Electron Microscope Sample Preparation Equipment
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Showing 31–59 of 59 results
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM CPD300 |
| Sample Chamber Volume | 175 mL |
| Control Interface | Touchscreen with Embedded Process Logic |
| CO₂ Efficiency | Optimized via Patented Fill Medium Design |
| Safety Systems | Dual-Pressure Interlocks, Integrated Waste Fluid Separation, Automatic Venting Safeguards |
| Compliance | Designed to Support GLP/GMP Workflow Integrity and ISO 13485-Aligned Lab Documentation Requirements |
| Pricing Range | USD 65,000 – 105,000 (FOB Austria) |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM FC7 |
| Cutting Principle | Gravity-fed ultrathin sectioning |
| Sample Stage Movement | N-S: 10 mm, W-E: 25 mm |
| Illumination | 4-directional adjustable-brightness LED |
| Stereo Microscope Options | S6E (10–64×), M80 (9.6–77×) |
| Knife Holder | 360° rotatable self-locking, ±30°刻度分隔, clearance angle: −2° to +15°, compatible with 6–12 mm knives (including all major diamond knife brands) |
| Specimen Holder | 360° planar rotation, ±22° tilt around center axis |
| Control Interface | 10.4″ or 7″ capacitive touchscreen |
| Advanced Functions (10.4″ only) | Automated block trimming, E-W distance measurement, diamond knife wear tracking, multi-user authentication, storage for up to 100 user profiles |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | EM GP2 |
| Pricing | Available Upon Request |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM ICE |
| Cooling Medium | Liquid Nitrogen (LN₂) |
| Sample Capacity | 9 consecutive specimens (3 positions × up to 3 specimens each) |
| Light Stimulation | Integrated LED modules (450 nm, 380 nm, 523 nm, 660 nm, 597 nm) |
| Stimulus-to-Freeze Delay | Millisecond-precise synchronization |
| LN₂ Consumption | ~30 L/day (system-wide, including standby cooling) |
| Environmental Certification | DIN EN ISO 14001 |
| Software Control | Fully automated workflow with audit-trail logging |
| Upgrade Path | Field-upgradable light stimulation and environmental modules (e.g., stage heating, chamber temperature control) |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM KMR3 |
| Principle | Balanced Fracture Method |
| Cutting Wheel Material | Tungsten Carbide |
| Adjustable Cutting Pressure | 5-step calibrated scale |
| Fracture Angle | 45° |
| Fracture Pressure Control | Calibrated rotary knob with auto-reset |
| Knife Tray | Drawer-type, tool-free access |
| Compatible Glass Rod Diameters | 6.4 mm, 8 mm, 10 mm |
| Support Mechanism | Precision-ground stainless steel hemispherical fulcrum |
| Repeatability | High (engineered for consistent edge geometry and minimal micro-chipping) |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM RAPID |
| Milling Step Resolution | 0.5, 1, 10, 100 µm |
| Spindle Speed Range | 300–20,000 rpm |
| Illumination | Long-life LED ring light |
| Display | Integrated LCD control panel |
| Dust Extraction | Built-in vacuum-compatible dust removal system |
| Sample Holder Options | Single-sample stage and multi-sample stage |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | Leica EM TIC 3X |
| Application | Research Use Only |
| Sample Throughput | Up to 3 specimens simultaneously |
| Beam Configuration | Three independently adjustable argon ion beams |
| Operating Temperature Range | Ambient to –120 °C (with optional cryo stage) |
| Compatible Interfaces | VCT vacuum transfer docking station for cryo-SEM and coating systems (e.g., EM ACE600/ACE900) |
| Mounting Flexibility | Interchangeable stages — Standard, Multi-Sample, Rotating, Cryo-Cooling, and VCT Docking |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | EM TIC 3X |
| Application | Research Use Only |
| Sample Throughput | Up to 3 specimens simultaneously |
| Beam Configuration | Three independently adjustable argon ion beams |
| Operating Temperature Range | Ambient to –120 °C (with optional cryo stage) |
| Compatible Interfaces | VCT vacuum transfer docking station, EM ACE600/ACE900 coaters, SEM systems |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM TP |
| Temperature Control Range | +4 °C to +60 °C |
| Sample Capacity | 56 (EM mode), 16 (LM mode), or 168 (3-basket EM mode) |
| Reagent Volume per Step | 10 mL (EM), 50 mL (LM or 3-basket EM) |
| Agitation Amplitude | 6 mm |
| Frequency | 0, 0.25, 0.5, 1, 2, 3 Hz |
| Programmable Steps | Up to 99 protocols stored |
| Reagent Library Capacity | 200 entries |
| Delayed Start/End | Yes |
| Display | LCD, 20×4 character |
| Touchscreen Interface | Integrated |
| Pre-cooling/Pre-heating (EM mode) | Yes |
| Compliance | Designed for GLP/GMP-aligned workflows |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | EM TXP |
| Price Range | USD 105,000 – 132,000 |
| Brand | Leica |
|---|---|
| Origin | Austria |
| Model | EM VCT500 |
| Application | Cryogenic Sample Transfer for Electron Microscopy |
| Compatibility | Cryo-SEM, Cryo-TEM, Cryo-CLEM, FIB-SEM, High-Pressure Freezing (HPF), Cryo-Ultramicrotomy |
| Cooling Mode | Active Liquid Nitrogen (LN₂) Cooling |
| Transfer Environment | Ultra-High Vacuum (UHV) or Controlled Atmosphere (e.g., N₂, Ar) |
| Interface Standard | ISO-KF 40 / CF 63 Flange Compatible |
| Temperature Monitoring | Integrated Pt100 Sensor with Real-Time Readout |
| Vacuum Monitoring | Integrated Pirani + Cold Cathode Gauge |
| Sample Stage Options | Three Standard Carriers (Gatan 626, EMGrid, Leica EM AutoGrid) |
| Customization | OEM Integration Support, Multi-Port Valve Manifolds, LN₂ Auto-Refill Interface |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Model | UC Enuity |
| Type | Ultramicrotome for Electron Microscopy Sample Preparation |
| Temperature Control | Integrated Cryo Chamber with Precise Thermal Regulation (Room Temp to −160 °C) |
| Automation | Auto-alignment of Block Face and Knife, Automated Trimming, Fluorescence-Guided Targeting |
| Compatibility | Diamond/Knife Knives, Glass Knives, Silicon Wafers & EM Grids |
| Ergonomics | Fully Adjustable Stereo Microscope Height & Angle, Padded Arm Supports, UV-Blocking Safety Shield |
| Connectivity | RemoteCare™ Diagnostic Platform with Real-time Parameter Monitoring & Error Code Reporting |
| Compliance | Designed for GLP/GMP-adjacent workflows |
| Brand | VitroTEM |
|---|---|
| Origin | Netherlands |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Naiad |
| Pricing | Available Upon Request |
| Brand | NanoMEGAS |
|---|---|
| Origin | Belgium |
| Model | ASTAR® |
| Compatibility | 120–300 kV TEM (including Cs-corrected FEG-TEM) |
| Spatial Resolution | 1–4 nm (FEG-TEM), <10 nm (LaB₆ TEM) |
| Acquisition Speed | Up to >1000 fps (with direct electron detectors) |
| PED Tilt Angle Range | 0.2°–2.5° |
| Output Data Types | Orientation Maps, Phase Maps, Correlation Index, Confidence Index, Virtual BF/DF Images, Grain Boundary Networks, Pole Figures, Strain-Compatible Integration (with TopSPIN) |
| Compliance | Fully compatible with GLP/GMP workflows requiring audit trails |
| Brand | Safematic |
|---|---|
| Origin | Switzerland |
| Model | CCU-010 HV_CT |
| Vacuum Level | <5×10⁻⁷ mbar (base pressure) |
| Evaporation Source | Automatic carbon fiber feed system |
| Thickness Monitoring | Dual-position quartz crystal microbalance (QCM) |
| Pumping System | Integrated oil-free turbomolecular + diaphragm pump |
| Plasma Options | GD-010 glow discharge, ET-010 plasma etching |
| Control Interface | TFT touchscreen with programmable recipes |
| Software Options | Coating-LAB PC software, RC-010 glovebox remote control |
| Sample Stage | Ø ≥60 mm, height-adjustable & tilt-capable, compatible with rotary, planetary, and slide holders |
| Brand | Safematic |
|---|---|
| Origin | Switzerland |
| Model | CCU-010 LV_SP |
| Vacuum Type | Low-Vacuum Magnetron Sputtering System |
| Coating Modes | Ion Sputtering (Au, Pt, Pd, Cr, Ir, etc.) and Optional Plasma Etching |
| Base Pressure | ≤5 × 10⁻² mbar (with dual-stage rotary vane pump) |
| Pumping Speed | <90 s to operational vacuum (≤1 × 10⁻¹ mbar) |
| Sputtering Target Diameter | 50 mm |
| Film Thickness Monitoring | Dual-position quartz crystal microbalance (QCM) with real-time thickness readout |
| Cooling | Active water-cooled sputter head |
| Plasma Etching Module | ET-010 (Ar, O₂, air configurable) |
| Control Interface | TFT touchscreen + optional RC-010 Windows-based remote software |
| Compliance | CE, RoHS, ISO 9001-manufactured |
| Sample Stage | Ø ≥60 mm, height-adjustable & tilt-capable |
| Brand | SUNYOU |
|---|---|
| Origin | Japan |
| Model | ZONETEM II |
| Cleaning Principle | Vacuum-Enhanced 185/254 nm UV-Ozone Oxidation |
| Vacuum Range | 100–500 Torr (100-step adjustable) |
| Pump Type | Oil-Free Dry Scroll Vacuum Pump (3.8 L/min) |
| Pump-Down Time | ≤3 min to operational vacuum |
| Cleaning Duration | 1–30 min (1-min increments) |
| Sample Holder Compatibility | 3-hole or 5-hole TEM specimen holders |
| Effective Cleaning Area | Ø3 mm per position |
| Regulatory Compliance | Designed for ISO/IEC 17025-compliant labs |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | Gentle Mill |
| Ion Energy | 100–2000 eV (continuously adjustable) |
| Ion Beam Current | 7–80 µA |
| Ion Current Density | up to 10 mA/cm² |
| Beam Diameter (FWHM) | 750–1200 µm |
| Sample Tilt Range | 0°–40° (0.1° increments) |
| In-Plane Rotation & Swing | ±10° to ±120° (10° increments) |
| Si Etch Rate at 2000 eV / 30° | 28 µm/h |
| TEM Sample Thickness Compatibility | 30–200 µm |
| Imaging | High-resolution color CMOS camera with 50×–400× manual zoom |
| Vacuum System | Pfeiffer dry diaphragm + turbomolecular pump, full-range Pirani/Penning gauge |
| Process Gas | 99.999% Ar, regulated at 1.3–1.7 bar absolute pressure with electronic outlet pressure monitoring |
| Power Supply | 100–120 V/3.0 A/60 Hz or 220–240 V/1.5 A/50 Hz, single-phase |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | GIB |
| Ion Energy Range | 100 eV – 2 kV |
| Max Beam Current at 2 kV | 70 µA |
| Beam Diameter (FWHM) | 2 mm |
| Source Dimensions | Ø50 mm × 50 mm |
| Working Distance | 15–30 mm |
| Integration Interface | SEM/FIB-compatible flanged connection with bellows transmission system |
| Mounting | Semi-cylindrical support bracket |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | SEMPREP SMART |
| Ion Gun Energy | up to 16 keV |
| Sample Stage Tilt | 0°–30° (0.1° increments) |
| Rotation | 360° continuous variable speed |
| Oscillation Angle | ±10° to ±120° (5° increments) |
| Sample Dimensions (90° cross-section stage) | max 18.6 × 16 × 6 mm |
| EBSD Planar Stage Options | flat-head (Ø50 × 4 mm), standard (Ø32 × 15 mm), hollow-head (Ø25 × 23 mm) |
| Vacuum System | oil-free diaphragm pump + HiPace 80 Neo turbomolecular pump |
| Gas Supply | 99.999% pure argon, precision needle-valve flow control |
| Imaging | 5 MP CMOS camera with in-image measurement |
| Optional | Low-Energy Gun (LEG), LN₂ cooling, Vacuum Transfer Unit (VTU), Peltier cooling |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | SEMPREP SMART |
| Ion Gun Energy | Up to 16 keV |
| Sample Stage Options | Cross-section (30°/90°), Planar (Flat/Standard/Hollow Heads) |
| Sample Dimensions | Up to 50 mm Ø × 4 mm (flat) |
| Tilt Range | 0–30°, adjustable in 0.1° increments |
| Rotation | 360° continuous, variable speed |
| Swing Angle | ±10° to ±120°, adjustable in 5° steps |
| Cooling Options | LN₂ or Peltier |
| Vacuum System | Oil-free diaphragm pump + HiPace 80 Neo turbomolecular pump |
| Imaging | 5 MP CMOS camera with on-image measurement |
| Gas Supply | 99.999% pure Ar, precision needle-valve flow control |
| Software | Automated gun operation, stage calibration, beam-assisted positioning |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | SEMPREP-SMART |
| Ion Gun Energy | Up to 16 keV (High-Energy) + Optional Low-Energy Gun (LEG) |
| Sample Stage Types | 30° Cross-section, 90° Cross-section, Planar (EBSD), with Three Head Options (Flat, Standard, Hollow) |
| Max Sample Dimensions | 18.6 × 16 × 6 mm (90° stage) |
| Tilt Range | 0–30° (0.1° increments) |
| Rotation | 360° continuous, variable speed |
| Swing Angle | ±10° to ±120° (5° increments) |
| Vacuum System | Oil-free diaphragm pump + HiPace 80 Neo turbomolecular pump |
| Gas Supply | 99.999% purity Ar, precision needle valve control |
| Imaging | 5 MP CMOS camera with on-image measurement |
| Cooling Options | LN₂ or Peltier |
| Optional Accessories | Vacuum Transfer Unit (VTU), Automated Stage Calibration via Ion Beam |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | SEMPREPSMART |
| Ion Gun Energy | Up to 16 keV |
| Sample Stage Options | 30° cross-section, 90° cross-section, and EBSD-compatible planar stages (flat-head: Ø50 mm × 4 mm |
| standard | Ø32 mm × 15 mm |
| hollow | Ø25 mm × 23 mm) |
| Tilt Range | 0–30° (0.1° incremental adjustment) |
| Rotation | 360° continuous variable-speed |
| Swing Angle | ±10° to ±120° (5° increments) |
| Vacuum System | Oil-free diaphragm pump + HiPace 80 Neo turbomolecular pump |
| Gas Supply | Ultra-high-purity argon (99.999%), precision needle-valve flow control |
| Optional Features | Low-Energy Gun (LEG), LN₂ or Peltier cooling, Vacuum Transfer Unit (VTU), Independent alignment stage for 90° sectioning |
| Imaging | 5 MP CMOS camera with on-image measurement capability |
| Control | Graphical user interface with automated ion beam positioning, stage calibration, and process scripting |
| Brand | Technoorg Linda |
|---|---|
| Origin | Hungary |
| Model | UniMill |
| Ion Beam Energy Range | 100 eV – 16 keV (dual-gun configuration) |
| Beam Current | up to 500 µA (ultra-high-energy gun) |
| Beam Diameter (FWHM) | 0.9–2.2 mm |
| Tilting Angle | 0°–40° (0.1° resolution) |
| In-Plane Rotation | 360° continuous |
| Lateral Translation | ±10° to ±120° (10° increments) |
| Sample Thickness Compatibility | 30–200 µm |
| Imaging | High-resolution color CMOS camera with 50–400× manual zoom |
| Vacuum System | Pfeiffer dry diaphragm + turbomolecular pump |
| Gas Supply | Ultra-high-purity Ar (99.999%), regulated at 1.3–1.7 bar absolute |
| Power | 100–120 V/10 A or 220–240 V/5 A, 50–60 Hz |
| Brand | Ted Pella |
|---|---|
| Origin | USA |
| Model | Glow Discharge 91000 |
| Plasma Current | 0–30 mA |
| Power | 30 W |
| Polarity | Adjustable (Positive/Negative) |
| Sample Stage Diameter | 75 mm |
| Stage Height Adjustment | 1–25 mm |
| Processing Delay Time | 0–14,400 s |
| Processing Duration | 0–900 s |
| Chamber Dimensions | Ø120 × 100 mm |
| Inlet Ports | 2 × Ø6 mm |
| Vacuum Control | Pirani gauge, range: atmospheric pressure to 0.01 mbar |
| Operating Vacuum Range | 0.20–1.1 mbar |
| Touchscreen Display | 3-inch LED-backlit with 5 function keys |
| Control Modes | Automatic (4 programmable user protocols) and Manual |
| Safety Interlocks | Dual hardware + software vacuum interlock |
| Dimensions (Main Unit) | 305 × 292 × 230 mm |
| Weight (Main Unit) | 6.26 kg |
| Optional GD4 Vacuum Pump | 337 × 138 × 244 mm, 11 kg, pumping speed 2.5 m³/hr, ultimate vacuum 0.03 mbar |
| Power Supply | 230 V, 50 Hz, 10 A |
| Brand | Ted Pella |
|---|---|
| Origin | USA |
| Model | Dimpler |
| Z-Axis Accuracy | ±1 µm |
| Z-Range | 2000 µm |
| Z-Termination Accuracy (Tool 1i/3i) | <±1 µm |
| Z-Termination Accuracy (Tool 2i/4i) | <±2 µm |
| Tool Load Range | 1–200 g (1 g increments) |
| Balance Sensitivity | 1 g (Range: 50 g) |
| Tool Rotation Speed | 100–600 RPM |
| Platen Rotation Speed | 10 RPM |
| Spindle Runout (TIR) | 0.5 µm |
| Tool TIR (1i/3i) | <±1 µm |
| Tool TIR (2i/4i) | <±2 µm |
| Platen Surface TIR | <0.5 µm |
| Dimensions (L×W×H) | 68.6 × 35.6 × 33 cm |
| Weight | 32 kg |
| Power Input | 85–264 VAC, 47–63 Hz |
| Product Codes | 84000 (Dimpler), 83050 (Video Alignment Tool), 83031 (Standard 3 mm TEM Tool Set), 83032 (Adjustable Clamp Assembly), 83001 (Sapphire Sample Holder) |
| Brand | Ted Pella |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | PELCO easiCore |
| Price | Upon Request |
| Max Rotational Speed | 100–1500 rpm |
| Maximum Applied Load | 1 kg |
| Disc Diameter Range | 2.3–25 mm |
| Positioning Accuracy | X-Y Stage with 1 mm Graduated Scale |
| Compatible Mounting Fixtures | PELCO Precision Wire Saw, PELCO Precision Low-Speed Saw, PELCO Dimpler |
| Optional Accessory | PELCO Abrasive Dispenser (timed abrasive slurry delivery) |
| Brand | Thermo Scientific |
|---|---|
| Origin | Netherlands |
| Model | Arctis |
| Ion Sources | Xe⁺, O⁺, Ar⁺ |
| Sample Capacity | Up to 12 cryo-grids (TomoGrids/AutoGrids) |
| Integrated iFLM | Yes |
| Vacuum System | Ultra-high vacuum cryo-chamber |
| Cooling Architecture | Dual-stage cryo-shielding with braided cryo-sleeve |
| Compliance | Designed for GLP/GMP-aligned cryo-EM workflows, compatible with FDA 21 CFR Part 11–ready software environments |
| Biocontainment Option | High-temperature decontamination mode for BSL-3 labs |
| Stage Tilt Range | ±90° (180° total) CompuStage™ |
| Brand | SUNYOU |
|---|---|
| Origin | Japan |
| Model | ZONESEM II |
| Cleaning Principle | UV-Ozone Oxidation |
| Vacuum System | Oil-Free Diaphragm Pump (9 L/min) |
| Pump-Down Time | ≤3 min to Target Vacuum |
| Operating Vacuum Range | 100–500 torr (100-step adjustable) |
| Cleaning Chamber Dimensions | Ø100 mm × H36 mm |
| Cleaning Modes | Vacuum UV-Ozone Cleaning & Vacuum Storage Mode |
| Cleaning Duration | 1–1440 min (1-min increments) |
| Effective Cleaning Area | Ø100 mm |
| Compliance | Designed for SEM sample preparation per ISO 14644-1 Class 5 cleanroom-compatible workflows |