Electron Microscope Sample Preparation Equipment
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| Brand | Abbe / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | OEM Manufacturer |
| Region Category | Domestic (China) |
| Model | AL-2000 |
| Pricing | Upon Request |
| Sample Diameter Capacity | Ø0–25 mm |
| Ultimate Vacuum | 5 × 10⁻³ Pa (without Ar gas) |
| Acceleration Voltage Range | 200–10,000 V |
| Brand | Abel/Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Region Classification | Domestic (China) |
| Model | AL-1000 |
| Pricing | Upon Request |
| Maximum Sample Diameter | Ø25 mm and Ø50 mm |
| Minimum Particle Size | ~3 nm |
| Ion Beam Energy Range | 200–6000 V |
| Base Vacuum | ≤5×10⁻³ Pa (without Ar flow) |
| Sample Stage | Motorized Rotation |
| Cooling Option | Peltier-based Semiconductor Cooling (optional) |
| Integrated Functions | Plasma Cleaning + Ion Beam Sputtering + Reactive Ion Beam Etching (with reactive gas inlet) |
| Control System | Digital Automated Controller with Real-time Parameter Logging |
| Brand | Abel/Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer | Yes |
| Country of Origin | China |
| Model | AL-1600 |
| Vacuum Base Pressure | ≤5×10⁻³ Pa (without Ar flow) |
| Acceleration Voltage Range | 200–6000 V |
| Sample Stage | Rotatable |
| Ion Source | Single Ion Gun |
| Cooling Option | Thermoelectric (optional) |
| Glovebox Integration | Yes |
| Primary Functions | Plasma Cleaning, Ion Beam Sputter Deposition, Reactive Ion Beam Etching (with reactive gas introduction) |
| Beam Uniformity | Optimized for Ø25 mm and Ø50 mm substrates |
| Typical Deposited Grain Size | ~3 nm |
| Low-Energy Ion Impact | Minimized substrate damage, suitable for thermally sensitive samples |
| In-situ Cleaning & Deposition | Integrated within single vacuum chamber |
| Control System | Digital, Programmable, Automated |
| Brand | Abel / Ionbeam |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | AL-2600 |
| Pricing | Upon Request |
| Brand | Agar Scientific / Oxford Instruments |
|---|---|
| Origin | UK |
| Model | AGB7341 |
| Chamber Dimensions | 120 mm Ø × 120 mm H (optional 150 mm × 165 mm) |
| Sample Stage Capacity | 12 standard pin-type stubs |
| Stage Height Adjustment Range | 0–60 mm |
| Sputter Head | Low-voltage planar magnetron |
| Target Diameter/Thickness | 57 mm Ø × 0.1 mm |
| Standard Target Material | Au |
| Optional Targets | Pt, Au/Pd, Pt/Pd, Ag |
| Max Current | 40 mA |
| Current Control Range | 0–50 mA |
| Vacuum Range | Atmosphere to 1 × 10⁻³ mbar |
| Process Gas | Argon (≥99.9% purity) |
| Pumping Speed | 2 L/s mechanical pump |
| Power Supply | 220 V, 50/60 Hz |
| Digital Timer | 0–300 s with pause function |
| Safety Features | Vacuum interlock, over-current protection |
| Optional Quartz Crystal Thickness Monitor | In-situ nanoscale monitoring (resolution: 0.1 nm) |
| Brand | Agar Scientific / Oxford Instruments |
|---|---|
| Origin | United Kingdom |
| Model | AGB7367A |
| Chamber Dimensions | 120 mm Ø × 120 mm H (glass) |
| Sample Stage | Stainless steel, accommodates up to 12 pin-type stubs, height adjustable over 30 mm range |
| Evaporation Source | High-purity graphite rod, 6.15 mm diameter |
| Power Control | Microprocessor-based, remote voltage/current sensing |
| Max Current | 180 A |
| Voltage Range | 0.1–5.5 V (digital setpoint) |
| Current Range | 0–200 A |
| Vacuum Gauge | Analog, 1 atm to 0.001 mbar |
| Pumping Speed | 2 L/s mechanical pump, reaches ≤0.1 mbar in 25–30 s |
| Operating Voltage | 220 V, 50/60 Hz |
| Optional QCM Thickness Monitor | 6 MHz quartz crystal, in-situ nanometric resolution (±0.1 nm for carbon) |
| Safety | Vacuum interlock, overcurrent protection |
| Operation Modes | Automatic (programmable timer: 1–30 s) and manual |
| Auto-vent Function | Yes |
| Compatibility | Zeiss, JEOL, Hitachi, Thermo Fisher (FEI), Tescan, Phenom SEM platforms |
| Brand | Aibo |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | AL-900 |
| Pricing | Available Upon Request |
| Brand | Beam Convergence |
|---|---|
| Model | GVC2000 |
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Pricing | Upon Request |
| Brand | Beam Convergence |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Model | GVC5000T |
| Dimensions | 480(L)×390(D)×460(H) mm |
| Power Supply | 220 VAC / 1200 W |
| Sputtering Target Diameter | φ57 mm |
| Sputtering Current Range | 5–200 mA |
| Sputtering Time Range | 0–999 s |
| Evaporation Source | φ0.8 mm Carbon Fiber |
| Evaporation Sources | 1–4 units |
| Evaporation Modes | Continuous & Pulsed |
| Vacuum Chamber | Borosilicate Glass, φ200×130 mm |
| Base Pressure | <5×10⁻³ Pa |
| Pumping Speed | 90 L/s (Turbo) + 1.1 L/s (Rotary) |
| Pump-Down Time | ≤5 min to 5×10⁻³ Pa |
| Human-Machine Interface | 7-inch TFT Color Touchscreen |
| Maximum Sample Stage Diameter | φ125 mm |
| Pre-Sputtering | Integrated Automatic Baffle |
| Protection Features | Overcurrent, Vacuum Interlock, Turbo Pump Thermal Protection |
| Anti-Contamination Design | Dual-Isolation Architecture for Sputtering & Evaporation Modules |
| Optional Quartz Crystal Thickness Monitor | Real-time Thickness Display, Setpoint Control, Resolution: 0.1 nm, Range: 1–999 nm per cycle, Max. Measurable Thickness: 10 μm |
| Brand | DOSAKA |
|---|---|
| Origin | Japan |
| Model | DTK-Zero1N |
| Power Supply | 100/120/220/240 V, 50/60 Hz |
| Blade Vibration Frequency | 0–55 Hz |
| Blade Stroke Amplitude | Fixed 2 mm |
| Sectioning Speed | 0–68 mm/min (approx.) |
| Retraction Speed | 104 mm/min (approx.) |
| Max. Specimen Height | 20 mm |
| Specimen Retraction Function | Yes |
| Max. Specimen Dimensions | 25 × 30 mm |
| Compatible Blade Size | 30 mm standard vibrating blade |
| Brand | Jingying (Guangzhou Jingying Scientific Instrument Co., Ltd.) |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | OEM Manufacturer |
| Country of Origin | China |
| Model | JY-E120C |
| Price | USD 7,000 (approx.) |
| Dimensions | 450 × 310 × 340 mm |
| Touchscreen | 7-inch IPS color LCD |
| Evaporation Source | Graphite rod (carbon rope optional) |
| Operating Modes | Continuous mode & pulsed mode |
| Vacuum Pump Speed | 133 L/min |
| Ultimate Vacuum | ≤0.05 Pa |
| Working Vacuum | ≤5 Pa |
| Sample Chamber | 120 × 120 mm |
| Language Support | English / Chinese interface toggle |
| Brand | Fischione |
|---|---|
| Origin | USA |
| Model | 1040 |
| Ion Beam Energy Range | 50–8,000 eV |
| Minimum Beam Energy | 50 eV |
| Focused Beam Spot Size | ≤1 µm |
| Imaging Mode | Argon Ion-Induced Secondary Electron Imaging |
| Cooling Stage | Liquid Nitrogen Cooled (−196 °C) |
| Beam Steering Accuracy | <100 nm positional repeatability |
| Vacuum Requirement | ≤5×10⁻⁶ Torr |
| Brand | Fischione |
|---|---|
| Origin | USA |
| Manufacturer Status | Authorized Distributor |
| Origin Category | Imported |
| Model | 170 |
| Price | Upon Request |
| Brand | Gatan |
|---|---|
| Origin | USA |
| Model | 697 Ilion II |
| Ion Gun Type | Dual Penning-type with Triode (Cathode/Anode/Focusing Electrode) Construction |
| Beam Energy Range | 100 eV – 8 keV |
| Beam Current Control | 0–100 mA per gun via Mass Flow Controller |
| Beam Angle Adjustment | ±10° per gun, 0.1° incremental resolution |
| 扇形抛光角 | ��Sector Polish Angle）: Programmable 10°–90° |
| Polishing Rate | Up to 300 µm/h (on Si at 8 keV) |
| Vacuum Base Pressure | 5×10⁻⁶ Torr |
| Operating Pressure | 8.5×10⁻⁵ Torr |
| Pumping System | 80 L/s Turbo-Molecular Pump + Dual-Stage Diaphragm Pump |
| Sample Stage Rotation | 0.5–6 rpm, continuously adjustable |
| Cryogenic Stage | Liquid Nitrogen-cooled, down to −120 °C |
| Integrated Imaging | Digital Zoom Microscope (300×–2200×), real-time acquisition via Gatan DigitalMicrograph® software |
| Sample Exchange Time | < 60 s via WhisperLock™ pneumatic airlock |
| Ion Source Lifetime | > 30,000 hours, maintenance-free operation |
| Brand | Gatan |
|---|---|
| Origin | USA |
| Model | PECS II 685 |
| Ion Source | Two rare-earth magnet-equipped Penning ion guns (maintenance-free) |
| Beam Energy Range | 100 eV – 8.0 keV |
| Beam Current Density | 10 mA/cm² (peak) |
| Beam Diameter Control | Via gas flow or discharge voltage |
| Sample Capacity | Ø ≤ 32 mm, H ≤ 15 mm |
| Polishing Angle Adjustment | ±10° per gun, independently adjustable |
| Dual-Beam Modulation | Single- or dual-beam angular modulation |
| Sample Rotation | 1–6 rpm, continuously variable |
| Cooling | Liquid nitrogen-cooled stage |
| Vacuum System | 80 L/s turbomolecular pump + dual-stage diaphragm pump |
| Base Pressure | ≤ 5 × 10⁻⁶ Torr |
| Operating Pressure | ≤ 8 × 10⁻⁵ Torr |
| Vacuum Gauge | Cold-cathode gauge (main chamber), solid-state gauge (foreline) |
| Load Lock | Whisperlok™ airlock technology (< 1 min exchange, no main chamber vent) |
| User Interface | 10-inch color touchscreen with recipe-based operation |
| Compliance | Designed for GLP-compliant lab environments |
| Brand | VitroTEM |
|---|---|
| Origin | Netherlands |
| Model | Naiad-1 |
| Type | Automated Graphene Encapsulation System for In Situ Liquid-Phase TEM Sample Preparation |
| Compliance | Designed for High-Vacuum TEM Compatibility and Cryo-EM Workflow Integration |
| Liquid Chamber Thickness | Adjustable down to ~10–50 nm (user-defined via piezoelectric control) |
| Graphene Membrane | CVD-grown, monolayer-to-bilayer transferable, pre-characterized for electron transparency (>95% at 200 kV) and mechanical stability |
| Maximum Operating Temperature | Ambient to 40 °C (non-heated configuration) |
| Vacuum Compatibility | Fully bakeable to 1×10⁻⁶ mbar |
| Software Interface | Windows-based control suite with real-time pressure monitoring, graphene tension feedback, and liquid volume calibration algorithms |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | QuickGlow |
| Pricing | Upon Request |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer | Yes |
| Type | Domestic |
| Model | QuickGlow |
| Price | Upon Request |
| Plasma Current | 3–30 mA |
| High-Voltage Power Supply | 50 W |
| Electrode Polarity | Negative |
| Sample Stage Diameter | Ø63 mm (customizable) |
| Sample Stage Height Adjustment | 30–80 mm |
| Treatment Time Range | 0–999 s |
| Chamber Dimensions | Ø120 mm × 120 mm (H) |
| Operating Vacuum Range | 0.20–1.0 mbar |
| HV/Vacuum Interlock | Software-Enabled Safety Lockout |
| Display | 102 mm × 68 mm LCD |
| Unit Dimensions | 417 mm (L) × 305 mm (W) × 280 mm (H) |
| Weight | 9.6 kg |
| Power Supply | 220 V, 50 Hz |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Imported Equipment |
| Model | ArBlade5000 |
| Price Range | USD 135,000 – 270,000 (FOB Japan) |
| Brand | Hitachi High-Technologies |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Technologies Corporation |
| Type | Imported |
| Model | MC1000 |
| Pricing | Upon Request |
| Max Sample Diameter | 60 mm |
| Max Sample Height | 20 mm |
| Control Interface | LCD Touchscreen |
| Memory Function | Yes |
| Optional Accessories | Thick/Large Sample Holder Kit |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Imported Instrument |
| Model | IM4000 II |
| Pricing | Available Upon Request |
| Brand | JEOL |
|---|---|
| Origin | Japan |
| Model | IB-19530CP |
| Price | USD 150,000 |
| Equipment Type | Ion Beam Sample Preparation System for Electron Microscopy |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM AC20 |
| Capacity | 20 grids per cycle |
| Reagent Consumption | ~6 mL per cycle (uranyl acetate + lead citrate) |
| Predefined Programs | 10 staining + 2 cleaning protocols |
| Temperature Control Range | 20–60 °C |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM ACE200 |
| Configuration Options | Sputter Coating / Carbon Evaporation / Dual-Source Interchangeable Setup |
| Optional Modules | Quartz Crystal Thickness Monitor, Planetary Rotating Stage, Glow Discharge Unit |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM ACE200 |
| Vacuum Level | 7 × 10⁻³ mbar |
| Sputtering Current Range | 0–150 mA |
| Sample Chamber Dimensions | 140 mm (W) × 145 mm (D) × 150 mm (H) |
| Working Distance Adjustment | 30–100 mm |
| Carbon Evaporation Mode | Pulsed, Precise Thickness Control |
| Optional Quartz Crystal Thickness Monitor | ±0.1 nm resolution |
| Optional Glow Discharge Function | For hydrophilization of TEM grids |
| Control Interface | Full-touch LCD panel with automated vacuum/pumping/coating/venting sequence |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM ACE200 |
| Vacuum Level | 7×10⁻³ mbar |
| Sputtering Current Range | 0–150 mA |
| Sample Chamber Dimensions | 140 mm (W) × 145 mm (D) × 150 mm (H) |
| Working Distance Adjustment | 30–100 mm |
| Carbon Evaporation Mode | Pulsed, Quartz Crystal Thickness Monitor Optional (±0.1 nm resolution) |
| Operation Interface | Touchscreen with Fully Automated Cycle Control (Pump-down → Coating → Venting) |
| Dual-Mode Capability | Sputtering + Carbon Evaporation |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM ACE600 |
| Vacuum Level | 2 × 10⁻⁶ mbar |
| Pumping System | Diaphragm Pump + Turbo Molecular Pump (Oil-Free) |
| Thickness Control | Quartz Crystal Monitor (Resolution: 0.1 nm) |
| Sputtering Current Range | 0–150 mA |
| Chamber Dimensions | 200 mm (W) × 150 mm (D) × 195 mm (H) |
| Sample Stage | Motorized Rotation + Adjustable Working Distance (30–100 mm) |
| Coating Modes | Ion Sputtering, Carbon Filament Evaporation, Carbon Rod (Resistive) Evaporation, Electron Beam Evaporation, Dual-Source Configurations (e.g., Sputter + E-beam), Glow Discharge (Optional) |
| Compatibility | EM VCT100 Cryo-Transfer System |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM ACE900 |
| Application | Cryo-SEM & TEM Sample Preparation |
| Cooling Medium | Liquid Nitrogen (LN₂) |
| Vacuum System | Dual-chamber with Load-Lock Transfer |
| Coating | Electron Beam Evaporation for Carbon/Metal Replicas |
| Compatibility | Integrated with Leica EM VCT500 Cryo-Transfer System |
| Environmental Certification | DIN EN ISO 14001 |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM AFS2 |
| Temperature Range | –140 °C to +70 °C (precisely controlled) |
| Liquid Nitrogen Capacity | 35 L (supports up to 5 days of continuous operation) |
| Deep Freeze Mode | < –140 °C for cryo-transfer |
| TF (Trace-free) Mode | Active O₂/H₂O removal |
| UV Polymerization | Integrated LED UV source (365 nm) |
| User Storage | 10 user profiles, 99 programs per user |
| Interface | Full-color graphical touchscreen with mouse control |
| Safety | Built-in exhaust system for hazardous solvent vapors |
| Optional Module | Leica EM FSP Fluid Service Processor (automated reagent dispensing, dilution, exchange, and UV polymerization) |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM CPD300 |
| Sample Chamber Volume | 175 mL |
| Control Interface | Touchscreen |
| CO₂ Consumption | Reduced via proprietary filler material |
| Safety Features | Integrated waste liquid separation, software-controlled venting interlock |
| Automation Level | Fully automated critical point drying cycle |
| Compliance | Designed for GLP-compliant SEM sample preparation workflows |