KRI (Kaufman & Robinson, Inc.)
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| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | KDC Series (KDC-10, KDC-40, KDC-75, KDC-100, KDC-160) |
| Beam Current | >10–650 mA |
| Acceleration Voltage | 100–1200 V |
| Grid Diameter | 1–16 cm Φ |
| Operating Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Typical Chamber Pressure | < 0.5 mTorr |
| Beam Modes | Focused, Parallel, Divergent |
| Gas Flow Rate | 1–30 sccm |
| Dimensions (L × D) | 11.5–25.2 cm × 4–23.2 cm |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | KDC Series (KDC-10, KDC-40, KDC-75, KDC-100, KDC-160) |
| Beam Current | >10–650 mA |
| Beam Energy | 100–1200 V |
| Grid Diameter | 1–16 cm Φ |
| Operating Pressure | < 0.5 mTorr |
| Compatible Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Gas Flow Rate | 1–30 sccm |
| Length | 11.5–25.2 cm |
| Diameter | 4–23.2 cm |
| Neutralizer | Thermionic Filament Type |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | EH1020F |
| Type | End-Hall Ion Source (Ungridded Hall-Effect Ion Source) |
| Beam Current Range | 0.1–2.5 A (adjustable) |
| Operating Voltage | 50–150 V (DC) |
| Gas Compatibility | Ar, O₂, N₂, Xe, or mixed gases |
| Typical Anode Power | 50–300 W |
| Cooling | Conduction-cooled (water-cooling optional) |
| Flange Interface | CF-63 or CF-100 (customizable) |
| Lifetime | >10,000 hours (under nominal operating conditions) |
| Compliance | CE-marked, RoHS-compliant, compatible with UHV and HV vacuum systems (≤1×10⁻⁷ mbar base pressure) |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | KDC Series (KDC-10, KDC-40, KDC-75, KDC-100, KDC-160) |
| Ion Extraction Aperture Diameter | 1 cm to 16 cm |
| Beam Voltage (Vb) | Up to 1000 V DC |
| Beam Current (Ib) | Up to 84 mA |
| Acceleration Voltage (Va) | −200 V DC |
| Operating Gas | Argon (Ar) |
| Confinement | DC Magnetic Confinement |
| Cathode | Thermionic Filament |
| Anode Voltage | 0–100 V DC |
| Grid Type | Dedicated Self-Aligning Grid |
| Compliance | Designed for integration into IBF systems compliant with ISO 10110-7 (optical surface form), SEMI F26 (silicon wafer processing), and GLP-aligned vacuum process environments |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | RFICP 140 |
| Anode RF Power | 1 kW @ 1.8 MHz |
| Max. Beam Current | >500 mA |
| Acceleration Voltage Range | 100–1200 V |
| Ion Energy Range | 100–1200 eV |
| Beam Aperture Diameter | 14 cm |
| Grid Material | Molybdenum or Graphite |
| Gas Compatibility | Ar, O₂, N₂, and other process gases |
| Gas Flow Rate | 5–40 sccm |
| Operating Pressure | < 0.5 mTorr |
| Neutralizer | LFN 2000 |
| Dimensions (H × D) | 25.1 cm × 24.6 cm |
| Flange | 12″ Conflat (CF) |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | RFICP 220 |
| Anode RF Power | 2 kW @ 2 MHz |
| Max. Beam Current | >1000 mA |
| Beam Energy Range | 100–1200 eV |
| Operating Gases | Ar, O₂, N₂, and other process gases |
| Gas Flow Rate | 5–50 sccm |
| Chamber Pressure | <0.5 mTorr |
| Grid Diameter | 22 cm |
| Grid Material | Molybdenum |
| Beam Optics | OptiBeam™ self-aligning ion optics |
| Neutralizer | LFN 2000 or MHC 1000 |
| Dimensions (H × D) | 30 cm × 41 cm |
| Flange | 10" ConFlat (CF) |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | RFICP40 |
| Ion Beam Current | Up to 1.2 A (typical, scalable by aperture and gas flow) |
| Operating Gases | Ar, O₂, N₂, Xe, or mixtures |
| RF Frequency | 13.56 MHz |
| Nominal Beam Energy Range | 50–1500 eV (adjustable via extraction voltage) |
| Extraction Aperture Diameter | 40 mm |
| Vacuum Compatibility | ≤5×10⁻⁴ Torr (base pressure), ≥1×10⁻³ Torr (operational) |
| Cooling | Water-cooled anode and cathode assembly |
| Compliance | CE-marked, RoHS-compliant, compatible with ISO 9001-certified vacuum integration workflows |