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SERVOPRO NanoChrome ULTRA Online Gas Chromatograph

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Brand SERVOPRO (Servomex)
Origin United Kingdom
Model NanoChrome ULTRA
Instrument Type Online Gas Chromatograph
Application Domain Ultra-High-Purity (UHP) Gas Analysis
Temperature Control Range +5°C to +40°C
Carrier Gas Flow Rate 90–810 mL/min
Carrier Gas Pressure 85 psig (for O₂ background), 80 psig (for other backgrounds)
Sample Inlet Pressure Setting 30 psig (application-dependent)
Sample Inlet Total Flow Setting 0–300 mL/min (application-dependent)

Overview

The SERVOPRO NanoChrome ULTRA is an online gas chromatograph engineered for ultra-trace analysis of permanent gases and light hydrocarbons in ultra-high-purity (UHP) process streams—specifically designed for semiconductor manufacturing, electronics-grade gas production, and advanced materials synthesis environments. It employs a robust, dual-column GC architecture coupled with a proprietary Plasma Emission Detector (PED), a non-destructive, element-selective detection technology that enables simultaneous quantification of H₂, CH₄, CO, CO₂, N₂, Ar, and non-methane hydrocarbons (NMHC) at sub-ppb (parts-per-quadrillion) detection limits. Unlike flame ionization detectors (FID) or thermal conductivity detectors (TCD), the PED delivers stable, matrix-independent response across varying background compositions—including high-O₂ or high-Ar carrier streams—eliminating calibration drift and cross-sensitivity artifacts inherent in conventional detection schemes. The system operates fully unattended under continuous online monitoring protocols, with integrated valve sequencing, column oven temperature stabilization, and real-time retention time locking via ProPeak™ technology.

Key Features

  • Plasma Emission Detector (PED): Provides selective, high-sensitivity detection of elemental emissions (e.g., Ar I 419.8 nm, N I 746.8 nm, H I 656.3 nm) without chemical conversion or combustion—ensuring trace-level accuracy in inert or oxidizing matrices.
  • ProPeak™ Retention Time Locking: Dynamically corrects for minor thermal or flow-induced retention shifts using internal reference peaks, maintaining ±0.02 min retention stability over 30-day operation without manual intervention.
  • Modular Column Configuration: Supports parallel or sequential separation paths with fused-silica capillary columns (e.g., Rt-Q-Bond, GS-Alumina, or custom-packed molecular sieve variants) optimized for UHP gas impurity profiling.
  • Integrated Carrier & Sample Flow Control: Precision mass flow controllers (MFCs) regulate carrier gas (90–810 mL/min) and sample introduction (0–300 mL/min) with ±0.5% full-scale repeatability; pressure control maintains setpoints within ±1 psig across ambient fluctuations.
  • Ruggedized Industrial Enclosure: Rated IP54, designed for cleanroom-adjacent deployment (Class 1000 or better); includes redundant power supply, internal humidity monitoring, and fault-logging compliant with SEMI S2/S8 safety standards.
  • Self-Diagnostic Firmware: Continuously monitors detector plasma stability, column head pressure, oven thermal gradient uniformity, and valve actuation timing—generating actionable event logs for predictive maintenance.

Sample Compatibility & Compliance

The NanoChrome ULTRA is validated for direct injection of UHP gases including nitrogen, argon, helium, hydrogen, oxygen, and synthetic air—with no pre-concentration, cryo-trapping, or catalytic conversion required. It meets ASTM D7607-22 for trace impurity analysis in electronic-grade gases and aligns with ISO 8573-8:2019 for compressed air purity class 0 certification. All firmware and data handling routines support audit-ready operation per FDA 21 CFR Part 11 requirements, including electronic signatures, immutable audit trails, and role-based access control. System validation documentation (IQ/OQ/PQ protocols) is available for GMP-compliant facilities engaged in semiconductor fab tool qualification or bulk gas certification.

Software & Data Management

Control and data acquisition are managed via ChromaSoft™ v5.2—a Windows-based platform supporting method development, sequence scheduling, and automated report generation (PDF/CSV/XML). The software implements secure TLS 1.2 communication, OPC UA server integration for MES/SCADA interoperability, and configurable alarm thresholds with email/SNMP notification. Raw chromatograms, peak tables, and system health metrics are stored in a relational SQLite database with automatic daily backup and optional cloud sync (AWS S3 or on-premise NAS). All data exports include embedded metadata: instrument ID, calibration certificate ID, operator login, environmental conditions, and full chain-of-custody timestamps.

Applications

  • Semiconductor Front-End Process Control: Real-time monitoring of purge gas purity (e.g., Ar/N₂ in CVD/ALD tools) to prevent particle generation and film stoichiometry deviation.
  • UHP Bulk Gas Production: Certification of electronic-grade nitrogen, argon, and hydrogen per SEMI F63 and CGA G-13 specifications.
  • Gas Delivery System Integrity Testing: Leak detection and residual contamination assessment in point-of-use purifiers and stainless-steel distribution manifolds.
  • Advanced Packaging & MEMS Fabrication: Quantification of moisture-reactive impurities (e.g., CO, CO₂) in forming gas mixtures used during wafer bonding.
  • Research & Development Labs: Method transfer from offline GC-MS workflows to online PED-GC platforms for accelerated impurity identification and kinetics studies.

FAQ

Does the NanoChrome ULTRA require external calibration gases for routine operation?
No—ProPeak™ lock technology and PED’s intrinsic elemental response enable long-term calibration stability. However, initial system qualification and periodic verification (e.g., quarterly) require certified multi-component standard blends traceable to NIST SRMs.

Can the system analyze oxygen-rich backgrounds without detector quenching?
Yes—the PED operates stably in up to 100% O₂ carrier gas at 85 psig; its non-combustive plasma source eliminates flame extinction risks associated with FID-based systems.

Is remote diagnostics supported?
Yes—ChromaSoft™ includes embedded VNC-compatible remote access with session logging, firewall-safe port configuration, and optional 4G/LTE failover connectivity.

What is the typical maintenance interval for the PED source?
Under continuous operation in UHP environments, the PED electrode assembly requires inspection every 12 months; consumable replacement (quartz torch, electrodes) is typically needed every 24 months.

How does the system handle variable inlet pressure from gas cabinets?
An integrated pressure-regulating module upstream of the sample MFC maintains constant inlet pressure (30 psig ±0.5 psig), decoupling analyzer performance from upstream fluctuations in bulk gas delivery systems.

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