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| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900C |
| Sputtering Target Materials | Au, Ag, Pt, Cr, Al, Cu |
| Target Dimensions | Ø50 mm × 0.12 mm |
| Sputtering Voltage Range | 0–1600 V DC |
| Sputtering Current Range | 0–50 mA |
| Sputtering Time Control | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate Glass |
| Chamber Dimensions | 160 mm × 110 mm (D × H) |
| Sample Stage Diameter Range | Ø50–70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Vacuum System | VRD-8 Rotary Vane Pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V configuration) |
| Brand | VPI |
|---|---|
| Model | SD-980 |
| Type | Thermal Evaporation Coater |
| Origin | Beijing, China |
| Target Material | Carbon Fiber Rope |
| Target Diameter | 30 mm |
| Chamber Dimensions (W×D×H) | 340 × 390 × 300 mm |
| Sample Stage Diameter | 70 mm |
| Vacuum Chamber (D×H) | 160 × 110 mm (Borosilicate Glass) |
| Ultimate Vacuum | 5 Pa |
| Evaporation Current Range | 50–80 A |
| Pulse Count Setting | 0–9 pulses |
| Control Interface | Touchscreen HMI |
| Power Supply | 220 V AC, 50 Hz, Grounded |
| Pump | VRD-8 Rotary Vane Pump (2 L/min) |
| Weight | ~50 kg |
| Max. Power Consumption | 1.6 kW |
| Sputtering Gas Required | None |
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