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| Brand | EV Group (EVG) |
|---|---|
| Origin | Austria |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | EVG Mask Aligner Series |
| Exposure Mode | Proximity Mode |
| Resolution | ≥0.5 µm |
| Light Source | Mercury Arc Lamp |
| Wavelength | UV (i-line, g-line, h-line) |
| Illumination Uniformity | ±0.4% |
| Maximum Wafer/substrate Size | 2–8 inch (standard configuration) |
| Compatible Substrate Types | Si, SiC, GaAs, glass, quartz, flexible polymers |
| Alignment Accuracy | Sub-micron top-side and backside alignment |
| Vacuum Chuck Type | Pneumatic or electrostatic (model-dependent) |
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