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| Brand | KELLER HCW |
|---|---|
| Origin | Germany |
| Model | CellaCast |
| Type | Online Infrared Thermometer |
| Temperature Range | 650–1700 °C |
| Measurement Principle | Two-Color (Ratio) Infrared Radiometry |
| Optical Field of View | Rectangular |
| Special Features | Clean Surface Detection (CSD), Automatic Temperature Detection (ATD), Analog & Serial Data Output, Integrated Alarm Interface, IP65 Housing (with optional air purge & water cooling) |
| Brand | Klocke Nanotechnik |
|---|---|
| Origin | Germany |
| Product Type | Contact-Mode 3D Profilometer / Surface Topography & Roughness Measuring System |
| Measurement Range (X/Y/Z) | 10–50 mm / 10–50 mm / 10–20 mm |
| Extended XY Travel | 100 × 100 mm² or 350 × 350 mm² |
| Motion Resolution | 1 nm |
| Tip Resolution | 0.5 nm |
| Probe Types | Metallic wire tip (radius < 100 nm), hook-type wire tip (radius < 100 nm), spherical tip (Ø 0.12–0.3 mm), diamond tip (for indentation) |
| Sensor Configuration | Dual-axis (horizontal & vertical) capacitive displacement sensors |
| Software Features | Automated tip calibration & approach, 2D/3D visualization, quantitative surface analysis, optional sequence generator for automated measurement routines |
| Brand | Exaddon |
|---|---|
| Origin | Switzerland |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CERES |
| Pricing | Upon Request |
| Brand | EULITHA AG |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Template |
| Pricing | Upon Request |
| Brand | Nano analytik |
|---|---|
| Origin | Germany |
| Model | AFM Series (SmartProbe Platform) |
| Instrument Type | Atomic Force Microscope |
| Vertical Position Detection Noise | 0.01 nm RMS |
| Maximum Sample Diameter | ≤10 cm |
| Scanner Range (Adeona) | 15 µm × 15 µm × 4 µm |
| Dimensions (Vacuum-Compatible Version) | 140 mm × 100 mm × 60 mm |
| Integrated Actuation & Sensing | Piezoresistive readout + bimaterial excitation on SmartProbe |
| XYZ Nanopositioning Range (Vacuum Variant) | 20 µm × 10 µm × 10 µm |
| Brand | Zoz |
|---|---|
| Origin | Germany |
| Model | Simoloyer® |
| Instrument Type | High-Energy Ball Mill |
| Sample Applicability | Hard & Brittle Materials |
| Final Particle Size | < 0.01 mm |
| Feed Particle Size | Model-Dependent |
| Batch Processing Capacity | Model-Dependent |
| Grinding Principle | Impact-Dominated Mechanical Alloying |
| Operation Environment | Inert Gas (Ar, H₂), Air, or Vacuum |
| Cooling Capability | Integrated Optional Cooling |
| Scalability | Lab-Scale to Pilot/Industrial Scale |
| Compliance Framework | Designed for GLP/GMP-Aligned R&D Environments |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | Laser MBE |
| Vacuum Class | Ultra-High Vacuum (UHV) |
| Base Pressure | ≤5×10⁻¹⁰ mbar (typical) |
| Substrate Heater | Resistive, 100–1000 °C (±0.5 °C stability) |
| Target Capacity | Up to 5 × 1-inch targets on rotating carousel |
| Laser Integration | Nd:YAG or excimer laser compatible (193–266 nm, pulse energy up to 500 mJ, repetition rate 1–10 Hz) |
| Load-Lock Capacity | 5 substrates + 2 target carousels |
| In-situ Diagnostics Ports | RHEED, OES, FTIR, QMS (CF-63/CF-100 flanges) |
| Automation Level | Fully programmable deposition sequence with real-time parameter logging and audit trail |
| Compliance | Designed for GLP/GMP-aligned lab environments |
| Brand | Novocontrol Technologies |
|---|---|
| Origin | Germany |
| Model | NEISYS |
| Frequency Range | 3 µHz – 100 MHz |
| Sampling Rate | 10⁷ points/sec |
| Impedance Range | 10⁻⁴ Ω – 1 TΩ |
| Loss Factor Accuracy | ±1×10⁻⁴ |
| Architecture | Four-Electrode, Separated Current/Voltage Signal Paths |
| Thermal Expansion Option | Yes |
| Operating Modes | Frequency-Domain (EIS, Dielectric, Conductivity, Loss Tangent) & Time-Domain (CV, LSV, SWV, CA, CP, Galvanostatic/Potentiostatic Cycling, Battery Charge/Discharge, Capacitor Charging/Discharging) |
| Compliance Support | ASTM D257, ISO 60270, IEC 60601-2-60 (for dielectric safety), GLP/GMP-ready data audit trail |
| Brand | Novocontrol Technologies |
|---|---|
| Origin | Germany |
| Manufacturer | novocontrol GmbH |
| Frequency Range | 3 µHz – 40 MHz (up to 3 GHz with Keysight E4991B Impedance Analyzer) |
| Temperature Range | −160 °C to +1600 °C |
| Impedance Range | 10 mΩ to 100 TΩ |
| Measurement Voltage | 10⁻⁶ V to 3 V RMS |
| DC Bias Voltage | ±40 V |
| Software | Novocontrol WinDETA v5.x with real-time multi-parameter acquisition (≥30 parameters) |
| Compliance | Fully compatible with ASTM D150, ISO 257-1/2, IEC 60250, and supports GLP/GMP audit trails per FDA 21 CFR Part 11 |
| Brand | LAwave |
|---|---|
| Origin | Germany |
| Model | LAwave |
| Type | Laser-based Surface Acoustic Wave (SAW) Dispersion Analyzer |
| Application | Thin-film elastic property characterization |
| Compliance | Designed for ISO/IEC 17025-aligned laboratories, compatible with GLP/GMP data integrity workflows |
| Brand | Klocke Nanotechnik |
|---|---|
| Origin | Germany |
| Type | Precision Piezo-Based Nanopositioning Platform |
| Model | Klocke Nano Positioning |
| Compliance | Designed for UHV, Cryogenic, and High-Magnetic-Field Environments |
| Max Load Capacity | 2 kg |
| Travel Range | 5–70 mm |
| Velocity | < 2 mm/s |
| Open-Loop Motion Resolution | 2 nm |
| Sensor Resolution (Closed-Loop) | < 10 nm |
| Degrees of Freedom | XYZ linear, Θ/Φ rotation, XY/Z scanning, hybrid coarse/fine modes |
| Customization | Fully configurable mechanical design, material options (Invar, titanium, ceramics), vacuum-compatible variants, integrated metrology interfaces |
| Brand | Nano analytik |
|---|---|
| Origin | Germany |
| Model | SPL |
| Instrument Type | Atomic Force Microscope-based Scanning Probe Lithography System |
| Positioning Detection Noise | 0.01 nm (X, Y, Z) |
| Maximum Sample Diameter | 150 mm (6 in) |
| Stage Travel Range | 18 mm × 18 mm (expandable to 150 mm × 150 mm) |
| Minimum Feature Size | 5 nm (verified) |
| Direct-Write Speed | 300 µm/s |
| Overlay Accuracy | < 7 nm |
| Stitching Accuracy | < 10 nm |
| Maximum Writing Area per Field | 200 µm × 200 µm |
| Footprint | 80 cm × 100 cm × 190 cm |
| AFM Imaging Range | 10 µm × 10 µm × 5 µm (expandable to 200 µm × 200 µm) |
| Vertical RMS Noise | 0.01 nm |
| Closed-Loop Scan Linearity | 99.7% |
| Real-Time FPGA Feedback Bandwidth | 8 MHz |
| Data Acquisition Resolution | 16-bit (amplitude/phase) |
| Output Formats | BMP, PNG, JPG, TXT |
| Brand | Klocke Nanotechnik |
|---|---|
| Origin | Germany |
| Model | Micro Production |
| Type | Precision Nanomanipulation & 3D Coordinate Metrology Platform |
| Application Domain | Semiconductor Process Development, In-situ SEM/TEM Nanomanipulation, MEMS/NEMS Characterization, Nanofabrication Integration |
| Compliance | Designed for ISO 14644-1 Class 5 cleanroom environments |
| Positioning Resolution | Sub-nanometer (≤1 nm) in X/Y/Z |
| Force Sensing Capability | Integrated piezoresistive microforce feedback (mN range) |
| Vacuum Compatibility | Fully compatible with high-vacuum SEM/TEM chambers (10⁻⁷ mbar and below) |
| Interface | Standardized flange mounts (CF, KF, or custom) for JEOL, Zeiss, Thermo Fisher (FEI), Hitachi, TESCAN, and Raith systems |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | PLD-Workstation |
| Excimer Laser | Coherent COMPexPro 201F or 205F (248 nm) |
| Laser Gas | 20 L premixed KrF gas + 10 L He |
| Process Gases | 2× Mass Flow Controllers (MFC) |
| Substrate Heater | 2" up to 850 °C or 1"/3" up to 1000 °C |
| Substrate Rotation | 0–50 RPM |
| Target Carousel | 4×2" targets, rotation 0–50 RPM |
| Vacuum Chamber | Modular flanged design with multiple CF/NW ports |
| Control System | PC-based LabVIEW software with integrated TFT display |
| Dimensions | ~2200 × 850 × 1600 mm |
| Power Supply | 3×400 VAC/50 Hz or 3×208 VAC/60 Hz |
| Cooling | Integrated chiller unit |
| Compliance | CE-marked, Class 1 laser enclosure per IEC 60825-1 |
| Brand | Mecwins |
|---|---|
| Origin | Spain |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | SCALA |
| Pricing | Available Upon Request |
| Brand | KELLER HCW |
|---|---|
| Origin | Germany |
| Type | Portable Optical Pyrometer |
| Model | PV11 |
| Temperature Range | 700–3500 °C |
| Minimum Spot Size | 0.1 mm |
| Distance-to-Spot Ratio | up to 5000:1 (e.g., Ø1 mm target at 5 m) |
| Measurement Principle | Visual Intensity Comparison (Two-Color Reference Filament Method) |
| Emissivity Sensitivity | Low |
| Display | Integrated Digital Readout |
| Brand | KELLER |
|---|---|
| Origin | Germany |
| Model | HCW Series |
| Measurement Principle | Two-Color (Ratio) and Single-Wavelength Pyrometry |
| Temperature Range | –30 °C to 3500 °C (model-dependent, segmented calibration) |
| Optical Resolution (Distance-to-Spot Ratio) | Up to 300:1 |
| Spectral Response | 0.8–1.1 µm (short-wave), 1.6 µm, 2.2 µm, or 8–14 µm (depending on model) |
| Output Signals | 4–20 mA, 0–10 V, thermocouple emulation, RS232/RS422/RS485 |
| Environmental Rating | IP65 (standard), optional IP67/IP69K housings |
| Housing Material | Anodized aluminum or AISI 316 stainless steel |
| Compliance | CE, RoHS, EMC Directive 2014/30/EU, IEC 61326-1 (industrial environments) |
| Brand | Alpha Plasma |
|---|---|
| Origin | Germany |
| Model | Q150 |
| Instrument Type | Imported Microwave Plasma Surface Treater |
| Category | Plasma-Based Sample Preparation Equipment |
| Distribution Status | Authorized Distributor (Non-Manufacturer) |
| Import Classification | Imported Equipment |
| Pricing | Available Upon Request |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Type | Imported Chemical Reagent |
| Product Line | AR-N (Negative Tone), AR-P (Positive Tone), CAR (Chemical Amplified Resist), E-Beam Resists |
| Compliance | ISO 9001-certified manufacturing, compatible with standard cleanroom protocols (Class 100/ISO 5) |
| Packaging Options | 30 mL, 100 mL, 250 mL, 1 L, 2.5 L |
| Storage | Light-sensitive, refrigerated (2–8 °C), nitrogen-purged sealed containers |
| Brand | KELLER MSR |
|---|---|
| Origin | Germany |
| Type | Online Infrared Pyrometer |
| Model | PA Series |
| Optical Configurations | 4 Interchangeable Lenses |
| Target Spot Size | Down to 0.3 mm |
| Distance-to-Spot Ratio | Adjustable via Lens Selection |
| Analog Outputs | 2 (configurable as input/output) |
| Input/Output Flexibility | One analog channel可 configured as process input (e.g., furnace reference compensation) |
| Emissivity Compensation | Adjustable + Custom Correction Curve |
| Environmental Compensation | Transmission loss correction for protective windows, ambient radiation compensation |
| Targeting Options | Eyepiece viewfinder, Class 2 laser pointer, external video camera interface |
| Interface | USB, RS-485 (multi-drop network capable) |
| Display & Control | Integrated LED display + membrane keypad |
| Signal Processing | Adjustable smoothing, linearization, hold functions |
| Brand | Mecwins |
|---|---|
| Origin | Spain |
| Model | AVAC |
| Detection Principle | Plasmonic Nanoparticle Scattering Spectroscopy |
| Sensitivity | 3 fM LoD (miRNA-122) |
| Throughput | 96-well plate in 5 min |
| Max Image Acquisition Rate | 20,000 images/hour |
| Multiplex Capacity | Up to 5 analytes per sample |
| Counting Range | 10²–10⁶ molecules/field |
| Spatial Resolution | 0.7 µm (diffraction-limited) |
| Substrate | Functionalized polymer matrix (silicon-free) |
| Automation Level | Fully automated loading, imaging, and ejection |
| Sample Types | Serum, plasma, CSF, urine, and other biological fluids |
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