Refurbished D-180 / D-125 Metalorganic Chemical Vapor Deposition (MOCVD) System
| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Models | D-180, D-125 |
| Pricing | Available Upon Request |
Overview
The refurbished D-180 and D-125 Metalorganic Chemical Vapor Deposition (MOCVD) systems are turnkey thin-film growth platforms engineered for research and pilot-scale epitaxial fabrication of III–V compound semiconductors. These systems operate on the fundamental principle of thermal decomposition of metalorganic precursors and hydride gases in a controlled ultra-high-purity reactor environment, enabling precise stoichiometric control over layer composition, thickness, and doping profiles. Designed for reproducible growth of GaAs, InP, AlGaAs, InGaAs, GaN, and related heterostructures, the platform supports single-wafer processing with integrated process monitoring, modular gas delivery architecture, and hardware-level compliance readiness for semiconductor cleanroom integration.
Key Features
- Comprehensively refurbished subsystems: New Windows-based control software, updated PLC-based control hardware, dual dry process pumps (EBARA A30), dry loadlock pump, and fully rebuilt graphite heater assembly with enhanced thermal uniformity.
- Single-zone graphite heater with Eurotherm temperature controller and Sekidenko single-point pyrometric feedback—capable of stable operation up to 900 °C with ±1 °C setpoint accuracy under steady-state conditions.
- Dedicated multi-source precursor manifold: Six independent Group III metalorganics (2× TMGa, 2× TMIn, 2× TMAl), four Group V hydride lines (2× AsH₃, 2× PH₃), and dual dopant streams (CP₂Mg, DEZn) plus two H₂/SiH₄ lines for n-type modulation.
- Integrated loadlock chamber featuring HEPA-filtered loading area, enabling rapid wafer transfer while maintaining base pressure <1×10⁻⁶ Torr in the main reaction chamber.
- Real-time concentration monitoring via Piezocon single-channel TMIn monitor (expandable to four channels), coupled with CM4 four-point toxic gas detection system (optional integration) for AsH₃, PH₃, and SiH₄ leak surveillance.
- Exhaust treatment system including particle filter housing, phosphorus trap, and optionally automated P-trap regeneration—designed to meet SEMI S2-0216 and local industrial hygiene requirements.
Sample Compatibility & Compliance
The system accommodates three 2-inch (50.8 mm) wafers per run, compatible with standard silicon, GaAs, InP, and sapphire substrates. All wetted materials—including stainless-steel gas lines, VCR fittings, and quartz reactor components—conform to ASTM F519 and SEMI F17 standards for semiconductor process equipment. The refurbished control architecture supports audit-ready data logging, user-access levels, and electronic signature capability—aligning with GLP/GMP documentation practices and preparatory for FDA 21 CFR Part 11 compliance when deployed with validated software configuration and procedural SOPs.
Software & Data Management
The Windows-based control software provides full recipe-driven automation, real-time parameter visualization (temperature, pressure, mass flow, pyrometer signal), and timestamped event logging. Process data is stored in structured binary format with optional CSV export. Software architecture supports OPC UA connectivity for integration into factory MES or SCADA environments. Audit trails record operator login/logout, recipe modification history, alarm acknowledgments, and manual override events—enabling traceability required under ISO 9001:2015 Clause 8.5.2 and IATF 16949 process control provisions.
Applications
- Growth of high-electron-mobility transistor (HEMT) buffer and channel layers (e.g., AlGaN/GaN, InAlAs/InGaAs).
- Epitaxial development of red/infrared LEDs and laser diodes (AlGaInP, AlGaAs).
- Fabrication of photovoltaic tandem cell subcells (GaInP, GaAs, Ge).
- Research on quantum well, superlattice, and nanowire heterostructures requiring atomic-layer precision and low carbon/oxygen contamination.
- Process qualification and material screening for compound semiconductor foundry qualification protocols (e.g., JEDEC JESD22-A108, JEITA ED-4701).
FAQ
What wafer sizes does the D-180/D-125 support?
The system is configured for three 2-inch (50.8 mm) wafers per run. Custom retrofit kits for 3-inch or 4-inch compatibility are available upon engineering review.
Is the refurbished system qualified for Class 100 cleanroom operation?
Yes—the loadlock HEPA filtration, sealed gas manifold, and particle-filtered exhaust meet ISO Class 5 (Class 100) particulate requirements when installed with certified cleanroom HVAC and proper grounding protocols.
Can the Piezocon concentration monitor be upgraded post-installation?
Yes—the single-channel Piezocon unit is field-upgradeable to four-channel configuration via hardware expansion module and software license activation.
Does the system include calibration certificates for critical sensors?
All refurbished units ship with NIST-traceable calibration reports for pyrometer, pressure transducers, and mass flow controllers—valid for 12 months from commissioning date.
What level of technical support is provided after installation?
Standard offering includes 12 months of remote diagnostics, firmware updates, and application engineering consultation; extended on-site service contracts are available globally through authorized field service partners.
