- All
- Favorite
- Popular
- Most rated
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-2000Ⅲ |
| Target Materials | Au, Pt, Ag (Ø50 mm) |
| Control Mode | Automatic sample stage rotation synchronized with selected target |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage | Ø50–70 mm, vertically adjustable |
| Sputtering Gases | Ar, N₂, and other process gases |
| Brand | VPI |
|---|---|
| Model | ETD-2000C |
| Target Material | Au or Pt |
| Target Diameter | 50 mm |
| Control Mode | Manual |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage Diameter | 50–70 mm |
| Sputtering Gas | Multiple inert gases (Ar, N₂, etc.) |
| Sputtering Voltage | 0–1600 V DC |
| Sputtering Current | 0–50 mA |
| Sputtering Timer | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Carbon Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate glass |
| Vacuum Pump | VRD-8 rotary vane pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V) |
| Brand | VPI Brooyuan |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | Domestic (China) |
| Model | SD-650MHT |
| Target Configuration | Dual Magnetron Sputtering Heads (2× 2-inch) |
| Ultimate Vacuum | ≤5×10⁻⁵ Pa |
| Vacuum System | 300 L/s Turbo Molecular Pump + 4 L/s Scroll Mechanical Pump with Anti-Backstreaming Valve & Oil Filter |
| Vacuum Gauge | Dual-Range Composite Gauge (1×10⁵–1×10⁻⁵ Pa) |
| Power Supply | DC Constant-Current Source (0–600 V / 0–1.6 A), Optional RF Generator (500 W, 13.56 MHz with Auto-Matching Network) |
| Chamber Dimensions (ID) | Ø210 mm × H250 mm |
| Chamber Material | Electropolished 304 Stainless Steel (Ra ≤ 0.8 µm) |
| Substrate Holder | Ø200 mm Rotating Stage (0–20 rpm, ±0.1 rpm precision), Optional Heating (±1 °C) |
| Cooling | Closed-Loop Chiller (±1 °C temperature control) |
| Gas Control | Electromagnetic Mass Flow Valve + Manual Valve (Ar, N₂ compatible) |
| Thickness Monitoring | Integrated Quartz Crystal Monitor (0–6000 nm range, 0.001 nm/s resolution, 257 preloaded materials + user-defined library) |
| Control Interface | VPI-Customized Dual-Touchscreen HMI with Real-Time Parameter Synchronization |
| Brand | VPI |
|---|---|
| Origin | Beijing, China |
| Model | SD-981M |
| Target Material | Gold (Au), 50 mm diameter |
| Target Thickness | 0.1 mm |
| Control Mode | Automatic & Manual |
| Chamber Dimensions | 180 mm (Ø) × 130 mm (H) |
| Sample Stage Diameter | 70 mm |
| Sputtering Gases | Multiple configurable (Ar, Au/Ar mix, etc.) |
| Vacuum Range | Adjustable 2–15 Pa (base vacuum ≤1 Pa) |
| Sputtering Current | 0–50 mA (adjustable) |
| Timer Range | 0–600 s (digital) |
| Deposition Rate | 0–60 nm/min |
| Pumping System | VRD-8 rotary vane pump |
| Power Supply | 220 V, 50 Hz |
| Rated Power | 100 W |
| Vacuum Gauge | Pirani sensor |
| Touchscreen Interface | 4-inch VPI HMI |
| Brand | VPI (Beijing Boyuan Weinano Technology Co., Ltd.) |
|---|---|
| Origin | Beijing, China |
| Model | SD-650MH |
| Vacuum Chamber | Ø260 mm × 270 mm (external), Ø210 mm × 270 mm (internal) |
| Ultimate Vacuum | 5×10⁻⁵ Pa |
| Turbo Molecular Pump | 300 L/s |
| Foreline Pump | 4 L/s with anti-backstreaming solenoid valve & oil mist filter |
| DC Power Supply | 0–600 V / 0–1.6 A |
| Sputtering Rate | 0–200 nm/min |
| Target Diameter | 50 mm |
| Integrated Thickness Monitor | 0–6000 nm, resolution 0.001 nm/s |
| Gas Control | Electromagnetic + manual mass flow valves for Ar and other inert gases |
| Compliance | Designed for GLP-aligned thin-film R&D environments |
| Brand | VPI |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Regional Classification | Domestic (China) |
| Model | SD-PD260A |
| Price | USD 7,000 (FOB Beijing) |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ETD-SSS |
| Target Material | Stainless Steel |
| Target Diameter | 50 mm |
| Control Method | Manual |
| Chamber Dimensions (Ø × H) | 100 mm |
| Sample Stage Diameter | 15 mm |
| Sputtering Gas | Ambient Air |
| Brand | Boyuan Weina / VPI |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | SD-900M Magnetron Sputter Coater |
| Target Materials | Au, Ag, Pt, etc. |
| Target Diameter & Thickness | φ50 mm × 0.1 mm |
| Control Mode | Manual and Programmable Auto Mode |
| Chamber Dimensions | φ160 mm × 120 mm (D × H) |
| Sample Stage Diameter | 50 mm (compatible with 70 mm optional) |
| Sputtering Gases | Ar, N₂, O₂, and other process gases |
| Maximum DC Voltage | −1600 V |
| Max Sputtering Current | 100 mA |
| Base Pressure | ≤4 × 10⁻² mbar |
| Pumping Speed | 2 L/s (VRD-8 rotary vane pump) |
| Power Input | 220 V AC, 50 Hz (110 V option available) |
| Deposition Rate | ~40 nm/min (Au, under optimized Ar plasma conditions) |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Model | ETD-2000MH |
| Target Material | Multiple weak-magnetic targets (e.g., Au, Ag, Pt) |
| Target Diameter | 60–80 mm |
| Control Mode | Manual |
| Chamber Dimensions | Borosilicate glass, Ø180 mm × H240 mm |
| Sample Stage Diameter | 180 mm |
| Sputtering Gases | Ar, N₂, O₂, or custom gas mixtures |
| Ultimate Vacuum | ≤5×10⁻⁵ Pa |
| Pumping System | Turbo-molecular pump (80 L/s) + Two-stage rotary vane backing pump |
| Operating Voltage | 220 V, 50 Hz |
| Sputtering Current Range | 0–500 mA |
| Standard Target | Au (60 mm Ø × 0.1 mm thick) |
| Optional Targets | Ag, Pt, Cr, NiCr, C, etc. |
| Brand | VPI (Boyuan Micronano) |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | YB-ST5000 |
| Power Input | 220 V, 50 Hz, 1000 W |
| High Voltage Supply | -30 kV, max. -3 mA |
| Electron Gun | Cold-cathode type with beam focusing control |
| Minimum Beam Spot Diameter | ≤1 mm |
| Sample Chamber | Stainless-steel cylindrical chamber (≥180 mm diameter, ≥150 mm depth) with motorized XYZ stage (±30 mm lateral, 0–50 mm vertical, 360° rotation) |
| Observation Window | Lead-glass viewport with optional trinocular stereo microscope (10×–80×), camera port included |
| Vacuum System | Rotary vane pump (2 L/min) with CCD-based vacuum monitoring |
| Control PC | HP 280 Pro G4 MT (Intel Core i7, 8 GB RAM, 2 GB discrete GPU, 2 TB HDD, 21.5″ display, Windows 7) |
| Brand | VPI (Vision Precision Instruments) |
|---|---|
| Model | ETD-2000 |
| Type | DC Magnetron Sputtering System |
| Target Configuration | Single removable sputter target head |
| Chamber Vacuum Range | 1 × 10⁻³ to 5 × 10⁻¹ mbar |
| Operating Current Range | 0–40 mA (adjustable) |
| Process Timer | 0–300 seconds (digital display) |
| Chamber Material | Borosilicate glass viewport + aluminum alloy main body |
| Pumping System | Integrated two-stage rotary vane pump (pump-down time < 90 s to 1 × 10⁻² mbar) |
| Power Supply | DC, stabilized, current-limited |
| Leak Rate Compliance | ≤5 × 10⁻⁷ mbar·L/s (as verified per ISO 20483) |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | ETD-100AF |
| Vacuum System | Feiyue Forepump + Compound Turbo-Molecular Pump (High Compression Ratio, Air-Cooled) |
| Base Pressure | ≤2×10⁻⁴ Pa |
| Chamber Dimensions | Ø230 mm × H280 mm |
| Evaporation Source | Molybdenum Boat / Tungsten Filament / Fixed Bracket |
| Max Evaporation Current | 100 A |
| Max Evaporation Voltage | 10 V |
| Max Power | 1000 W |
| Compatible Target Materials | C, Au, Cr, Pt, Ni, Al, Ti, Ag, and other standard evaporation metals |
| Sample Types | Biological specimens, polymers, ceramics, insulating substrates, beam-sensitive materials |
| Application Domain | SEM sample preparation, TEM grid coating, electrode fabrication, thin-film R&D, academic teaching labs |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900 |
| Target Materials | Au, Pt, Ag |
| Target Diameter | 50 mm |
| Control Method | Microprocessor-Based Electronic Control |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage Diameter | 50–70 mm (customizable) |
| Sputtering Gases | Ar, N₂, Air |
| Vacuum Gauge Range | 1 × 10⁻³ to 1 × 10³ mbar |
| Max DC Voltage | −1600 V |
| Max Sputtering Current | 50 mA |
| Current Stability | ±0.1 mA |
| Timer Range | 0–999 s |
| Base Pump | 2 L/s VRD-8 Rotary Vane Pump |
| Chamber Material | Borosilicate Glass |
| Power Supply | 220 V AC, 50 Hz (110 V optional) |
| Weight | ~35 kg |
| Dimensions (W×D×H) | 300 × 360 × 380 mm |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | ETD-2000 |
| Target Material | Gold (Au), 50 mm diameter × 0.1 mm thickness |
| Control Method | Manual |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage | Ø50–70 mm, vertically adjustable |
| Sputtering Gases | Multiple inert gases (e.g., Ar, N₂, Kr) |
| Maximum DC Voltage | −1600 V |
| Ion Current Range | 0–50 mA |
| Ultimate Vacuum | ≤ 4 × 10⁻² mbar |
| Timer Range | 0–3600 s |
| Pumping System | VRD-8 rotary vane pump (2 L/s) |
| Input Power | 220 V AC, 50 Hz (110 V option available) |
| Overall Dimensions | 305 mm × 365 mm × 325 mm (W × D × H) |
| Sealing | Ceramic high-voltage feedthroughs + vacuum-grade rubber edge seal |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-3000 |
| Target Material (Standard) | Au (50 mm × 0.1 mm thickness) |
| Optional Targets | Ag, Pt, Ir, Cu |
| Sputtering Gases | Ar, N₂, and other inert/reactive gases |
| Chamber Dimensions | Ø150 mm × 120 mm (H) |
| Sample Stage Diameter | 50 mm |
| Maximum Sputtering Voltage | –2800 V DC |
| Max Sputtering Current | 50 mA |
| Ultimate Vacuum | ≤ 4 × 10⁻² mbar |
| Timer Range | 1–360 s |
| Vacuum Pump | VRD-8 rotary vane pump (2 L/s) |
| Control Method | Manual analog interface with CPU-assisted timing and interlock logic |
| Compliance | Designed for GLP-aligned sample prep workflows in SEM labs |
| Brand | VPI |
|---|---|
| Model | ETD-800 |
| Target Material | Au (standard), optional Pt, Ag, Cr, Al, Cu |
| Target Diameter | 50 mm |
| Chamber Dimensions | Ø100 mm × 100 mm (H) |
| Sample Stage Diameter | 50 mm |
| Sputtering Gas | Air (ambient air used as sputtering medium) |
| Control Mode | Fully Automatic |
| Vacuum System | Integrated single-stage rotary vane pump (1 L/s) |
| Maximum DC Bias Voltage | −1200 V |
| Timer Range | 0–3600 s (digital, ±1 s resolution) |
| Chamber Material | Borosilicate glass |
| Power Supply | 220 V AC, 50 Hz (optional 110 V configuration available) |
| Unit Dimensions | 310 mm × 260 mm × 115 mm (W × D × H) |
| Origin | Beijing, China |
|---|---|
| Manufacturer Type | Distributor |
| Origin Category | Domestic |
| Model | SD-160 |
| Price Range | USD 1,400 – 7,200 (est.) |
| Target Materials (Standard) | Au |
| Optional | Ag, Pt |
| Target Dimensions | 50 mm × 0.1 mm |
| Control Mode | Manual |
| Chamber Dimensions | Ø150 mm × H120 mm |
| Sample Stage Diameter | 70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Max Sputtering Current | 30 mA (rated), 50 mA (peak) |
| Sputtering Rate | >4 nm/min (Au on Si under standard Ar conditions) |
| Input Power | 220 V AC, 50 Hz (110 V option available) |
| Vacuum Pump | High-performance two-stage rotary vane pump (integrated) |
| Brand | Elaborate |
|---|---|
| Origin | Beijing, China |
| Model | ETD-80AF |
| Target Material | Carbon Rod |
| Control Method | Manual |
| Chamber Dimensions (D×H) | 170 mm × 200 mm |
| Sample Stage Diameter | 170 mm |
| Base Pressure | 2×10⁻² mbar |
| Operating Voltage | 220 V, 50 Hz |
| Maximum Evaporation Current | 100 A |
| Adjustable Evaporation Current Range | 0–80 A |
| Vacuum Pump | High-Performance Two-Stage Rotary Vane Pump (2 L/s) |
| Compatible Substrates | Non-conductive, beam-sensitive specimens (e.g., biological tissues, polymers, ceramics) |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-800C |
| Target Material | Carbon Fiber |
| Target Diameter | 5 mm |
| Chamber Dimensions (ID) | 170 mm × 130 mm (D × H) |
| Sample Stage Diameter | 70 mm |
| Operating Vacuum | 4 × 10⁻² mbar |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Current | 0–100 A |
| Deposition Time Range | 0–1 s |
| Vacuum Pump | 2 L/min Two-Stage Rotary Vane Pump (Feiyue VRD-8) |
| Chamber Material | Borosilicate Glass |
| Power Supply | AC, 220 V, 50 Hz |
| External Dimensions | 340 mm × 390 mm × 300 mm (W × D × H) |
| Control Mode | Manual |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900C |
| Sputtering Target Materials | Au, Ag, Pt, Cr, Al, Cu |
| Target Dimensions | Ø50 mm × 0.12 mm |
| Sputtering Voltage Range | 0–1600 V DC |
| Sputtering Current Range | 0–50 mA |
| Sputtering Time Control | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate Glass |
| Chamber Dimensions | 160 mm × 110 mm (D × H) |
| Sample Stage Diameter Range | Ø50–70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Vacuum System | VRD-8 Rotary Vane Pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V configuration) |
| Brand | VPI |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | SD-650MHG |
| Target Diameter | 2 inches |
| Vacuum System | High-vacuum compatible (≤5×10⁻⁶ Torr base pressure) |
| Integration Interface | Front-mounted flush-mount viewport with CF-40 or KF-40 vacuum flange |
| Sealing Standard | Metal-gasketed static seal compliant with ISO-KF and ISO-FM specifications |
| Power Supply | DC/RF configurable (optional upgrade) |
| Substrate Holder | Manual tilt-adjustable stage (max. Φ100 mm) |
| Brand | VPI |
|---|---|
| Model | SD-980 |
| Type | Thermal Evaporation Coater |
| Origin | Beijing, China |
| Target Material | Carbon Fiber Rope |
| Target Diameter | 30 mm |
| Chamber Dimensions (W×D×H) | 340 × 390 × 300 mm |
| Sample Stage Diameter | 70 mm |
| Vacuum Chamber (D×H) | 160 × 110 mm (Borosilicate Glass) |
| Ultimate Vacuum | 5 Pa |
| Evaporation Current Range | 50–80 A |
| Pulse Count Setting | 0–9 pulses |
| Control Interface | Touchscreen HMI |
| Power Supply | 220 V AC, 50 Hz, Grounded |
| Pump | VRD-8 Rotary Vane Pump (2 L/min) |
| Weight | ~50 kg |
| Max. Power Consumption | 1.6 kW |
| Sputtering Gas Required | None |
Show next