- All
- Favorite
- Popular
- Most rated
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | TMS-E1S |
| Temperature Range | RT to 1600 °C |
| Atmosphere Options | Air, Vacuum, or Controlled Flow Gas (e.g., N₂, Ar, H₂) |
| Sample Capacity | Ø ≤ 4 mm × Thickness ≤ 2 mm |
| Heating/Cooling Rate | Up to 100 °C/s (dependent on sample and atmosphere) |
| Optical Configuration | Integrated Long-Working-Distance Objective with Real-Time Video Capture |
| Core Technology | Infrared Gold-Mirror Reflective Furnace Coupled with High-Resolution Optical Microscopy |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Super LIX-R |
| Price | Upon Request |
| Temperature Range (°C) | 0–50 |
| Heating/Cooling Rate (°C/min) | 0.01–1.5 |
| Temperature Accuracy (°C) | ±0.1 |
| Sample Diameter (mm) | Φ5 ±0.5 |
| Sample Length (mm) | 12–20 |
| Measurement Range (µm) | 20 |
| Resolution (nm) | <0.2 |
| CTE Detection Limit | 5 × 10⁻⁹ K⁻¹ |
| Thermal Stability | <±0.001 °C/min at 0.1 °C/min ramp |
| Atmosphere | Low-pressure He (100 Pa) |
| Sensor | PT-100 Platinum RTD (JIS C 1604-1997 Class A) |
| Laser | He-Ne, 632.8 nm, 5 mW (IEC 60825-1 Class 3B) |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | MILA-5000 Series |
| Instrument Type | High-Vacuum Rapid Thermal Annealer |
| Sample Size | 2-inch wafer |
| Temperature Range | Ambient to 1200 °C |
| Max. Heating Rate | 50 °C/s |
| Cooling Rate | 30 °C/s |
| Temperature Accuracy | ±2.0 °C |
| Temperature Uniformity | ±2.0 °C |
| Base Vacuum (MILA-5000UHV) | 1×10⁻⁵ Pa |
| Atmosphere Options | Vacuum, N₂, Ar, O₂, forming gas, ambient air |
| Heating Source | Gold-coated infrared halogen lamps |
| Cooling Method | Integrated water-cooled chamber base |
| Control Interface | USB-connected PC software + front-panel touchscreen |
| Real-time Monitoring | Top quartz viewport + optional integrated CCD camera system |
| Optional Integration | Four-point probe resistivity measurement module |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | RTP-6 |
| Instrument Type | Standard Vacuum Rapid Thermal Annealing Furnace |
| Sample Size | 6-inch wafer |
| Temperature Range | RT to 1000 °C |
| Maximum Ramp Rate | 80 °C/s |
| Annealing Temperature Accuracy | ±0.5 °C |
| Temperature Uniformity | ±10 °C |
| Cooling | Water-cooled chamber (forced convection cooling enabled via optional chiller) |
| Heating Zones | 9 independently controlled zones |
| Atmosphere Control | Vacuum + continuous gas flow (N₂, O₂, forming gas, Ar, etc.) |
| Optional Accessories | Quartz shielding plate, pyrometer (for non-contact temperature monitoring), vacuum pump, recirculating water chiller |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model Series | PS, PSS |
| Heating Zone Width (PS) | 40 mm |
| Heating Zone Width (PSS) | 20 mm |
| Compatible Substrate Diameter | 50–300 mm |
| Application Scope | Rapid thermal processing (RTP), wafer annealing, solar cell sintering, FPD substrate heating, thin-metal foil annealing |
| Configuration | Modular assembly for extended heating zones |
| Compliance | Designed for integration into Class 100–1000 cleanroom-compatible production lines |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | HT-RTA59HD |
| Heating Method | High-Power Focused Halogen Lamp |
| Max Temperature | 1800 °C (achieved in ≤10 s for □15 mm samples) |
| Sample Chamber Atmosphere | Dual-gas inlet (N₂ and Ar), quartz tube encapsulation |
| Cooling | Forced-air cooling for lamp assembly |
| Form Factor | Benchtop, manual slide-rail sample loading |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL1000 Series |
| Substrate Size | 4-inch (φ100 mm) |
| Process Temperature | Up to 350 °C |
| Precursor Channels | 2 |
| Uniformity | ≤3% (1σ, across 4-inch wafer) |
| Vacuum Base Pressure | ≤5 Pa |
| Dimensions (W×H×D) | 582 × 450 × 410 mm |
| Weight | 50 kg |
| Optional Accessories | Powder deposition stage (0–45° tilt, 5 cm³ capacity), ozone generator, N₂ purge module, glovebox integration kit, precursor heaters (up to 200 °C), dry vacuum pump, exhaust abatement unit |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSP-1000 |
| Price Range | USD 110,000 – 138,000 |
| Maximum Substrate Diameter | φ100 mm |
| Thickness Uniformity | ±5% over φ100 mm area |
| RF Power Mode | Pulsed RF (13.56 MHz) |
| Gas Inlets | Standard 1, Optional 2 |
| Sputtering Orientation | Upward, Lateral, Downward (reconfigurable cubic chamber) |
| Target Compatibility | Metallic, Oxide (e.g., Al₂O₃, SiO₂), Nitride, and Magnetic Targets (optional) |
| Substrate Holder | Rotatable or Fixed |
| Viewport | Integrated Quartz Observation Window |
| Cathode Shielding | Removable Cathode Protection Plate with Integrated Sputter Timer for Thickness Estimation |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | RHL-E Series |
| Heating Principle | Radiative heating via high-intensity near-infrared lamp array with water-cooled gold-coated elliptical reflector |
| Max Operating Temperature (E-type) | Up to 1200°C |
| Lamp Spectral Peak | ~1.15 µm |
| Reflector Material | Precision-polished aluminum substrate with vacuum-deposited Au coating |
| Cooling | Integrated water-circulation jacket for reflector and chamber housing |
| Sample Geometry Compatibility | Cylindrical/rod-shaped specimens |
| Reflective Geometry | Elliptical (E-series) |
| Compliance | Designed for ISO/IEC 17025-compliant lab environments |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | Mila-5050 |
| Sample Diameter | 50 mm (2 inch) |
| Temperature Range | 25–1200 °C |
| Max. Heating Rate | 50 °C/s |
| Cooling Rate | 20 °C/s |
| Temperature Accuracy | ±1% of setpoint |
| Temperature Uniformity | ±1% across sample zone at 1000 °C |
| Vacuum Capability | Standard configuration supports low-vacuum rapid thermal processing |
| Control Interface | USB-connected PID temperature controller with real-time monitoring and programmable ramp/soak profiles |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SPS-2000 |
| Maximum Axial Pressure | 15–75 kN |
| Maximum Pulse Current | 1000–3000 A |
| Base Vacuum | ≤2 Pa (reached in ≤5 min from atmosphere) |
| Ultimate Vacuum (with optional high-vacuum pump) | ≤5×10⁻³ Pa |
| Chamber Accessibility | Enhanced ergonomic loading/unloading design |
| Architecture | Modular, field-upgradeable platform |
| Core Heating Mechanism | Unidirectional pulsed DC current through conductive die/mold assembly |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL3000 |
| Substrate Size | Ø100 mm (4-inch) |
| Process Temperature Range | 350–800 °C |
| Precursor Channels | 6 |
| Uniformity | ≤3% (at Ø100 mm) |
| Dimensions (W × H × D) | 1418 × 1728 × 840 mm |
| Weight | 200 kg |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | WET-1200 |
| Temperature Range (Static Drop) | Ambient to 1500 °C |
| Temperature Range (Extrusion Drop, optional) | Ambient to 1200 °C |
| Sample Substrate | Ø10 mm × 2 mm |
| Measurement Atmospheres | Vacuum, Controlled Gas Flow, Ambient Air |
| Measurement Methods | Static Drop Method, Optional Extrusion Drop Method |
| Application Scope | High-temperature wettability analysis of molten metals, alloys, glasses, and ceramics against solid substrates |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Antares |
| Instrument Type | Automated Microcalorimetric Microbial Activity Monitoring System |
| Throughput | 19 samples |
| Sample Vessel | Ø40 × H86 mm ampoule |
| Temperature Range | 5–50 °C (water-circulating thermostat control) |
| Data Acquisition Interval | 60 s (continuous operation up to 166 days) |
| Dimensions | W465 × D650 × H500 mm |
| Weight | ~100 kg |
| Power Supply | AC 100 V, 10 A |
| Installation Requirement | Temperature-stabilized laboratory environment |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SPS-Sx Series |
| Pricing | Available Upon Request |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL-3000Plus |
| Substrate Size | 4-inch (100 mm) |
| Process Temperature Range | 350–800 °C |
| Number of Precursor Lines | 6 |
| Vacuum Base Pressure | ≤5 Pa |
| Film Thickness Uniformity | ≤3% @ 100 mm |
| System Dimensions (W × H × D) | 835 × 1644 × 700 mm |
| Weight | 160 kg |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Advance Riko |
| Pricing | Available Upon Request |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SPS-Rx Series |
| Pricing | Available Upon Request |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | APD |
| Pricing | Upon Request |
| Vacuum Chamber Dimensions | 400 × 400 × 300 mm (L×W×H) |
| Pumping System | 450 L/s Turbo-Molecular Pump |
| Plasma Source | 1 Standard, Up to 3 Optional |
| Operating Pressure | High Vacuum to Low-Pressure Reactive Gases (N₂, O₂, H₂, Ar) |
| Target Geometry | Cylindrical or Tubular, Ø10 mm × 17 mm |
| Target Resistivity | < 0.01 Ω·cm |
| Capacitance Bank | 360 µF × 5 (Optional Configurations Available) |
| Pulse Frequency | 1–5 Hz |
| Discharge Voltage Range | 70–400 V (Max 150 V at 1800 µF) |
| Human-Machine Interface | Industrial Touchscreen Control Panel |
| APD-P Powder Collector | Ø95 mm × 30 mm |
| Collection Rate | 13–20 cm³/h (Dependent on Particle Size & Density) |
| Rotation Speed | 1–50 rpm |
| APD-S Substrate Holder | Compatible with 2-inch (50.8 mm) Wafers/Foils |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | RHL-P Series |
| Sample Size | 1.2-inch (30.5 mm) wafers |
| Temperature Range | RT to 1350 °C |
| Max. Heating Rate | 50 °C/s |
| Max. Cooling Rate | 30 °C/s |
| Temperature Accuracy | ±3 °C |
| Temperature Uniformity | ±3 °C |
| Chamber Dimensions (varies by model) | Ø20 mm × 80 mm to Ø50 mm × 80 mm |
| Cooling Requirement | External recirculating water chiller (required) |
| Brand | SYMCEL |
|---|---|
| Origin | Sweden |
| Model | CalScreener |
| Detection Principle | Isothermal Titration Microcalorimetry (ITC) / Heat Flow Calorimetry |
| Channel Capacity | Up to 32 parallel samples |
| Sensitivity | <50 nW thermal resolution |
| Output Unit | µW (microwatt heat flow) |
| Sample Format | Suspensions, tissue explants, adherent & suspension cells, opaque or turbid media |
| Label-Free Operation | Yes |
| Real-Time Kinetic Data Acquisition | Continuous, unlimited duration |
| Compliance | Designed for GLP-compliant workflows |
Show next