VPI (BoYuan Micro-Nano)
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| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | ETD-100AF |
| Vacuum System | Feiyue Forepump + Compound Turbo-Molecular Pump (High Compression Ratio, Air-Cooled) |
| Base Pressure | ≤2×10⁻⁴ Pa |
| Chamber Dimensions | Ø230 mm × H280 mm |
| Evaporation Source | Molybdenum Boat / Tungsten Filament / Fixed Bracket |
| Max Evaporation Current | 100 A |
| Max Evaporation Voltage | 10 V |
| Max Power | 1000 W |
| Compatible Target Materials | C, Au, Cr, Pt, Ni, Al, Ti, Ag, and other standard evaporation metals |
| Sample Types | Biological specimens, polymers, ceramics, insulating substrates, beam-sensitive materials |
| Application Domain | SEM sample preparation, TEM grid coating, electrode fabrication, thin-film R&D, academic teaching labs |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | ETD-2000 |
| Target Material | Gold (Au), 50 mm diameter × 0.1 mm thickness |
| Control Method | Manual |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage | Ø50–70 mm, vertically adjustable |
| Sputtering Gases | Multiple inert gases (e.g., Ar, N₂, Kr) |
| Maximum DC Voltage | −1600 V |
| Ion Current Range | 0–50 mA |
| Ultimate Vacuum | ≤ 4 × 10⁻² mbar |
| Timer Range | 0–3600 s |
| Pumping System | VRD-8 rotary vane pump (2 L/s) |
| Input Power | 220 V AC, 50 Hz (110 V option available) |
| Overall Dimensions | 305 mm × 365 mm × 325 mm (W × D × H) |
| Sealing | Ceramic high-voltage feedthroughs + vacuum-grade rubber edge seal |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-2000Ⅲ |
| Target Materials | Au, Pt, Ag (Ø50 mm) |
| Control Mode | Automatic sample stage rotation synchronized with selected target |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage | Ø50–70 mm, vertically adjustable |
| Sputtering Gases | Ar, N₂, and other process gases |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-3000 |
| Target Material (Standard) | Au (50 mm × 0.1 mm thickness) |
| Optional Targets | Ag, Pt, Ir, Cu |
| Sputtering Gases | Ar, N₂, and other inert/reactive gases |
| Chamber Dimensions | Ø150 mm × 120 mm (H) |
| Sample Stage Diameter | 50 mm |
| Maximum Sputtering Voltage | –2800 V DC |
| Max Sputtering Current | 50 mA |
| Ultimate Vacuum | ≤ 4 × 10⁻² mbar |
| Timer Range | 1–360 s |
| Vacuum Pump | VRD-8 rotary vane pump (2 L/s) |
| Control Method | Manual analog interface with CPU-assisted timing and interlock logic |
| Compliance | Designed for GLP-aligned sample prep workflows in SEM labs |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-800C |
| Target Material | Carbon Fiber |
| Target Diameter | 5 mm |
| Chamber Dimensions (ID) | 170 mm × 130 mm (D × H) |
| Sample Stage Diameter | 70 mm |
| Operating Vacuum | 4 × 10⁻² mbar |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Current | 0–100 A |
| Deposition Time Range | 0–1 s |
| Vacuum Pump | 2 L/min Two-Stage Rotary Vane Pump (Feiyue VRD-8) |
| Chamber Material | Borosilicate Glass |
| Power Supply | AC, 220 V, 50 Hz |
| External Dimensions | 340 mm × 390 mm × 300 mm (W × D × H) |
| Control Mode | Manual |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900 |
| Target Materials | Au, Pt, Ag |
| Target Diameter | 50 mm |
| Control Method | Microprocessor-Based Electronic Control |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage Diameter | 50–70 mm (customizable) |
| Sputtering Gases | Ar, N₂, Air |
| Vacuum Gauge Range | 1 × 10⁻³ to 1 × 10³ mbar |
| Max DC Voltage | −1600 V |
| Max Sputtering Current | 50 mA |
| Current Stability | ±0.1 mA |
| Timer Range | 0–999 s |
| Base Pump | 2 L/s VRD-8 Rotary Vane Pump |
| Chamber Material | Borosilicate Glass |
| Power Supply | 220 V AC, 50 Hz (110 V optional) |
| Weight | ~35 kg |
| Dimensions (W×D×H) | 300 × 360 × 380 mm |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900C |
| Sputtering Target Materials | Au, Ag, Pt, Cr, Al, Cu |
| Target Dimensions | Ø50 mm × 0.12 mm |
| Sputtering Voltage Range | 0–1600 V DC |
| Sputtering Current Range | 0–50 mA |
| Sputtering Time Control | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate Glass |
| Chamber Dimensions | 160 mm × 110 mm (D × H) |
| Sample Stage Diameter Range | Ø50–70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Vacuum System | VRD-8 Rotary Vane Pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V configuration) |