ATL Lasertechnik ATLEX Series Excimer Laser
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | ATLEX |
| Price | USD 55,000 (FOB Hamburg) |
| Core Technology | Gas-based Pulsed UV Excimer Laser System |
Overview
The ATL Lasertechnik ATLEX Series Excimer Laser is a compact, high-repetition-rate, pulsed ultraviolet (UV) gas laser system engineered for precision industrial and scientific applications requiring stable, short-duration UV pulses. Operating on noble-gas halide excimer media—typically KrF (248 nm), ArF (193 nm), or XeCl (308 nm)—the ATLEX leverages transverse discharge pre-ionization and optimized resonator design to deliver consistent pulse energy with sub-nanosecond rise times and pulse widths in the 10–30 ns range. Developed by ATL Lasertechnik GmbH—a German laser engineering firm founded in 1993—the ATLEX platform represents over three decades of iterative advancement in excimer laser architecture, including patented pre-ionization techniques and monolithic metal-ceramic discharge chambers. Unlike traditional water-cooled excimer systems, the ATLEX integrates intelligent thermal management via forced-air convection, eliminating external chillers and enabling benchtop deployment in cleanroom and clinical environments.
Key Features
- Compact laser head volume < 3 L, enabling integration into space-constrained OEM systems and laboratory setups
- High repetition rate operation up to 1 kHz at full rated pulse energy, supporting high-throughput micromachining and FBG inscription
- Patented metal-ceramic discharge chamber ensuring long-term gas stability, reduced electrode erosion, and extended gas lifetime (>10⁹ pulses)
- Integrated vacuum pump and halogen-filtered beam delivery path, minimizing maintenance intervals and optical contamination risks
- Energy stabilization mode with real-time pulse-to-pulse energy monitoring and closed-loop discharge voltage adjustment (±1.5% RMS energy stability over 8 hours)
- Uniform beam profile (top-hat spatial distribution) with M² < 30, optimized for homogenized irradiation in ablation and lithographic applications
- Fully air-cooled architecture—no external water chiller, deionized water loop, or compressed air required
Sample Compatibility & Compliance
The ATLEX Series is compatible with standard industrial and research-grade excimer gas mixtures (Kr/F₂, Ar/F₂, Xe/Cl₂) and supports interchangeable gas modules for wavelength flexibility. All units comply with IEC 60825-1:2014 (laser product safety), EN 61000-6-3 (EMC emission limits), and ISO 13857 (safety distances for laser access). For medical device integration—including ophthalmic refractive surgery platforms—the ATLEX meets essential requirements under ISO 13485:2016 quality management systems and supports traceable calibration per ISO/IEC 17025. Optional FDA 21 CFR Part 11-compliant software logging packages are available for GMP-regulated environments.
Software & Data Management
The ATLEX is controlled via a dedicated Windows-based GUI (ATL Control Suite v4.x) supporting local USB/Ethernet interface and remote RS-232/Modbus RTU protocols. The suite provides real-time monitoring of discharge voltage, pulse energy, repetition rate, gas pressure, and internal temperature sensors. All operational parameters are logged with timestamped metadata in CSV and HDF5 formats. Audit trails include user login history, parameter change logs, and firmware update records—fully compliant with GLP/GMP data integrity principles. Optional LabVIEW and Python SDKs enable seamless integration into automated test benches and custom process control architectures.
Applications
- UV Laser Ablation & Micromachining: Precision removal of polymers, ceramics, and thin-film coatings with minimal thermal damage; used in MEMS fabrication, display repair, and flexible PCB patterning
- Ophthalmic Surgery Support: Integrated as the UV source in excimer laser vision correction systems (e.g., LASIK, SMILE), meeting ANSI Z136.3 clinical safety standards
- Fiber Bragg Grating (FBG) Inscription: High-stability 248 nm output enables phase-mask and point-by-point grating writing in photosensitive silica fibers with sub-micron positioning repeatability
- Photochemical Processing: UV-induced surface functionalization of biomaterials, photocatalyst activation, and atmospheric-pressure plasma initiation
- Spectroscopic Calibration Sources: Stable narrowband UV emission for radiometric validation of spectroradiometers and monochromators (NIST-traceable wavelength references available)
FAQ
What wavelengths are supported by the ATLEX Series?
Standard configurations include 193 nm (ArF), 248 nm (KrF), and 308 nm (XeCl); custom gas fills and optics can be configured upon request.
Is the ATLEX suitable for Class 100 cleanroom integration?
Yes—the sealed metal-ceramic chamber, integrated vacuum pump, and absence of external coolant lines meet ISO 14644-1 Class 5 environmental compatibility requirements.
Does the system support external triggering and synchronization?
Yes—TTL-compatible trigger input (5 V, negative edge) with jitter < 5 ns; optional optical sync output for multi-laser timing alignment.
What is the typical gas lifetime under continuous 500 Hz operation?
With standard KrF mixture and energy stabilization enabled, average gas lifetime exceeds 1.2 × 10⁹ pulses before refill or regeneration is required.
Can the ATLEX be integrated into an existing OEM laser processing platform?
Yes—mechanical mounting interfaces, electrical pinouts, and communication protocols are documented per IEC 61131-3 and supplied with full OEM integration kits.
