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Beijing Boyuan Weina Technology Co., Ltd.

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BrandVPI Brooyuan
OriginBeijing, China
Manufacturer TypeAuthorized Distributor
Country of OriginDomestic (China)
ModelSD-650MHT
Target ConfigurationDual Magnetron Sputtering Heads (2× 2-inch)
Ultimate Vacuum≤5×10⁻⁵ Pa
Vacuum System300 L/s Turbo Molecular Pump + 4 L/s Scroll Mechanical Pump with Anti-Backstreaming Valve & Oil Filter
Vacuum GaugeDual-Range Composite Gauge (1×10⁵–1×10⁻⁵ Pa)
Power SupplyDC Constant-Current Source (0–600 V / 0–1.6 A), Optional RF Generator (500 W, 13.56 MHz with Auto-Matching Network)
Chamber Dimensions (ID)Ø210 mm × H250 mm
Chamber MaterialElectropolished 304 Stainless Steel (Ra ≤ 0.8 µm)
Substrate HolderØ200 mm Rotating Stage (0–20 rpm, ±0.1 rpm precision), Optional Heating (±1 °C)
CoolingClosed-Loop Chiller (±1 °C temperature control)
Gas ControlElectromagnetic Mass Flow Valve + Manual Valve (Ar, N₂ compatible)
Thickness MonitoringIntegrated Quartz Crystal Monitor (0–6000 nm range, 0.001 nm/s resolution, 257 preloaded materials + user-defined library)
Control InterfaceVPI-Customized Dual-Touchscreen HMI with Real-Time Parameter Synchronization
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BrandVPI (Beijing Boyuan Weinano Technology Co., Ltd.)
OriginBeijing, China
ModelSD-650MH
Vacuum ChamberØ260 mm × 270 mm (external), Ø210 mm × 270 mm (internal)
Ultimate Vacuum5×10⁻⁵ Pa
Turbo Molecular Pump300 L/s
Foreline Pump4 L/s with anti-backstreaming solenoid valve & oil mist filter
DC Power Supply0–600 V / 0–1.6 A
Sputtering Rate0–200 nm/min
Target Diameter50 mm
Integrated Thickness Monitor0–6000 nm, resolution 0.001 nm/s
Gas ControlElectromagnetic + manual mass flow valves for Ar and other inert gases
ComplianceDesigned for GLP-aligned thin-film R&D environments
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BrandVPI (Vision Precision Instruments)
ModelETD-2000
TypeDC Magnetron Sputtering System
Target ConfigurationSingle removable sputter target head
Chamber Vacuum Range1 × 10⁻³ to 5 × 10⁻¹ mbar
Operating Current Range0–40 mA (adjustable)
Process Timer0–300 seconds (digital display)
Chamber MaterialBorosilicate glass viewport + aluminum alloy main body
Pumping SystemIntegrated two-stage rotary vane pump (pump-down time < 90 s to 1 × 10⁻² mbar)
Power SupplyDC, stabilized, current-limited
Leak Rate Compliance≤5 × 10⁻⁷ mbar·L/s (as verified per ISO 20483)
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BrandVPI (BoYuan Micro-Nano)
OriginBeijing, China
ModelETD-100AF
Vacuum SystemFeiyue Forepump + Compound Turbo-Molecular Pump (High Compression Ratio, Air-Cooled)
Base Pressure≤2×10⁻⁴ Pa
Chamber DimensionsØ230 mm × H280 mm
Evaporation SourceMolybdenum Boat / Tungsten Filament / Fixed Bracket
Max Evaporation Current100 A
Max Evaporation Voltage10 V
Max Power1000 W
Compatible Target MaterialsC, Au, Cr, Pt, Ni, Al, Ti, Ag, and other standard evaporation metals
Sample TypesBiological specimens, polymers, ceramics, insulating substrates, beam-sensitive materials
Application DomainSEM sample preparation, TEM grid coating, electrode fabrication, thin-film R&D, academic teaching labs
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BrandVPI
OriginBeijing, China
Manufacturer TypeAuthorized Distributor
Country of OriginChina
ModelSD-650MHG
Target Diameter2 inches
Vacuum SystemHigh-vacuum compatible (≤5×10⁻⁶ Torr base pressure)
Integration InterfaceFront-mounted flush-mount viewport with CF-40 or KF-40 vacuum flange
Sealing StandardMetal-gasketed static seal compliant with ISO-KF and ISO-FM specifications
Power SupplyDC/RF configurable (optional upgrade)
Substrate HolderManual tilt-adjustable stage (max. Φ100 mm)
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