SHNTI
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| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | AMT |
| Type | Desktop Active Vibration Isolation System |
| Control Architecture | Digital Adaptive Feedback + Bottom-Mounted Feedforward |
| Sensor Configuration | Triaxial Floor-Mounted + Platform-Mounted Accelerometers |
| Stability | Robust Control Algorithm with Long-Term Drift Compensation |
| Compliance | Designed for ISO 20483 Class 1–2 Laboratory Environments |
| Load Capacity | Up to 50 kg (typical for mid-size AFM, optical interferometers, nanoindenter systems) |
| Interface | Ethernet/USB, Web-Based GUI with Real-Time Monitoring |
| Brand | SHNTI |
|---|---|
| Origin | Netherlands |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Phenom G2 |
| Price Range | USD 70,000–140,000 |
| Instrument Type | Benchtop SEM |
| Electron Source | Lanthanum Hexaboride (LaB₆) |
| Secondary Electron Image Resolution | ≤5.0 nm at 10 kV |
| Magnification Range | 10×–130,000× |
| Accelerating Voltage | 5–15 kV (adjustable in 1 kV steps) |
| Backscattered Electron Image Resolution | ≤7.0 nm at 10 kV |
| Maximum Sample Dimensions | 100 mm diameter × 50 mm height |
| Expandable Chamber Interface Ports | 1 (for optional EDS or cathodoluminescence modules) |
| Stage Type | Motorized XY-stage with tilt (±90°), rotation (360°), and Z-height adjustment |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | PMT |
| Load Capacity | Up to 300 kg |
| Vibration Control Principle | Real-time active force cancellation via triaxial inertial sensing and pneumatic actuation |
| Noise Attenuation | Broadband airborne noise isolation via multilayer acoustic barrier construction |
| Magnetic Shielding | Integrated mu-metal and conductive layer shielding |
| Control Architecture | Hybrid feedforward + feedback control |
| Compliance | Designed for GLP-compliant environments |
| Software Interface | Embedded LED status display |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | CMP20 |
| Wafer Size | 2", 4", 6" |
| Platen Count | 1 |
| Platen/Head/Conditioner Speed | 0–300 rpm (continuously adjustable) |
| Polishing Head Downforce | 0–4 psi (at 4") |
| Slurry & DI Water Flow | 0–300 mL/min (per channel, peristaltic pump) |
| Stroke Range (Head/Conditioner Reciprocation) | 90 mm |
| Dimensions (L×W×H) | 800 mm × 1000 mm × 2000 mm |
| Optional Modules | Electrochemical Unit (±10 V / ±250 mA, 2-/3-electrode support, CV, etc.), UV Module (λ = 95 nm, 1020 mm × 100 mm emission area, 200 W input power) |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Surface Resistivity Probe Station |
| Operation Mode | Manual |
| Compatible Wafer Sizes | 4", 6", 8", 12" |
| Modular Expansion Support | mmWave (mmW), Failure Analysis (FA), MEMS, Wafer-Level Reliability (WLR), Optoelectronics |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | HMS |
| Optical Resolution | 240 nm (XY), 600 nm (Z) |
| Camera Sensor | 2048 × 2048 back-illuminated sCMOS |
| Spatial Dimensions | XYZλt (5D acquisition) |
| Application Scope | Cellular biology, nanobiology, clinical pathology, materials science |
| Compliance Context | Designed for GLP-compliant research environments |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Domestic |
| Model | Industrial Confocal Micro-Raman System |
| Instrument Type | Confocal Micro-Raman Spectrometer |
| Spectral Range | 224–1350 nm (18 laser lines: 224, 266, 325, 355, 375, 405, 442, 458, 473, 514, 532, 632.8, 671, 785, 808, 830, 1064, 1350, 1650 nm) |
| Spectral Resolution | < 0.1 cm⁻¹ per pixel (measured at 632.8 nm with 1800 gr/mm grating and 1000 mm focal length spectrometer) |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Product Category | Domestic |
| Model | IPS Series SiC Crystal Growth System |
| Crystal Types | Silicon Carbide (SiC) only |
| Max. Crystal Diameter | 6-inch and 8-inch |
| Typical Boule Length (Constant-Diameter Section) | 20–30 mm |
| Base Vacuum | ≤5.0 × 10⁻⁵ Pa |
| Pressure Rise Rate | ≤3 Pa / 12 h |
| Microtube Density (6″ P-type Substrate) | <0.5 cm⁻² |
| Resistivity Range (6″ P-type) | 0.015–0.028 Ω·cm |
| Cooling System | Dual-loop water cooling with real-time temperature & flow monitoring |
| Heating Method | Optimized RF induction coil architecture |
| Process Control | Fully integrated PIM self-diagnostic module + multi-stage PID thermal profiling |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | M-Series |
| Operation Type | Manual |
| Maximum Wafer Size | 150 mm (6-inch) and 100 mm (4-inch) |
| Probe Compatibility | DC to 67 GHz RF, MEMS, and Surface Resistivity Measurements |
| Target Pad Size | ≥30 µm |
| Application Scope | Academic Teaching, R&D Lab Characterization, Low-Volume IC Device Evaluation |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | IMD MPCVD Diamond Growth System |
| Crystal Material | Synthetic Diamond |
| Maximum Crystal Diameter | 2.2 inches (55.9 mm) |
| Typical Crystal Length (Constant-Diameter Zone) | 2–3 cm |
| Process Capability | High-Purity Diamond CVD Deposition, In-situ Thermal Annealing, Homoepitaxial & Heteroepitaxial Growth |
| Brand | SHNTI |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported |
| Model | SN-LDE |
| Pricing | Upon Request |
| Frame Dimensions | 5×5 mm, 7.5×7.5 mm, or 10×10 mm |
| Window Aperture | 1.0×1.0 mm to 5.0×5.0 mm (square) |
| Si₃N₄ Membrane Thickness | 50–200 nm (custom 30–500 nm, MOQ 100 pcs) |
| Frame Thickness | 200 µm, 381 µm, or 525 µm |
| Surface Roughness | <1 nm RMS |
| Max Operating Temperature | 1000 °C |
| Vacuum Rating | ≥1 atm differential pressure (dependent on membrane thickness & aperture size) |
| Chemical Stability | Inert, compatible with plasma, glow discharge, and mild chemical cleaning (no ultrasonication) |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | VIL1000 |
| Light Source | Coherent Laser (UV/Deep-UV or Visible, Configurable) |
| Minimum Achievable Line Width | <50 nm |
| Grating Period Range | 240–1500 nm |
| Maximum Exposure Field | 200 mm × 200 mm (8-inch wafer compatible) |
| Pattern Reconfigurability | Real-time, maskless, via beam steering optics |
| Positioning Accuracy | Sub-10 nm (closed-loop piezo stage) |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | YPL-NIL-SI400 |
| Temperature Range | RT to 350 °C |
| Pressure Range | 0–20 psi (on 4″ wafer) |
| Vacuum Range | 101.3 kPa to 0.1 Pa |
| UV Exposure System | Integrated |
| Sample Holder Max Diameter | 100 mm (4″) |
| Cooling | Integrated Water-Cooled System |
| Control | PLC-based with Touchscreen HMI |
| Software | Proprietary SI400 Machine Control Suite |
| Loading Method | Manual Wafer/Template Handling |
| Sealing | Bellows-Sealed Vacuum Chamber |
| Compliance | Designed for Class 100–1000 cleanroom integration |