), fluence, particle tracks, path-integrated dose
Analysis ToolsIsodose contours, cross-sectional dose profiles, detector response simulation, multi-source/spectrum superposition, variance-reduced convergence monitoring (FOM)
Compliance FrameworkSupports GLP-aligned audit trails, input/output logging, parameter versioning
AutomationPython API, CLI mode, JSON export for materials/sources, scriptable input generation
LicensingModular (SILVER/GOLD/PLATINUM), floating network license available
OSWindows 10/11 (64-bit)
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OriginCanada
Manufacturer TypeAuthorized Distributor
Import StatusImported
ModelInfinityCCD & DT2000
PricingAvailable Upon Request
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BrandPIE
OriginUSA
ModelEM-KLEEN
RF Frequency13.56 MHz
RF Power75 W
ControlFully Automated
Gas ConfigurationSingle- or Triple-Gas Mixing System (O₂, H₂, Ar, N₂, CF₄, NF₃, NH₃, HF, H₂S)
Plasma TypeRemote Inductively Coupled Plasma (ICP), Non-Microwave, Non-Underfill, Non-Wafer-Specific
Chamber CompatibilityDirect integration with SEM, FIB-SEM, TEM, XPS, ALD, CD-SEM, EBR, EBI, EUVL, and other UHV/XHV systems
Sample & Chamber CleaningSimultaneous in-situ cleaning of both specimen surface and vacuum chamber interior
Plasma Intensity MonitoringIntegrated real-time plasma emission sensor
Flow ControlPressure-feedback-based automated mass flow control (no manual needle valve)
User InterfaceCapacitive touchscreen with 60 programmable cleaning protocols
Safety ModesDual-mode operation (Smart Safety Mode + Expert Control Mode)
SchedulingSmartSchedule™ logic triggered by chamber venting cycles, sample load count, or time-based intervals
Electromagnetic CompatibilityLow-EMI architecture
Optional UpgradesSapphire plasma tube assembly
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BrandTansi
ModelACCUR1000 & ACCUR2000
OriginJiangsu, China
Drive TypeStepper Motor with Precision Lead Screw & Preloaded Anti-backlash Nut
Guidance SystemCrossed Roller Bearings
Platform MaterialCold-rolled Aluminum Alloy
Travel Range (X/Y)Up to 100 mm × 100 mm (ACCUR1000), 200 mm × 200 mm (ACCUR2000)
Positioning Repeatability< ±1 µm
Minimum Step Size (X/Y)≤ 0.1 µm (64-step microstepping)
Z-axis Focus Drive (Optional)Stepper Motor Coupled to Microscope Coarse/Fine Focus Knob, Minimum Step ≤ 0.02 µm
Control InterfaceRS-232 Serial Communication
Power InputAC 220 V, 50–60 Hz, 30 VA
Dimensions (W×H×D)300 × 120 × 230 mm
Weight2.8 kg
Software InterfaceTWAIN & DirectShow Compatible
SDK AvailableC/C++ DLL Library for Custom Integration
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BrandLUXOR (Aptco Technologies)
OriginBelgium
ModelLUXOR Pt
Target MaterialPlatinum (99.999% purity, 30 mm diameter × 100 µm thickness)
Operating AtmosphereArgon only
Sample CapacityUp to 7 × 12.5 mm or 3 × 25 mm pin-mount samples
DesignInverted chamber with integrated sample stage
Automation LevelFully automated via capacitive touchscreen interface
SafetyFully enclosed high-voltage circuitry
ComplianceDesigned for GLP-compliant SEM sample preparation workflows
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BrandTansi
OriginJiangsu, China
Manufacturer TypeAuthorized Distributor
Product CategoryDomestic
ModelACCUR2000
Price RangeUSD 1,150 – 2,160 (FOB)
Product TypeMotorized Translation Stage
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BrandCactuX
OriginCzech Republic
ModelThermal BOX
Temperature Range–30 °C to +60 °C
Accuracy±1 °C
Sample ChamberØ65 × 35 mm (customizable)
Dimensions (stage only)200 × 200 × 405 mm
Weight (stage only)4.25 kg
Power Supply230 V AC
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BrandTansi
ModelTS3000
Microscope Configuration OptionsTS3000M (Upright Metallurgical Microscope) or TS3000S (Stereo Microscope)
Imaging ModeSimultaneous Brightfield & Polarized Light Acquisition
Automated StageHigh-Precision ACCUR Motorized XY Platform
Focus ControlMotorized Z-Axis (TS3000M only)
Camera InterfaceUSB 3.0 High-Resolution Digital Camera
SoftwareIntegrated Cleanliness Analysis Suite with ASTM/ISO/VDI/VDA-Compliant Reporting Engine
Report OutputTemplate-Based PDF + Database-Backed Audit Trail
Compliance SupportVDA 19.1, ISO 16232, ASTM F3257, USP <788>, GLP/GMP-Ready Data Integrity Features
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BrandDeltaPix
OriginDenmark
ModelInvenio 20ExIV (Color) / Invenio 20EMxIV (Monochrome)
Sensor1.1" Sony CMOS
Resolution20 MP
Frame Rate17 FPS (full resolution), up to 64 FPS (binned/subsampled)
InterfaceUSB 3.0
Shutter TypeGlobal Shutter
Key FeatureSynchronous Delta Motion (SDM) timing control
ComplianceCE, RoHS, FCC Class B
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BrandPIE Scientific
OriginUSA
ModelSEMI-KLEEN
RF Frequency13.56 MHz
RF Power Output0–100 W (continuously adjustable)
Max Input Power200 W
Vacuum InterfaceKF40 (NW40) flange
Ignition Pressure<0.1 mTorr
Operating Pressure Range<0.1 mTorr to >1.0 Torr
Leak Rate<0.005 sccm
GasAmbient air (no external gas supply required)
ControlMicroprocessor-based touchscreen interface with programmable cleaning protocols
Plasma MonitoringIntegrated real-time plasma intensity sensor
Automatic RF MatchingYes
Particle FiltrationDual-stage proprietary particulate filter compliant with semiconductor-grade cleanliness requirements
ComplianceDesigned for GLP/GMP-adjacent vacuum system maintenance
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BrandDragonfly
OriginCanada
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelDragonfly 3D World
Detector TypeMulti-Modal Volumetric Data Input
Scanning MethodTranslation-Rotation (TR) Compatible
ResolutionSub-nanometer (data-dependent)
X-ray Energy Range10 keV – 9 MeV
Imaging Dimensions2D, 3D, and Time-Resolved 4D
Dimensional Measurement AccuracyUp to 1 nm (system-limited)
Physical FootprintSoftware-Only Deployment
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BrandSafematic
OriginSwitzerland
ModelCCU-010 HV_CT
Vacuum Level<5×10⁻⁷ mbar (base pressure)
Evaporation SourceAutomatic carbon fiber feed system
Thickness MonitoringDual-position quartz crystal microbalance (QCM)
Pumping SystemIntegrated oil-free turbomolecular + diaphragm pump
Plasma OptionsGD-010 glow discharge, ET-010 plasma etching
Control InterfaceTFT touchscreen with programmable recipes
Software OptionsCoating-LAB PC software, RC-010 glovebox remote control
Sample StageØ ≥60 mm, height-adjustable & tilt-capable, compatible with rotary, planetary, and slide holders
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BrandPIE Scientific
ModelTergeo EM
OriginUSA
RF Frequency13.56 MHz
RF Power75 W (optional 150 W)
Chamber DimensionsØ110 mm × Depth 280 mm
Chamber Volume2.6 L
Chamber MaterialHigh-Purity Fused Quartz
Gas Inlets2 standard, optional 3rd inlet
Control Interface7-inch full-color touchscreen, fully automated
Plasma TypeCapacitively Coupled RF Plasma (CCP), no microwave, no downstream-only, no wafer-specific configuration
ComplianceDesigned for GLP-compliant lab environments
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BrandDelmic
OriginNetherlands
ModelMeteor / Meteor 2.0
Integration TypeIn-chamber cryo-fluorescence light microscope (cryo-FLM) for direct mounting on cryo-FIB/SEM dual-beam systems
Vacuum CompatibilityHigh-vacuum compatible (≤1×10⁻⁶ mbar)
Optical ResolutionSubcellular (≤300 nm lateral, dependent on NA and wavelength)
Field of ViewUp to 500 µm × 400 µm (tile-scanned, stitched)
Imaging ModesWidefield fluorescence, Z-stack acquisition, multi-channel sequential imaging
Excitation SourcesLED-based, configurable wavelengths (e.g., 405 nm, 488 nm, 561 nm, 640 nm)
Emission FiltersMotorized filter wheel with bandpass filters (FWHM ≤25 nm), minimal spectral crosstalk
ObjectiveHigh-NA apochromatic cryo-objective (e.g., 0.95 NA, 20× or 40×, corrected for ice thickness)
DetectorBack-illuminated sCMOS camera (QE >95% at 550 nm, read noise <1.5 e⁻ rms)
Software PlatformODEMIS (open-source, Python-based), including ODEMIS Advanced for automated correlative workflows
ComplianceDesigned for GLP/GMP-aligned cryo-EM workflows
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BrandPIE
OriginUSA
ModelTEM Cube
Vacuum Performance≤1×10⁻⁷ Torr (with turbomolecular pump)
Chamber Dimensions9 in × 9 in × 9 in (229 mm × 229 mm × 229 mm)
Sample Holder CapacityUp to 8 TEM holders (4 per side) with universal adapters for JEOL, Hitachi, Thermo Fisher/FEI, and ZEISS systems
Plasma SourceEM-KLEEN remote RF plasma source (O₂, H₂, or ambient air compatible)
Vacuum IsolationElectromagnetically actuated valves per holder port
Pump ConfigurationSeparated turbomolecular or oil-free dry scroll vacuum station
Chamber DoorHinged tempered glass door with mechanical locking knob
Operating TemperatureSlightly above ambient (±2 °C stability)
ComplianceDesigned for GLP/GMP-aligned lab environments
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BrandKA Imaging
OriginCanada
ModelinCiTe 3D
Detector TypeHigh-Resolution CMOS-Based Direct-Conversion a-Se (BrillianSe) Sensor
Scan ModeRotation-Only (RO)
Spatial ResolutionUp to 5.6 μm (0.1 MTF at 90 cycles/mm)
X-ray Energy Range40–110 kV
Field of View32 mm × 32 mm (direct detection)
Maximum Sample DimensionsØ25 mm × 100 mm (diameter × height/length)
System Footprint1500 mm × 580 mm × 500 mm (L × W × H)
Pixel Pitch8 μm
Detector Resolution4096 × 4096 (16.8 MP)
Effective DQEHigh across 40–120 keV
Phase-Contrast MechanismPropagation-Based (Grating-Free, In-Line)
Minimum Focal Spot Size2 μm
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BrandDeltaPix
OriginDenmark
ModelDPX M12000
Sensor1/1.8" Sony CMOS
XY Stage75 mm × 125 mm
Frame Rate45–70 fps
Zoom Ratio12×
Magnification Range54×–9075×
3D Morphology & Extended Depth of Field (EDOF) CapabilitiesYes
Automated Stitching & XYZ ScanningYes
Max 3D Image Resolution16000 × 16000 pixels
Surface Texture AnalysisCompliant with ISO 4287 and ISO 25178-2:2012
Software PlatformDeltaPix InSight v6.x
Minimum System RequirementsIntel Core i7-12th Gen or newer, NVIDIA RTX 2060 or higher, 16 GB RAM, 120 GB free storage, Windows 10/11 64-bit, Full HD display (1920 × 1080)
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BrandKA Imaging
OriginCanada
ModelReveal 35C
ComplianceASTM F792222-17
Detector ArchitectureTriple-layer stacked scintillator design
Imaging ModesSingle-exposure spectral DR (conventional DR, low-density image, high-density image)
ConnectivityWireless (Wi-Fi 5/6), USB-C interface
Form FactorPortable, battery-operated (optional), ruggedized enclosure for field NDT use
SoftwareSpectralDR® acquisition and material-separation suite with color-coded density mapping
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BrandKA Imaging
OriginCanada
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelBrillianSe
QuotationUpon Request
Detector TypeHigh-Resolution CMOS Semiconductor Chip
Scanning MethodTranslation-Rotation (TR)
AccuracyMicron-Level
X-ray Energy RangeUp to 120 kV
Spatial ResolutionUp to 5.6 µm (0.1 MTF at 90 cycles/mm)
Dimensions269 mm × 245 mm × 117 mm (L × W × H)
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BrandTousimis
OriginUSA
ModelAUTOSAMDRI-931
Chamber Diameter Options1.25", 2.50", 3.40"
Pressure Range0–2000 psi
Temperature Range−30 °C to 60 °C
Control InterfaceFull-touchscreen programmable automation
CO₂ CompatibilityYes (with ethanol/acetone intermediate exchange)
ComplianceDesigned for SEM/TEM sample preparation per ASTM E2027, ISO 16700, and GLP-aligned workflows
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BrandLUXOR (Aptco Technologies, Belgium)
OriginBelgium
ModelLUXOR Au
Target MaterialGold (Au)
Coating MethodMagnetron Sputtering
Operating AtmosphereAir or Argon
Max. Magnification Compatibility50,000× (for Tungsten Filament & Desktop SEMs)
Sample CapacityUp to 7 × 12 mm stubs or 3 × 25 mm stubs
Target Diameter30 mm
Target Thickness100 µm
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BrandTousimis
OriginUSA
Model815/815B Series A
Pressure Range0–2000 psi
Temperature Range−30 °C to 60 °C
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