Chemical Analysis Instruments
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Showing 1741–1770 of 4548 results
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | OEM Manufacturer |
| Model | CS5000 |
| Measurement Principle | Non-Dispersive Infrared (NDIR) Absorption |
| Heating System | High-Frequency Induction Furnace |
| Carbon Range | 0.00001–12.0 wt% |
| Sulfur Range | 0.00001–45.0 wt% |
| Sensitivity | 0.000001 wt% |
| Precision | ±1.0 ppm (C/S) or RSD ≤ 0.5% (C), ≤ 1.0% (S) |
| Analysis Time | 20–40 s |
| Dimensions | 650 × 790 × 920 mm (W×D×H) |
| Weight | 150 kg |
| Power Supply | AC 220 V ±10%, 50 Hz, voltage fluctuation < ±0.2% |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Domestic Product | Yes |
| Model | CS5000 |
| Measurement Principle | Infrared Absorption Spectroscopy |
| Heating System | High-Frequency Induction Furnace |
| Carbon Range | 0.00001–12 wt% |
| Sulfur Range | 0.00001–45 wt% |
| Sensitivity | 0.000001 wt% |
| Precision | ±1.0 ppm |
| Analysis Time | 20–40 s |
| Furnace Output Power | Adjustable (0–2.5 kW typical for HF induction) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | E5000 |
| Instrument Type | Benchtop |
| Excitation Source | High-Power Numerically Controlled Arc |
| Detector | CCD Array |
| Focal Length | 400 mm |
| Grating Grooves | 2400 lines/mm |
| Wavelength Range | 190 nm – 680 nm |
| Detection Mode | Full-Spectrum Simultaneous Acquisition |
| Optical Design | Paschen–Runge Mount |
| Cooling | Water-Cooled Electrodes & Arc Source |
| Safety Interlocks | Real-Time Monitoring of Cooling Water Flow, Exhaust Ventilation, and Torch Chamber Door Status |
| Software Compliance | Supports Audit Trail, User Access Control, and Method Validation per GLP/GMP Requirements |
| Data Acquisition | Overflow-Protected CCD with Dynamic Integration |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Benchtop |
| Excitation Source | High-Power Programmable DC Arc |
| Detector | Back-Illuminated CCD Array |
| Focal Length | 400 mm |
| Grating Groove Density | 2400 lines/mm |
| Wavelength Range | 190–680 nm |
| Spectral Coverage | Full-Spectrum Simultaneous Acquisition |
| Optical Design | Paschen-Runge Mount with Fixed, Thermally Stabilized Vacuum- or Purged-Optics Chamber |
| Cooling | Integrated Water-Cooled Electrode & Arc Source |
| Safety Interlocks | Real-Time Monitoring of Cooling Flow, Exhaust Ventilation, Torch Chamber Door Status, and Thermal Sensors |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Type | Portable Gas Chromatograph |
| Application Scope | General-purpose Environmental Emission Monitoring |
| Compliance Standards | HJ 1012, HJ 38, HJ 604, GB 37822–2019 |
| Detection Principle | High-Temperature Heated Sample Transfer + Flame Ionization Detection (FID) |
| Detection Limit | Sub-ppb Level for Total Hydrocarbons, Methane, and BTEX |
| Integrated Power Supply | Rechargeable Lithium Battery (≥4 h continuous operation with heated line) |
| Data Output | Raw Chromatograms & Quantitative Results Exportable in Standard Formats (e.g., .csv, .cdf) |
| Certification | China Metrology Accreditation (CPA), Compatible with CMA Reporting Requirements |
| Sample Introduction | Dual-Stage Filtered Sampling Pump + Fixed-Volume Loop Injection |
| Column Configuration | Capillary GC Column Optimized for C1–C8 Hydrocarbons |
| Detector Temperature | Up to 180 °C |
| Sample Line Temperature | Heated to 180 °C |
| Dimensions & Portability | Integrated All-in-One Chassis with Carrying Handle |
| Optional Accessories | Android Tablet Interface, High-Pressure Gas Cylinders, Metal Hydride Hydrogen Generators |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Model | EXPEC 7000 |
| Quotation | Upon Request |
| Deployment Mode | Mobile (Vehicle-Mounted) |
| Mass Range | 2–260 amu |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Category | Domestic Lab-Scale Gas Chromatograph |
| Model | GC-2000 Universal |
| Application Scope | General-Purpose Analytical Chemistry |
| Control Interface | Full-Touch Color LCD Display |
| Pneumatic Control | Electronic Pressure and Flow Control (EPC) |
| Software Architecture | Modular Workstation with Method-Driven Workflow |
| Microfluidic Capability | Valveless Flow Switching for Column Back-Flush, Detector Selection, and GC-MS Parallel Operation |
| Compliance Context | Designed for GLP/GMP-aligned laboratories |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Instrument Type | Full-Spectrum Direct-Reading ICP-OES |
| Detection Limit | Sub-ppb (µg/L) |
| Precision | RSD ≤ 0.5% |
| Wavelength Range | 165–870 nm |
| Optical Resolution | ≤ 0.007 nm @ 200 nm |
| Spectral Coverage | Simultaneous multi-element analysis across 72 elements including major metals and non-metals |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | ICP-5500 |
| Detector | High-resolution overflow-resistant CCD |
| RF Source | All-solid-state self-excited 27.12 MHz generator |
| Optical System | Precision thermostatically controlled Czerny–Turner monochromator with holographic grating |
| Gas Control | Integrated automatic argon flow management module |
| Standby Mode | iStandby (reduces Ar consumption by >50%) |
| Calibration | Real-time full-spectrum calibration using interference-free Ne emission lines |
| Sample Introduction | Multi-channel high-precision peristaltic pump with integrated nebulizer and spray chamber |
| Compliance | Designed to support ISO/IEC 17025, ASTM D1976, EPA Method 200.7, USP <232>/<233>, and GLP/GMP data integrity requirements |
| Software | FPI-SpectraSuite v4.x with 21 CFR Part 11-compliant audit trail, electronic signatures, and raw data archiving |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Domestic (China) |
| Model | LGA Series |
| Pricing | Available Upon Request |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark Discharge |
| Detector | Charge-Coupled Device (CCD) |
| Optical Configuration | Paschen-Runge Mount |
| Wavelength Range | Configurable (Typical Range: 130–800 nm) |
| Number of Simultaneous Channels | Multi-channel (CCD-based full-spectrum acquisition) |
| Argon Purge System | Sealed argon recirculation with four-way purging |
| Operating Environment | Industrial floor and laboratory settings |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, ASTM E1086, and GB/T 4336 standards |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable |
| Optical Configuration | Paschen–Runge Mount |
| Environmental Operation | Argon-purged Sealed Optical Chamber |
| Sample Interface | Open-type Spark Stand with Quadruple Argon Purge |
| Temperature Control | Thermostatically Stabilized Optics Chamber |
| Software Features | Real-time Drift Correction, Intelligent Calibration Curve Matching, Grade Identification, CE/CRE Calculation, QC Limit Enforcement, System Self-Diagnosis |
| Compliance Context | Designed for GLP-compliant metal analysis workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS-based CCD array |
| Optical Configuration | Paschen-Runge mount |
| Wavelength Range | Configurable (typically 130–800 nm) |
| Number of Simultaneous Channels | Up to 60 (software-defined) |
| Argon Purge System | Sealed argon-circulation optical chamber with four-way purge |
| Operating Environment | Industrial workshop / QC lab (IP54-rated spark stand) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS-based Multi-Channel Array |
| Optical Configuration | Paschen-Runge Mount |
| Wavelength Range | Configurable (Typically 130–800 nm) |
| Number of Simultaneous Channels | Up to 60 (Software-Defined) |
| Argon Purge System | Sealed Argon-Circulating Optical Chamber with Four-Point Purge |
| Operating Environment | Industrial Lab / Foundry Floor |
| Compliance | Designed to Support ISO/IEC 17025, ASTM E415, ASTM E1086, and GB/T 4336 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | CMOS |
| Wavelength Range | Configurable (Typical Range: 130–800 nm) |
| Number of Spectral Channels | Not Fixed (Multi-Channel CCD/CMOS Array-Based Detection) |
| Optical System | Paschen-Runge Mount |
| Purge Medium | Sealed Argon Circulation System |
| Operating Environment | Industrial Lab / Foundry Floor |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable |
| Sample Compatibility | Fe-, Al-, Cu-based alloys |
| Optical Design | Paschen-Runge mount |
| Environmental Operation | Factory-floor compatible |
| Gas Purge | Sealed argon-circulation optical chamber with quad-channel argon purge |
| Software Features | Real-time drift correction, intelligent curve selection, grade identification, CE/CRE calculation, QC limit enforcement, automated system diagnostics |
| Compliance Context | Designed for GLP-compliant metal analysis workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | CCD (Charge-Coupled Device) |
| Wavelength Range | Configurable (130–800 nm typical for spark OES) |
| Optical Configuration | Paschen-Runge mount with dual vacuum-UV/visible chambers |
| Number of Simultaneously Acquired Spectral Lines | >10,000 |
| Analytical Elements | Up to 72 metallic and non-metallic elements (e.g., C, P, S, N, Si, Mn, Cr, Ni, Cu, Al, Ti, Mo, V, Co, Nb, B, Ca, Mg, Zn, Pb, Sn, As, Bi, rare earths) |
| Calibration Flexibility | On-site matrix and element expansion without hardware modification |
| Compliance | Designed to support ISO/IEC 17025, ASTM E415, ASTM E1086, ASTM E3061, and GB/T 4336 workflows |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (130–800 nm typical for metal analysis) |
| Spectral Resolution | ≤ 10 pm (typical at 200 nm) |
| Optical System | Paschen-Runge mount with dual vacuum-UV/visible chambers |
| Number of Simultaneous Detection Pixels | > 30,000 per CCD |
| Calibration Flexibility | Multi-matrix, on-site element/basis expansion supported |
| Compliance | Designed to support ISO 17025-compliant workflows, ASTM E415, E1086, and GB/T 4336 methodologies |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (typically 130–800 nm) |
| Spectral Resolution | < 10 pm (at 200 nm) |
| Optical System | Pascchen-Runge Mount with Dual Chambers (UV + VIS) |
| Number of Simultaneous Spectral Lines | > 9,000 |
| Calibration Flexibility | Full-Spectrum Multi-Matrix Capability |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, E1086, and GB/T 4336 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | M5000 PLUS |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector Type | Scientific-grade CMOS |
| Wavelength Range | Configurable (UV–VIS, typically 130–800 nm) |
| Optical Design | Dual-chamber with dedicated UV optical path |
| UV Optimization | Uncoated high-quantum-efficiency CMOS for N, C, S, P detection |
| Stability Architecture | Cast aluminum vacuum-sealed spectrometer chamber with 4-stage stress-relief annealing and active temperature stabilization (±0.1 °C) |
| Light Source | Fully digital pulsed spark generator with real-time energy optimization (RTMC) |
| Software Capability | Full-spectrum acquisition, model-free analysis via intelligent calibration curves, remote firmware update & health monitoring |
| Compliance Framework | Designed to support GLP/GMP workflows, ASTM E415, ISO 11573, and GB/T 4336 analytical protocols |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | M5000 PLUS F |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Scientific-grade CMOS |
| Focal Length | 400 mm |
| Grating Line Density | 2400 l/mm (Visible), 3600 l/mm (UV) |
| Wavelength Range | 140–680 nm |
| Spectral Acquisition Mode | Full-Spectrum Direct Reading |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Method | Spark |
| Detector Type | Scientific-grade CMOS |
| Wavelength Range | Configurable (130–800 nm) |
| Optical System | Dual-chamber with dedicated vacuum UV optical path for N, C, S, P |
| Spectral Resolution | ≤ 10 pm at 200 nm |
| Effective Pixel Count | ≥ 4.2 MP (full-frame CMOS) |
| Analysis Speed | < 30 s per sample (including flushing, sparking, and quantification) |
| Calibration Stability | ±0.5% RSD over 8 hours (under controlled lab conditions) |
| Compliance | Meets ISO 11577:2022, ASTM E415-22, GB/T 4333.1–2022 |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Scientific-grade CMOS |
| Wavelength Coverage | Configurable (130–800 nm typical) |
| Optical Configuration | Dual-chamber (Vacuum UV + Visible/NIR) |
| UV Optimization | Dedicated uncoated UV optical path for N, C, S, P analysis |
| Spectral Resolution | ≤ 10 pm at 200 nm (typical) |
| Channel Flexibility | Full-spectrum acquisition — no fixed channels |
| Software Compliance | Supports ASTM E415, E1086, ISO 11577, and GLP/GMP audit trails per FDA 21 CFR Part 11 requirements |
| Thermal Stability | Thermostatically controlled optical chamber (±0.1 °C) |
| Mechanical Construction | Stress-relieved die-cast aluminum optical housing (4-stage annealing) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Instrument Type | Benchtop |
| Excitation Source | Spark |
| Detector | Charge-Coupled Device (CCD) |
| Wavelength Coverage | Configurable (typically 130–800 nm) |
| Spectral Resolution | ≤ 10 pm (typical at 200 nm) |
| Optical System | Paschen-Runge Mount with Dual Chambers (UV + VIS) |
| Number of Simultaneously Acquired Spectral Lines | > 9,000 |
| Calibration Flexibility | Full-spectrum recalibration without hardware modification |
| Compliance | Designed to support ISO/IEC 17025 workflows, ASTM E415, E1086, and GB/T 4336 methodologies |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | Mars-400 Plus |
| Instrument Type | Ion Trap Mass Spectrometer |
| Chromatography Type | Low Thermal Mass (LTM) GC |
| Mass Range | 15–550 amu |
| Resolution | Unit Mass Resolution |
| Detection Limit | < 1 ppb (for selected VOCs, e.g., benzene, toluene) |
| Scan Speed | 10,000 amu/s |
| Power Supply | Integrated Rechargeable Li-ion Battery |
| Carrier Gas | Built-in Helium or Hydrogen Micro-Gas Cylinder (30–60 min runtime) |
| Weight | < 19 kg |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Country of Origin | China |
| Model | Mars-400 Plus |
| Instrument Type | Ion Trap Mass Spectrometer |
| Chromatography Configuration | Low Thermal Mass (LTM) GC |
| Mass Range | 15–550 amu |
| Resolution | Unit Mass Resolution |
| Detection Limit | < 1 ppb (for selected VOCs, e.g., benzene, toluene) |
| Scan Speed | 10,000 amu/s |
| Power Supply | Integrated rechargeable Li-ion battery (≥4 h continuous operation) |
| Carrier Gas | Built-in helium or hydrogen micro-gas cylinder (30 mL, refillable) |
| Weight | < 19 kg (instrument only, without accessories) |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Category | Domestic |
| Model | Mars-400 Portable |
| Mass Analyzer Type | Ion Trap |
| Mass Range | 1–1000 m/z |
| Resolution | 1000–2000 (FWHM at m/z 502) |
| Sensitivity | 300:1 (S/N for 1 pg methyl parathion, full scan) |
| Scan Speed | 15,000 µs per scan |
| GC Technology | Low Thermal Mass (LTM) Gas Chromatography |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Domestic (China) |
| Model | Mars-550 |
| Pricing | Available Upon Request |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Category | Domestic |
| Model | Mars-6100 |
| Mass Range | 10–750 m/z |
| Resolution | 1 amu (unit mass resolution) |
| Sensitivity | ≥150:1 S/N at m/z 272 for 1 pg octafluoronaphthalene (OFN), 1 µL injection |
| Scan Speed | 10,000 amu/s |
| Analyzer Type | 3D Quadrupole Ion Trap |
| GC-MS Configuration | Conventional Capillary GC-Coupled Ion Trap MS |
| Interface | Patented Self-Locking GC-MS Interface |
| Brand | FPI |
|---|---|
| Origin | Zhejiang, China |
| Model | MiX5 500 |
| Form Factor | Handheld / Portable |
| Target Materials | Ferrous Alloys |
| Pre-installed Alloy Libraries | AISI, DIN, JIS, GB (1600+ grades) |
| Detector | Silicon Drift Detector (SDD) |
| X-ray Tube | High-Performance Microfocus Tube |
| Display | 4.3-inch Color Touchscreen |
| Weight | 1.5 kg |
| Battery Life | 10–12 hours |
| IP Rating | IP54 |
| Data Storage | Up to 100,000 results with spectra and optional images |
| Output Formats | CSV, PDF |
| Connectivity | USB, Wi-Fi, Bluetooth |
| Compliance Support | GLP/GMP audit trail capability, FDA 21 CFR Part 11–ready software architecture |