KOSAKA ET200 Profilometer (Stylus-Based Surface Topography Measurement System)

Overview

The KOSAKA LAB ET200 is a high-precision, contact-mode profilometer engineered for quantitative surface topography characterization using diamond-tipped stylus scanning. Based on the classical mechanical profilometry principle—where a calibrated diamond probe traverses a surface while a capacitive or inductive displacement sensor records vertical deflection—the ET200 delivers traceable, NIST-compatible height data with sub-nanometer resolution. Its granite base, active vibration isolation compatibility, and direct-drive linear motion architecture ensure metrological stability across extended measurement campaigns. Designed explicitly for R&D laboratories and quality control environments in semiconductor fabrication, MEMS development, optical coating validation, and biomedical device manufacturing, the ET200 meets the stringent requirements of ISO 25178 (Geometrical Product Specifications – Surface Texture), ISO 4287 (Surface Roughness – Parameters), and ASTM E1093 (Standard Practice for Measuring Surface Profile Using Contact Profilometers). The system operates under Windows XP Embedded, providing deterministic real-time data acquisition and long-term software compatibility for regulated environments where OS migration is constrained by validation protocols.

Key Features

• Diamond stylus with 2 µm tip radius, enabling high-fidelity replication of nanoscale step edges and fine surface features without plastic deformation on soft or coated substrates.
• Z-axis resolution of 0.1 nm and vertical reproducibility of 1σ = 1 nm—achieved via low-noise capacitive transduction and thermally stabilized servo control.
• Programmable normal force control (1–50 mgf), allowing optimization for fragile films (e.g., photoresist, polymer coatings) or hard substrates (e.g., SiC, sapphire).
• Integrated color CCD microscope (standard 110× magnification) with coaxial illumination, enabling real-time visual confirmation of stylus positioning and feature targeting prior to scan initiation.
• 100 mm X-axis travel with 0.1 µm linear encoder resolution and ≤0.2 µm straightness error over full range—critical for wafer-scale uniformity mapping and cross-sectional profile stitching.
• Granite structural base (grade G603) with intrinsic damping properties, minimizing thermal drift and mechanical resonance during multi-hour measurements.
• Modular Z-axis with auto-stop collision protection, 50 mm vertical travel, and 0.2 µm positional resolution for coarse approach and fine scanning coordination.

Sample Compatibility & Compliance

The ET200 accommodates samples up to Ø160 mm in diameter, 50 mm thick, and 2 kg in mass—covering standard 4″, 6″, and 8″ semiconductor wafers, glass substrates for flat-panel displays, ceramic MEMS packages, and polymer-based medical implants. Its mechanical tilt stage (±1 mm/150 mm) enables rapid leveling of non-planar or warped specimens without requiring vacuum chucking. All measurement routines are fully compliant with GLP and GMP documentation standards when paired with optional audit-trail-enabled software modules. Data export formats include ASCII, CSV, and proprietary .KDF—compatible with third-party analysis platforms such as MountainsMap®, SPIP™, and MATLAB®. The system satisfies key regulatory prerequisites for FDA 21 CFR Part 11 compliance when deployed with electronic signature and user-access-controlled firmware (available via KOSAKA’s certified validation package).

Software & Data Management

KOSAKA’s proprietary ET-View software (v5.x) provides intuitive workflow-driven operation—from sample alignment and stylus calibration to automated multi-point profiling and statistical reporting. Built-in algorithms compute ISO 25178 parameters (Sa, Sq, Sz, Sdr, Vmp, Vmc), ISO 4287 roughness metrics (Ra, Rz, Rq), step height (ΔZ), film stress (via curvature analysis), and wear volume (3D material removal quantification). Raw profile traces are stored with full metadata: timestamp, operator ID, environmental conditions (optional external sensor integration), calibration certificate ID, and instrument configuration log. Software supports batch processing of up to 99 profiles per sequence, with pass/fail thresholding against user-defined specification limits. Exported reports include embedded uncertainty budgets calculated per ISO/IEC 17025 guidelines, supporting accreditation readiness.

Applications

• Semiconductor process control: gate oxide step coverage, CMP endpoint verification, trench depth uniformity on patterned wafers.
• Thin-film metrology: thickness and interfacial roughness of ALD/PVD-deposited layers (TiN, TaN, ITO) on silicon or glass.
• MEMS characterization: actuator displacement hysteresis, comb-drive gap uniformity, and released structure warpage.
• Optical component inspection: coating edge definition on laser diode facets, mold insert replication fidelity for micro-lens arrays.
• Biomedical surface engineering: roughness-dependent osseointegration assessment of titanium implant surfaces, hydrogel swelling kinetics via time-series step monitoring.
• Display technology: pixel wall height consistency in OLED backplanes, touch sensor electrode line edge acuity.

FAQ

What operating system does the ET200 run?
The ET200 uses Windows XP Embedded, selected for deterministic real-time performance and long-term hardware driver stability—particularly important in validated manufacturing environments where OS upgrades require full requalification.
Is the system compatible with modern data security and audit trail requirements?
Yes—when configured with KOSAKA’s ET-View Secure Edition and connected to a domain-authenticated network, it supports role-based access control, electronic signatures, and immutable audit logs meeting FDA 21 CFR Part 11 Annex 11 expectations.
Can the ET200 measure transparent or highly reflective surfaces?
As a contact profilometer, optical transparency or reflectivity has no impact on measurement integrity; however, proper stylus selection and force optimization are required to prevent scratching on delicate optical coatings.
What calibration standards are supported?
The system accepts NIST-traceable step height standards (e.g., NIST SRM 2101, 2102) and roughness artifacts (e.g., NIST SRM 1962, 1963); KOSAKA provides factory calibration certificates with uncertainty statements per ISO/IEC 17025.
Is vibration isolation mandatory for routine operation?
While not strictly mandatory, KOSAKA recommends either floor-mounted or tabletop active/passive isolation systems—especially for sub-2 nm repeatability work or measurements on large-area substrates where ambient floor noise exceeds 5 µm/s RMS.