Moorfield
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| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | ANNEAL |
| Instrument Type | High-Vacuum Rapid Thermal Annealing (RTA) System |
| Sample Size | 4-inch / 6-inch wafers |
| Max Temperature | 1000 °C |
| Base Vacuum | <5×10⁻⁷ mbar |
| Temperature Uniformity | ±1 °C |
| Gas Compatibility | Ar, O₂, N₂, H₂, and custom gas mixtures |
| Heating Options | Quartz Lamp (≤600 °C), CCC Carbide (≤1000 °C, inert/reducing), SiC-coated Carbon (O₂-compatible up to 1000 °C) |
| Control Interface | Integrated touchscreen with programmable thermal profiles |
| Safety | H₂-safe dilution exhaust, interlocked chamber access, real-time pressure/temperature/failure monitoring |
| Cleanroom Compatibility | ISO Class 4 (Class 10) compliant design |
| Brand | Moorfield |
|---|---|
| Origin | UK |
| Model | MiniLab |
| Vacuum Base Pressure | 5×10⁻⁷ mbar |
| Maximum Substrate Diameter | 11 inches |
| Deposition Techniques | Thermal Evaporation, Low-Temperature Organic Evaporation, Magnetron Sputtering, Electron Beam Evaporation |
| Chamber Configurations | Front-Loading Box, Top-Hinged Bell Jar, Glovebox-Compatible Dual-Door, Tall-Aspect-Ratio Vertical |
| Compliance | ISO 9001–Certified Manufacturing, GLP-Ready Architecture, FDA 21 CFR Part 11–Compatible Software Options Available |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | nanoEM |
| Target Material | Metal |
| Target Diameter | 2 inch |
| Control System | Fully Automatic Touchscreen Interface |
| Chamber Volume | 13 L |
| Sample Stage Diameter | 3 inch |
| Sputtering Gas | Argon (Ar) |
| Base Pressure | <5×10⁻⁷ mbar |
| DC Sputtering Power Output | Up to 300 W |
| Vacuum Pump Options | Configurable |
| Optional Features | Stage Rotation & Tilt, Plasma Glow Monitoring, Quartz Crystal Thickness Monitor, Pneumatic Shutter, Viewport, Auto Pressure Control |
| Compliance | Designed for ISO Class 5 cleanroom compatibility |
| Safety | Interlocked chamber door, overpressure/overtemperature protection, real-time arc suppression |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | nanoETCH |
| RF Power Range | <30 W (milliwatt-resolution control) |
| Base Pressure | <5×10⁻⁷ mbar |
| Sample Stage Options | 3-inch & 6-inch |
| Vacuum System | Turbomolecular pump with optional backing pump |
| Gas Delivery | Mass Flow Controller (MFC)-regulated |
| Control Interface | Integrated touchscreen HMI with programmable etch recipes |
| Data Logging | PC-compatible USB/Ethernet interface |
| Safety Compliance | CE, IEC 61000-6-4, IEC 61000-6-2 |
| Brand | Moorfield |
|---|---|
| Origin | UK |
| Model | oPVD S10A, oPVD S10A-WA, oPVD T15A |
| Vacuum Base Pressure | <5×10⁻⁷ mbar |
| Substrate Size | up to 8 inches (S10A-WA), up to 4 inches (S10A & T15A) |
| Substrate Heating | up to 500 °C |
| Target Compatibility | 2-inch water-cooled magnetron sputtering targets (S10A/S10A-WA) |
| Gas Control | up to 3 MFC-controlled process gases (Ar, O₂, N₂) |
| Deposition Modes | DC/RF magnetron sputtering, reactive sputtering, co-sputtering, resistive/low-temperature organic evaporation |
| Film Uniformity | high across full substrate area |
| Cleanroom-Compatible Design | yes |
| Software | integrated touchscreen HMI with programmable recipes, audit-trail-capable control logic |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrumentation |
| Model | Moorfield Desktop Series (oCVD, oPVD, oETCH, ANNEAL, oEM, MiniLab) |
| Pricing | Available Upon Request |