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| Brand | NETZSCH |
|---|---|
| Origin | Germany |
| Model | DIL 402 Expedis Classic |
| Temperature Range | RT to 1600 °C |
| Heating Rate | 0–50 °C/min |
| Temperature Accuracy | ±1 °C |
| Sample Length | 0–52 mm |
| Measurement Range | ±5000 µm |
| Resolution | 2 nm |
| Atmosphere Options | Oxidizing, Reducing, Inert, Vacuum |
| Brand | NETZSCH |
|---|---|
| Origin | Germany |
| Model | DIL 402 Expedis Supreme HT |
| Temperature Range | −180 to 2800 °C |
| Heating Rate | 0–50 K/min (up to 100 K/min with specific furnace options) |
| Temperature Accuracy | ±1 °C |
| Sample Length | 0–52 mm |
| Measurement Range | ±25,000 µm |
| Resolution | 0.1 nm |
| Atmosphere Options | Oxidizing, Reducing, Inert, Vacuum (down to 10⁻⁵ mbar) |
| Furnace Types | Graphite, Alumina, Fused Silica |
| Optional Features | c-DTA® (calibrated Differential Thermal Analysis), Identify™ Spectral Matching, Rate-Controlled Sintering (RCS) |
| Brand | Netzsch |
|---|---|
| Origin | Germany |
| Model | DIL 402 Expedis Select |
| Temperature Range | −180 °C to 2000 °C |
| Heating Rate | 0–50 K/min (up to 100 K/min with specific furnace options) |
| Temperature Accuracy | ±1 °C |
| Sample Length | 0–52 mm |
| Measurement Range | ±10,000 µm / ±25,000 µm |
| Resolution | 1 nm / 0.1 nm |
| Atmosphere Options | Oxidizing, Reducing, Inert, Vacuum |
| Force Control | Adjustable from 10 mN to 3 N (optional) |
| Brand | NETZSCH |
|---|---|
| Origin | Germany |
| Model | DIL 402 Expedis Supreme |
| Temperature Range | −180 to 2800 °C |
| Heating Rate | 0–50 K/min (up to 100 K/min with specific furnace options) |
| Temperature Accuracy | ±1 °C |
| Sample Length | 0–52 mm |
| Measurement Range | ±25,000 µm |
| Resolution | 0.1 nm |
| Atmosphere Options | Oxidizing, Reducing, Inert, Vacuum |
| Force Control | Adjustable from 10 mN to 3 N (optional) |
| Sample Types | Solid, Powder, Liquid |
| Furnace Configurations | Single or dual interchangeable furnaces |
| Patented Technologies | NanoEye displacement sensor, MultiTouch sample positioning, c-DTA® (optional), Identify spectral library (optional), Rate-Controlled Sintering (RCS, optional) |
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