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Bruker ContourX-200 Optical Profilometer

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Brand Bruker
Origin Germany
Model ContourX-200
Measurement Principle White Light Interferometry (WLI)
Camera Resolution 5 MP
XY Stage Motorized
Z-Axis Resolution Sub-nanometer
Field of View Large, Magnification-Independent
Compliance Standards ISO 25178, ISO 4287, ASME B46.1
Software Platform VisionXpress™ and Vision64
Surface Reflectivity Range 0.05% – 100%
Sensor Array 1200 × 1000 pixels
Measurement Mode Universal Scanning Interferometry (USI)

Overview

The Bruker ContourX-200 Optical Profilometer is a non-contact, high-precision 3D surface metrology system engineered for quantitative topographic characterization across research, quality assurance, and production environments. It operates on the principle of white light interferometry (WLI), a coherence-gated optical technique that enables sub-nanometer vertical resolution independent of lateral magnification. Unlike confocal or focus-variation systems, WLI delivers intrinsic phase stability, minimal measurement uncertainty, and high repeatability—critical for traceable surface analysis in regulated industries. The system integrates Bruker’s four-decade heritage in WLI innovation with a compact, vibration-resistant mechanical architecture optimized for benchtop deployment in cleanrooms, metrology labs, and manufacturing floors.

Key Features

  • Sub-nanometer Z-axis resolution with magnification-independent accuracy across all objective lenses
  • Motorized XY stage with programmable positioning and large-area stitching capability
  • 5-megapixel high-dynamic-range camera supporting 1200 × 1000 pixel measurement arrays
  • Universal Scanning Interferometry (USI) mode: auto-sensing surface texture, adaptive signal optimization, and real-time fringe contrast evaluation
  • Robust performance on surfaces with reflectivity ranging from 0.05% to 100%, including highly absorbing, transparent, or multi-layered films
  • Vibration-isolated base design compliant with ISO 10360-2 and ASTM E1316 metrological stability requirements
  • Modular optical path accommodating multiple objectives (5×–100×), polarizers, and specialized illumination configurations

Sample Compatibility & Compliance

The ContourX-200 accommodates diverse sample geometries—from flat wafers and MEMS dies to curved ophthalmic lenses, orthopedic implants, and microfluidic substrates—without requiring conductive coating or vacuum conditions. Its non-destructive, ambient-environment operation supports routine inspection of delicate, temperature-sensitive, or electrically active devices. The system complies with international surface texture standards including ISO 25178 (areal surface texture parameters), ISO 4287 (profile-based roughness), and ASME B46.1 (surface finish nomenclature). Measurement data integrity is maintained through audit-trail-enabled software workflows aligned with GLP/GMP documentation practices and FDA 21 CFR Part 11 electronic record requirements.

Software & Data Management

VisionXpress™ provides an intuitive, workflow-driven interface for rapid setup, acquisition, and pass/fail reporting—ideal for production floor operators. Vision64 serves as the advanced analysis engine, delivering over 1,000 customizable parameters, ISO-compliant filtering (Gaussian, S-filter, R-profile), and automated feature recognition for step height, curvature, volume, and wear depth quantification. Both platforms support scripting (Python API), batch processing, report templating (PDF/Excel), and secure database integration via SQL or OPC UA. All raw interferograms and processed results are stored with full metadata—including environmental logs, calibration history, and user authentication—ensuring full traceability per ISO/IEC 17025 accreditation guidelines.

Applications

  • Semiconductor Manufacturing: CMP planarity verification, bump height and coplanarity assessment, trench depth profiling, and post-etch critical dimension metrology on 200 mm and 300 mm wafers
  • MEMS & Opto-MEMS: Quantitative characterization of released structures, thin-film stress-induced deformation, and optical cavity uniformity without contact-induced damage
  • Medical Devices: Surface finish validation of titanium orthopedic implants, roughness mapping of intraocular lenses, and wear track analysis of articulating joint surfaces
  • Precision Optics: Areal roughness (Sq, Sa) and form error evaluation of aspheres, freeforms, diffraction gratings, and micro-lens arrays—traceable to NIST SRM references
  • Tribology & Coatings: In situ monitoring of abrasive wear, lubricant film thickness, and corrosion pit morphology on bearing races, turbine blades, and coated substrates

FAQ

What measurement principle does the ContourX-200 use?

White Light Interferometry (WLI), a coherence-based optical method providing sub-nanometer vertical resolution and inherent immunity to chromatic aberration.
Can it measure transparent or low-reflectivity surfaces?

Yes—the system achieves stable fringe contrast and reliable phase extraction on surfaces with reflectivity from 0.05% to 100%, including silicon nitride films, polymer coatings, and fused silica optics.
Is the software compliant with regulatory documentation requirements?

Vision64 and VisionXpress™ support 21 CFR Part 11-compliant electronic signatures, audit trails, and role-based access control for GxP environments.
How does it handle large-area measurements?

The motorized XY stage enables automated tile-based stitching with sub-pixel registration accuracy, supporting seamless mosaics up to 100 mm × 100 mm without loss of Z-resolution.
Does it require external vibration isolation?

No—the integrated passive damping platform meets ISO 20486 Class 2 stability criteria; additional isolation is optional for ultra-high-resolution applications.

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